Grabarz

Andrew Grabarz, Cicero, IN US

Patent application number	Description	Published
20090302514	GAS SPRING ASSEMBLY AND SPACER - A cooperative mounting arrangement for an end member or spacer of a gas spring assembly includes a recess formed into one of the end member and the spacer. A projection is provided on or along an associated structural component. The recess receives the projection such that lateral forces acting on the end member of the gas spring assembly can be transferred to the associated structural component.	12-10-2009

Patent application number	Description	Published
20080268022	MEHTODS FOR TREATING AND PREVENTING AILMENTS CAUSED BY HUMAN PAPILLOMAVIRUS - This application discusses methods and compositions for preventing and treating ailments and/or diseases, such as HPV, with carrageenan. Moreover, methods and systems for administering carrageenan are described herein. In some embodiments, carrageenan (i.e., carrageenan, carrageenan prodrugs, carrageenan metabolites, carrageenan derivatives, and so forth) may be used prophylacticly in order prevent and/or slow a subject from receiving an ailment and/or disease. In other embodiments, carrageenan may be used to treat, suppress, and/or ameliorate an ailment and/or disease after a subject has a condition. While carrageenan may be administered alone, in some cases, the beneficial effects of carrageenan can be synergistically or additively improved by co-administering carrageenan with a polyamide, a polyamide-like compound, and/or surfactant. While the active ingredient(s) may be administered in any form, some preferred forms may include the use of a gel, foam, spray, solution or an intravaginal ring comprising the active ingredient(s).	10-30-2008

Patent application number	Description	Published
20080286660	DAMASCENE RETICLE AND METHOD OF MANUFACTURE THEREOF - A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing actinic radiation. Sacrificial materials may be added to the recess temporarily prior to filling the recess to provide gaps juxtaposed with the material filling the recess. Thereafter, the sacrificial materials are removed. Then the projection mask is planarized leaving feature recesses filled with transmissivity modifying material, and any gaps desired. The projection mask is planarized while retained in a fixture holding it in place during polishing with a polishing tool and a slurry.	11-20-2008