| Patent application number | Description | Published |
|---|
| 20090016679 | Ultra-wide band AWG multiplexer - A multiplexing AWG device capable of producing an ultra-wideband, low ripple, flat-top signal is presented. The AWG device includes an AWG unit and a two-section waveguide coupled to the AWG unit. The two-section waveguide has a first section and a second section. The first section produces a signal having a double-peak field profile and has a first input end and a first output end. The second section reduces the phase variation of the signal having the double-peak field profile exiting the first section. The second section has a second input end that is coupled to the first output end. For example, the first section may be a parabolic tapered waveguide and the second section may be a rectangular waveguide. | 01-15-2009 |
| 20090185806 | Broadcasting arrayed waveguide - The invention is a data transmission device that includes: an input Free Propagation Region (FPR) receiving a multi-wavelength signal and a single-wavelength signal, and two sets of arrayed waveguides coupled to the input FPR to carry the multi-wavelength signal and the single-wavelength signal, respectively. The arrayed waveguides demultiplex the multi-wavelength signal and create copies of the single-wavelength signal. The output plane of an output FPR receives the demultiplexed wavelengths and the copies of the single-wavelength signal such that one of the demultiplexed wavelengths and one of the copies of the single-wavelength signal focus onto the same position on the output plane. The device allows data (e.g., video stream) to be broadcast to all subscribers in a Wavelength-Division-Multiplexed Passive Optical Network (WDM-PON) architecture. A multicasting apparatus can be implemented by using a plurality of these devices and using different wavelengths for the single-wavelength signal for the different devices. | 07-23-2009 |
| 20110249071 | Apparatuses and methods for irradiating a substrate to avoid substrate edge damage - Apparatuses and methods are provided for processing a substrate having an upper surface that includes a central region, a peripheral region, and an edge adjacent to the peripheral region. An image having an intensity sufficient to effect thermal processing of the substrate is scanned across the upper surface of the substrate. The image scanning geometry allows processing the central region of the substrate at a substantially uniform temperature without damaging the outer edge. In some instances, the image may be formed from a beam traveling over at least a portion of the central region so that no portion thereof directly illuminates any portion of the edge when the image is scanned across the periphery region. The substrate may be rotated 180° or the beam direction may be switched after part of the scanning operation has been completed. | 10-13-2011 |
