Patent application number | Description | Published |
20090248337 | Systems and Methods of Alternative Overlay Calculation - Methods and systems of alternative overlay calculation and of calculating overlay stability based on alternative overlay settings in a fabrication unit, and a computer readable medium are disclosed being capable of calculating alternative overlay error values based on alignment model parameters, alternative alignment model parameters, and overlay error values for a plurality of measurement positions. | 10-01-2009 |
20100030360 | Alignment Calculation - Alignment data from an exposure tool suitable for exposing a plurality of semiconductor wafers are provided, the alignment data including alignment values applied by the exposure tool to respective ones of the plurality of semiconductor wafers at a plurality of measured positions. | 02-04-2010 |
20140212817 | METHOD AND APPARATUS FOR FABRICATING WAFER BY CALCULATING PROCESS CORRECTION PARAMETERS - A method of calculating an overlay correction model in a unit for the fabrication of a wafer is disclosed. The method comprises measuring overlay deviations of a subset of first overlay marks and second overlay marks by determining the differences between the subset of first overlay marks generated in the first layer and corresponding ones of the subset of second overlay marks generated in the second layer. | 07-31-2014 |
20150019192 | Method and Apparatus for Simulation of Lithography Overlay - A method for simulation of lithography overlay is disclosed which comprises storing alignment parameters used to align a semiconductor wafer prior to a lithography step; storing process control parameters used during the lithography step on the semiconductor wafer; storing overlay parameters measured after the lithography step; calculating alternative alignment parameters and alternative process control parameters. The alternative alignment parameters and the alternative process control parameters are added to cleansed overlay parameters to obtain simulated lithography overlay data. | 01-15-2015 |
Patent application number | Description | Published |
20130142341 | APPARATUS AND METHOD FOR MERGING GEOMETRY-BASED SPATIAL AUDIO CODING STREAMS - An apparatus for generating a merged audio data stream is provided. The apparatus includes a demultiplexer for obtaining a plurality of single-layer audio data streams, wherein each input audio data stream includes one or more layers, wherein the demultiplexer is adapted to demultiplex each one of one or more input audio data streams having one or more layers into two or more demultiplexed audio data streams having exactly one layer. Furthermore, the apparatus includes a merging module for generating the merged audio data stream based on the plurality of single-layer audio data streams. Each layer of the input data audio streams, of the demultiplexed audio data streams, of the single-layer data streams and of the merged audio data stream includes a pressure value of a pressure signal, a position value and a diffuseness value as audio data. | 06-06-2013 |
20130142342 | APPARATUS AND METHOD FOR MICROPHONE POSITIONING BASED ON A SPATIAL POWER DENSITY - An apparatus for microphone positioning includes a spatial power distribution determiner and a spatial information estimator. The spatial power distribution determiner is adapted to determine a spatial power density indicating power values for a plurality of locations of an environment based on sound source information indicating one or more power values and one or more position values of one or more sound sources located in the environment. The spatial information estimator is adapted to estimate acoustic spatial information based on the spatial power density. | 06-06-2013 |
20130268280 | APPARATUS AND METHOD FOR GEOMETRY-BASED SPATIAL AUDIO CODING - An apparatus for generating at least one audio output signal based on an audio data stream having audio data relating to one or more sound sources is provided. The apparatus has a receiver for receiving the audio data stream having the audio data. The audio data has one or more pressure values for each one of the sound sources. Furthermore, the audio data has one or more position values indicating a position of one of the sound sources for each one of the sound sources. Moreover, the apparatus has a synthesis module for generating the at least one audio output signal based on at least one of the one or more pressure values of the audio data of the audio data stream and based on at least one of the one or more position values of the audio data of the audio data stream. | 10-10-2013 |