Patent application number | Description | Published |
20110220915 | Off-Axis Silicon Carbide Substrates - A method of epitaxial growth of a material on a crystalline substrate includes selecting a substrate having a crystal plane that includes a plurality of terraces with step risers that join adjacent terraces. Each terrace of the plurality or terraces presents a lattice constant that substantially matches a lattice constant of the material, and each step riser presents a step height and offset that is consistent with portions of the material nucleating on adjacent terraces being in substantial crystalline match at the step riser. The method also includes preparing a substrate by exposing the crystal plane; and epitaxially growing the material on the substrate such that the portions of the material nucleating on adjacent terraces merge into a single crystal lattice without defects at the step risers. | 09-15-2011 |
20120167477 | ABRASIVE PARTICLE AND METHOD OF FORMING SAME - An abrasive article comprising an abrasive particle including a core comprising a compressible material, an intermediate layer comprising a binder material overlying an exterior surface of the core, and an outer layer comprising abrasive grains overlying the intermediate layer. | 07-05-2012 |
20130000210 | ABRASIVE SEGMENT COMPRISING ABRASIVE AGGREGATES INCLUDING SILICON CARBIDE PARTICLES - An abrasive article can include an abrasive segment. The abrasive segment can have a body that includes a plurality of abrasive aggregates. In addition, the abrasive aggregates can include a plurality of silicon carbide particles bonded together by a binder material phase. The abrasive aggregates can be contained within a bond material that includes a magnesia-based cement. In an embodiment, the binder material phase can include a vitreous phase material and a crystalline phase material. In particular instances, the binder material phase can include a certain porosity. In another embodiment, the abrasive segment can be formed from a mixture of abrasive aggregates including silicon carbide and a magnesia-based bond material. | 01-03-2013 |
20130000212 | LIQUID PHASE SINTERED SILICON CARBIDE ABRASIVE PARTICLES - An abrasive article includes a bonded abrasive body having abrasive particles contained within a bond material. The abrasive particles include silicon carbide and are essentially free of carbon-based and boron-based sintering aid materials. In an embodiment, the bond material can include a phenolic resin. In another embodiment, the bonded abrasive body can include an oxide phase disposed interstitially between the silicon carbide abrasive particles. In an additional embodiment, the abrasive particles can consist essentially of silicon carbide and aluminum oxide in a ratio of silicon carbide to alumina of at least about 8:1. | 01-03-2013 |
20130000215 | ABRASIVE AGGREGATE INCLUDING SILICON CARBIDE AND A METHOD OF MAKING SAME - An abrasive article can include an abrasive aggregate with the abrasive aggregate having a plurality of silicon carbide particles bonded together by a binder material. The binder material can include a vitreous phase material, a crystalline phase material, or both. In an embodiment, the crystalline phase material can include an aluminosilicate material. In a particular embodiment, abrasive aggregates can be formed from a mixture including silicon carbide particles, a binder material, and a liquid carrier. The mixture can be formed into a number of green granules that are vibrated and heated on a platen. In an illustrative embodiment, the green granules can then be heated to form abrasive aggregates. | 01-03-2013 |
20130000216 | ABRASIVE ARTICLES INCLUDING ABRASIVE PARTICLES OF SILICON NITRIDE - An abrasive article includes a body having abrasive particles contained within a bond material. The abrasive particles can include a majority content of silicon nitride and a minority content of sintering material including at least two rare-earth oxide materials. In an embodiment, the rare-earth oxide materials can include Nd | 01-03-2013 |
20130005221 | METHOD OF POLISHING A WORKPIECE WITH AN ABRASIVE SEGMENT COMPRISING ABRASIVE AGGREGATES HAVING SILICON CARBIDE PARTICLES - A method of polishing a workpiece can include placing a workpiece on a support structure. In an embodiment, the method can also include contacting the workpiece with an abrasive segment. The abrasive segment can include a plurality of abrasive aggregates that include silicon carbide particles bound together in a binder material. Additionally, the method can include moving the abrasive segment and the workpiece relative to each other. | 01-03-2013 |
20140345204 | LIQUID PHASE SINTERED SILICON CARBIDE ABRASIVE PARTICLES - An abrasive article includes a bonded abrasive body having abrasive particles contained within a bond material. The abrasive particles include silicon carbide and are essentially free of carbon-based and boron-based sintering aid materials. In an embodiment, the bond material can include a phenolic resin. In another embodiment, the bonded abrasive body can include an oxide phase disposed interstitially between the silicon carbide abrasive particles. In an additional embodiment, the abrasive particles can consist essentially of silicon carbide and aluminum oxide in a ratio of silicon carbide to alumina of at least about 8:1. | 11-27-2014 |