Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Haga, Ibaraki
Kouji Haga, Ibaraki JP
| Patent application number | Description | Published |
|---|---|---|
| 20080214093 | CMP polishing slurry and polishing method - The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and α-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films. | 09-04-2008 |
| 20080254717 | Cmp Polishing Slurry and Method of Polishing Substrate - A CMP polishing slurry of the present invention contains cerium oxide particles, water, and a polymer of at least one of a methacrylic acid and the salt thereof, and/or a polymer of at least one of a methacrylic acid and the salt thereof and a monomer having an unsaturated double bond, preferably contains furthermore a dispersant or a polymer of monomers containing at least one of an acrylic acid and the salt thereof. The present invention provides a CMP polishing slurry and a polishing method that, after polishing, give a polished film having a smaller difference in residual film thickness due to a pattern density difference. | 10-16-2008 |
| 20110104992 | POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME - A polishing solution for metal films that comprises an oxidizing agent, a metal oxide solubilizer, a metal corrosion preventing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a copolymer of acrylic acid and methacrylic acid, the copolymerization ratio of methacrylic acid in the copolymer being 1-20 mol % based on the total of acrylic acid and methacrylic acid. | 05-05-2011 |
Takahiro Haga, Ibaraki JP
| Patent application number | Description | Published |
|---|---|---|
| 20100192728 | Spherical Copper Fine Powder and Process for Producing the Same - Provided is spherical copper fine powder in which the average grain size of copper fine powder is 0.05 μm or more and 0.25 μm or less. Additionally provided is a method of producing spherical copper fine powder including the steps of preparing a slurry by adding cuprous oxide to an aqueous medium containing an additive of natural resin, polysaccharide or a derivative thereof, adding 5 to 50% of an acid aqueous solution to the slurry at a time within 15 minutes, and thereby performing disproportionation. The process enables speedy, efficient and stable production of metallic copper particles controlled in particle shape or particle size, particularly copper fine powder having small particles in size. | 08-05-2010 |
Toyokazu Haga, Ibaraki JP
| Patent application number | Description | Published |
|---|---|---|
| 20090149647 | PROCESS FOR PRODUCTION OF LIPID A ANALOGUE - Discloses is a process for producing α-D-glucopyranose, 3-O-decyl-2-deoxy-6-O-[2-deoxy-3-O-[(3R)-3-methoxydecyl]-6-O-methyl-2-[(11Z)-1-oxo-11-octadecenyl]amino]-4-O-phosphono-β-D-glucopyranosyl]-2-[(1,3-dioxotetradecyl)amino]- or 1-(dihydrogen phosphate) tetrasodium salt which is useful as an active ingredient of a pharmaceutical or an intermediate for the synthesis thereof, which is environment-friendly and excellent in safety, operationality and reproducibility. A process for producing a compound represented by the formula (I) comprising the steps of reacting a compound represented by the formula (VIII) with a palladium catalyst in the presence of a nucleopholic agent and treating the product with a sodium source. | 06-11-2009 |
Yuji Haga, Ibaraki JP
| Patent application number | Description | Published |
|---|---|---|
| 20090124648 | Synthesis and Crystalline Forms of Npy5 Antagonist - The present invention relates to a process for producing crystalline trans-N-[1-(2-fluorophenyl)-S-pyrazoly]-3-ox-ospiro[6-azaisobenzofuran-1(3H),1′-cyclohexane]-4′-carboxamide and novel salts, hydrates and polymorphs thereof. | 05-14-2009 |
| 20090137587 | Phenylpyridone Derivative - A compound represented by the formula (I) is contained as an active ingredient: | 05-28-2009 |
| 20090264426 | Bicyclic aromatic substituted pyridone derivative - Disclosed is a compound represented by the formula (I): | 10-22-2009 |
| 20100216758 | Pyridone Compounds - An active ingredient is a compound represented by the general formula [I]: | 08-26-2010 |