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Gregarek
Andre Gregarek, Munich DE
| Patent application number | Description | Published |
|---|---|---|
| 20100175843 | DEWATERING SCREEN AND METHOD FOR THE PRODUCTION THEREOF - The present invention relates to a dewatering screen for manufacturing paper having multi-level watermarks, having a carrier mold ( | 07-15-2010 |
| 20100320742 | SECURITY ELEMENT AND METHOD FOR PRODUCING THE SAME - The present invention relates to a method for manufacturing a security element ( | 12-23-2010 |
André Gregarek, Munchen DE
| Patent application number | Description | Published |
|---|---|---|
| 20100164217 | Security Feature and Method for Manufacturing the Same - A method for manufacturing a security feature for a security element, a security paper or a data carrier that exhibits a substrate into which at least one through opening and at least one marking in registration with the through opening are to be introduced. | 07-01-2010 |
André Gregarek, Munchen DE
| Patent application number | Description | Published |
|---|---|---|
| 20100164217 | Security Feature and Method for Manufacturing the Same - A method for manufacturing a security feature for a security element, a security paper or a data carrier that exhibits a substrate into which at least one through opening and at least one marking in registration with the through opening are to be introduced. | 07-01-2010 |
André Gregarek, Muenchen DE
| Patent application number | Description | Published |
|---|---|---|
| 20120098249 | SECURITY ELEMENT, SECURITY SYSTEM AND PRODUCTION METHODS THEREFOR - The invention relates to a security element for security papers, value documents or the like, with a carrier having an upper side and a lower side and comprising several reflective first micro-imaging elements flatly arranged in a first pattern, and second micro-imaging elements flatly arranged in a second pattern, a first microstructure object which contains several first microstructures which are arranged in a first microstructure pattern so adapted to the first pattern that the first microstructure object is imaged in magnified form in front of the upper side by means of the first micro-imaging elements, and a second microstructure object which contains several second microstructures which are arranged in a second microstructure pattern so adapted to the second pattern that the second microstructure object is imaged in magnified form in front of the underside by means of the second micro-imaging elements. | 04-26-2012 |