Patent application number | Description | Published |
20080212059 | MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS - The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods. | 09-04-2008 |
20080266686 | Facet mirror comprising a multiplicity of mirror segments - A facet mirror is provided with a multiplicity of mirror segments ( | 10-30-2008 |
20090002670 | Apparatus for the manipulation and/or adjustment of an optical element - The invention relates to an apparatus for the manipulation and/or adjustment of an optical element with respect to a structure, the optical element being connected to the structure by means of a number of setting members, and the setting members having as active adjusting elements screw elements or piezoceramic elements, which in each case produce an active force along one degree of freedom and by means of which the optical element is connected to the structure in such a way that it can be set in up to six degrees of freedom. | 01-01-2009 |
20100007866 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 01-14-2010 |
20110235015 | ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY - An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 μm is ensured for edges of the object field towards an object to be exposed. The result is an illumination optics that is used to ensure conformance with preset illumination parameters even given the most stringent demands upon precision. | 09-29-2011 |
20110255067 | MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS - The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods. | 10-20-2011 |
20120224153 | OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY - An optical arrangement, in particular in a projection exposure apparatus for EUV lithography. In an aspect an optical arrangement has a housing ( | 09-06-2012 |
20130100426 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 04-25-2013 |