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Groenewold
Gary S. Groenewold, Idaho Falls, ID US
| Patent application number | Description | Published |
|---|---|---|
| 20100206326 | METHODS FOR REMOVING CONTAMINANT MATTER FROM A POROUS MATERIAL - Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material from the surface. Systems for decontaminating a contaminated structure comprising porous material include a radiation device configured to emit electromagnetic radiation toward a surface of a structure, and at least one spray device configured to apply a capture material onto the surface of the structure. Polymer materials that can be used in such methods and systems include polyphosphazine-based polymer materials having polyphosphazine backbone segments and side chain groups that include selected functional groups. The selected functional groups may include iminos, oximes, carboxylates, sulfonates, β-diketones, phosphine sulfides, phosphates, phosphites, phosphonates, phosphinates, phosphine oxides, monothio phosphinic acids, and dithio phosphinic acids. | 08-19-2010 |
| 20100206345 | SYSTEMS AND STRIPPABLE COATINGS FOR DECONTAMINATING STRUCTURES THAT INCLUDE POROUS MATERIAL - Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material from the surface. Systems for decontaminating a contaminated structure comprising porous material include a radiation device configured to emit electromagnetic radiation toward a surface of a structure, and at least one spray device configured to apply a capture material onto the surface of the structure. Polymer materials that can be used in such methods and systems include polyphosphazine-based polymer materials having polyphosphazine backbone segments and side chain groups that include selected functional groups. The selected functional groups may include iminos, oximes, carboxylates, sulfonates, β-diketones, phosphine sulfides, phosphates, phosphites, phosphonates, phosphinates, phosphine oxides, monothio phosphinic acids, and dithio phosphinic acids. | 08-19-2010 |
Gerrit Groenewold, Ramona, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100302692 | SHORT-CIRCUIT PROTECTION FOR SWITCHED OUTPUT STAGES - Short-circuit protection in switched output stages is described to protect switching output stages from excessive output current in short-circuit conditions which may cause device damage. Design techniques to attain this goal include measuring currents in switching transistors by placing a scaled transistor in parallel thereto, combined with circuitry for making drain voltages substantially equal. The various techniques for short-circuit protection comprise (a) using a transistor and an operational amplifier in combination, (b) using a single transistor in place of the operational amplifier, (c) using a circuit to generate over-current detection signals, (d) providing over-current detection signals to a driver in order to reduce the output current, (e) using an inverter to feedback regulate output current, (f) using a switch to bypass the current regulator during normal operation, and (g) automatically opening this switch in an over-current situation. | 12-02-2010 |
Gerrit Groenewold, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100289682 | SIGMA-DELTA CONVERTERS AND METHODS FOR ANALOG-TO-DIGITAL CONVERSION - A switched capacitor sigma-delta modulator or another analog-to-digital converter (ADC) uses chopper stabilization. Chopping clock transitions are performed during non-active periods of the sampling clock phases, reducing disturbance of the circuit caused by chopping and increasing the time available for settling of the circuit given a particular sampling frequency. An asynchronous state machine may govern sampling and chopping clock transitions. In embodiments, inactive transition of a first sampling clock causes inactive transition of a second chopping clock, which in turn causes active transition of a first chopping clock. The next inactive transition of the first sampling clock causes inactive transition of the first chopping clock, which causes an active transition of the second chopping clock. | 11-18-2010 |
Jan Groenewold, Diemen NL
| Patent application number | Description | Published |
|---|---|---|
| 20090014030 | Substrates and methods of using those substrates - A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed. | 01-15-2009 |