Patent application number | Description | Published |
20100211471 | COMMODITY SALE DATA PROCESSING APPARATUS AND CONTROL METHOD FOR THE SAME - A receipt detection unit which detects the presence of a receipt issued by a receipt issuing unit provided in a commodity sale data processing apparatus, and an operator detection unit which detects the presence of an operator of the apparatus, are provided. Then, it is notified that a receipt is left on condition that the receipt is detected by the receipt detection unit and the operator is not detected by the operator detection unit. | 08-19-2010 |
20110210168 | SELF-CHECKOUT TERMINAL AND CONTROL METHOD THEREFORE - According to one embodiment, a self-checkout terminal includes a reading unit, a registration processing unit, a determining unit, a checking unit, and a settlement processing unit. The reading unit reads a data code. The registration processing unit acquires sales limitation information. The determining unit determines, according to the limitation information, whether the commodity is subjected to sales limitation. The checking unit transmits, when it is determined that the commodity is subjected to the sales limitation, data for checking whether a limit condition is satisfied and determines whether data of completion of the check is returned. The settlement processing unit inhibits shift to settlement processing for the commodity subjected to the sales limitation and enables, when the checking unit determines that the data of the completion of the check is received, the shift to the settlement processing for the commodity and subjects the commodity to the settlement processing. | 09-01-2011 |
Patent application number | Description | Published |
20100139711 | Cleaning method of semiconductor wafer - A wax removal method uniformly removes wax adhering to a wafer surface and reduces the problems of re-adhesion of particles and filter clogging of a cleaning bath during cleaning. The method uses cleaning liquid which contains microbubbles. | 06-10-2010 |
20100163084 | Micro Bubble Generating Device and Silicon Wafer Cleaning Apparatus - A micro-bubble generating device is provided with a micro-bubble generating mechanism and a leading conduit provided with a widening section and a tube part, the widening section and the tube part in communication with each other in the leading conduit. The widening section has a hollow shape which has an axis Z as a central axis, and has base surfaces and a peripheral surface, and communicates with a nozzle of the micro-bubble-generating mechanism via one base surface of the widening section, and communicates with the tube part via the other base surface. The cross section orthogonal to a flow axis Z of the micro-bubbles of the widening section is larger than the cross section orthogonal to the flow axis Z of the tube part. | 07-01-2010 |
20130112900 | CLEANING APPARATUS, MEASUREMENT METHOD AND CALIBRATION METHOD - A calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid includes varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak. The liquid is illuminated with ultrasonic waves while varying the concentration of the gas in the liquid and a measured value is measured, using the measurement device, as a concentration of the gas in the liquid when the intensity of the luminescence shows a peak. The measurement device is calibrated based on the measured value and the reference concentration. | 05-09-2013 |
20130160791 | ULTRASONIC CLEANING METHOD - An ultrasonic cleaning method for cleaning an object in a solution having a gas dissolved therein includes irradiating ultrasonic waves to the solution having a first dissolved gas concentration. While the ultrasonic waves are being irradiated to the solution, a dissolved gas concentration in the solution is changed from the first dissolved gas concentration to a second dissolved gas concentration that is lower than the first dissolved gas concentration such that sonoluminescence occurs. | 06-27-2013 |
20130192627 | CLEANING METHOD - A cleaning method for cleaning an object includes preparing a cleaning liquid. A dissolved nitrogen concentration in the cleaning liquid is adjusted based on a size of a foreign substance to be removed from the object with a highest removal efficiency. The object is dipped in the cleaning liquid while irradiating the cleaning liquid with ultrasonic waves. | 08-01-2013 |
20130192628 | CLEANING APPARATUS, EQUIPMENT, AND METHOD - A cleaning apparatus for cleaning an object includes a cleaning tank holding a cleaning liquid, the object being cleanable by the cleaning liquid. A coupling tank holding an intermediate medium is in contact with a portion of the cleaning tank. An ultrasonic wave generation unit is disposed at the coupling tank and configured to ultrasonically vibrate the cleaning liquid via the intermediate medium. A modification unit is configured to modify a difference in sonic velocity between the cleaning liquid and the intermediate medium. | 08-01-2013 |
20130263887 | DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD, SUBSTRATE CLEANING METHOD, AND SUBSTRATE CLEANING APPARATUS - A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration. | 10-10-2013 |
20130312785 | ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS - An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved and stirring the liquid while irradiating the liquid with the ultrasonic waves so as to realize a state where bubbles containing the gas dissolved in the liquid continue to be generated. The object is cleaned in the state where the bubbles containing the gas continue to be generated. | 11-28-2013 |
20130312786 | ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS - An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved. The object is cleaned while applying ultrasonic waves to the liquid so that a ratio determined by dividing a vibration strength of the liquid at a fourth-order frequency of the ultrasonic waves by a vibration strength of the liquid at a fundamental frequency of the ultrasonic waves is larger than 0.8/1000. | 11-28-2013 |
20130312788 | ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS - An ultrasonic cleaning method for cleaning an object in a liquid in which a first gas is dissolved includes preparing the liquid in which the first gas is dissolved and introducing a second gas into the liquid while irradiating the liquid with ultrasonic waves so as to realize a state where bubbles containing the first gas dissolved in the liquid continue to be generated. The object is cleaned in the state where the bubbles containing the first gas continue to be generated. | 11-28-2013 |
20130312789 | ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS - An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved and cleaning the object while irradiating the liquid with ultrasonic waves so that a region, where a spatial rate of change of a refractive index of the liquid in which the gas is dissolved is large relative to a case where ultrasonic waves are not applied, appears along a direction in which the ultrasonic waves travel. | 11-28-2013 |
20160052025 | ULTRASONIC CLEANING METHOD - A cleaning method involves: disposing in a cleaning liquid held in a cleaning tank an object to be cleaned; and ultrasonically vibrating the cleaning liquid via an intermediate medium in contact with the cleaning tank to clean said object, the ultrasonically vibrating involving: ultrasonically vibrating the cleaning liquid with the cleaning liquid and the intermediate medium allowing sonic velocities, respectively, having a first difference; and ultrasonically vibrating the cleaning liquid with the cleaning liquid and the intermediate medium allowing sonic velocities, respectively, having a second difference different from the first difference | 02-25-2016 |