| Patent application number | Description | Published |
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| 20080216958 | Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Methods for Manufacturing the Same - Plasma reaction apparatus having pre-seasoned showerheads and methods for pre-seasoning a showerhead of a plasma reaction apparatus are provided. In an embodiment, a method for seasoning a showerhead prior to installation in a plasma reaction apparatus comprises cleaning the showerhead, positioning the showerhead in a deposition chamber, and forming a continuous, substantially uniform protective layer on the showerhead. | 09-11-2008 |
| 20080248656 | METHODS FOR STRIPPING PHOTORESIST AND/OR CLEANING METAL REGIONS - Methods are provided for cleaning metal regions overlying semiconductor substrates. A method for removing material from a metal region comprises heating the metal region, forming a plasma from a gas comprising hydrogen and carbon dioxide, and exposing the metal region to the plasma. | 10-09-2008 |
| 20090053901 | HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY - Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss. | 02-26-2009 |
| 20090056875 | Enhanced stripping of low-K films using downstream gas mixing - The present invention pertains to methods for removing unwanted material from a work piece. More specifically, the invention pertains to stripping photo-resist material and removing etch-related residues from a semiconductor wafer during semiconductor manufacturing. Methods involve implementing a hydrogen plasma operation with downstream mixing with an inert gas. The invention is effective at stripping photo-resist and removing residues from low-k dielectric material used in Damascene devices. | 03-05-2009 |
| Patent application number | Description | Published |
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| 20090123717 | PREPREG, INTERMEDIATE MATERIAL FOR FORMING FRP, AND METHOD FOR PRODUCTION THEREOF AND METHOD FOR PRODUCTION OF FIBER-REINFORCED COMPOSITE MATERIAL - An FRP is produced using a prepreg comprising reinforcing fiber, a sheet-like reinforcing fiber substrate containing reinforcing fiber, and a matrix resin, wherein the matrix resin is impregnated into the sheet-like reinforcing fiber substrate and also covers one surface of the sheet-like reinforcing fiber substrate, and the matrix resin impregnation ratio is within a range of 35% to 95%; a prepreg comprising reinforcing fiber, a sheet-like reinforcing fiber substrate containing reinforcing fiber, and a matrix resin, wherein the matrix resin exists on both surfaces of the sheet-like reinforcing fiber substrate, and the portion inside the sheet-like reinforcing fiber substrate into which the matrix resin has not been impregnated is continuous; or a prepreg comprising reinforcing fiber, a sheet-like reinforcing fiber substrate containing reinforcing fiber, and a matrix resin, wherein at least one surface exhibits a sea-and-island-type pattern comprising resin-impregnated portions (island portions) where the matrix resin is present at the surface and fiber portions (sea portions) where the matrix resin is not present at the surface, the surface coverage ratio of the matrix resin on those surfaces with said a sea-and-island-type pattern is within a range of 3% to 80%, and the weave intersection coverage ratio for the island portions, represented by a formula (1) shown below, is at least 40%, displays excellent external appearance, with no internal voids or surface pinholes, even when molded is conducted using only vacuum pressure. | 05-14-2009 |
| 20090202832 | EPOXY RESIN FOR PREPREG, PREPREG, FIBER-REINFORCED COMPOSITE MATERIAL, AND PROCESSES FOR PRODUCING THESE - An epoxy resin composition suitably used for a prepreg which can complete curing in a short time even at a low temperature and secure a sufficient usable period under preservation at room temperature, in comparison with conventional epoxy resin compositions. An epoxy resin composition comprising at least one of an epoxy resin, an amine compound having at least one sulfur atom in the molecule thereof, and a reaction product of an epoxy resin and an amine compound having at least one sulfur atom in the molecule thereof, and an amine compound having at least one sulfur atom in the molecule thereof, and a urea compound and a dicyandiamide, wherein each of the contents of the sulfur atom and the urea compound in the epoxy resin composition is respectively 0.2 to 7% by mass and 1 to 15% by mass. | 08-13-2009 |
| 20110151206 | PREPREG, INTERMEDIATE MATERIAL FOR FORMING FRP, AND METHOD FOR PRODUCTION THEREOF AND METHOD FOR PRODUCTION OF FIBER-REINFORCED COMPOSITE MATERIAL - An FRP is produced using a prepreg comprising reinforcing fiber, a sheet-like reinforcing fiber substrate containing reinforcing fiber, and a matrix resin, wherein the matrix resin is impregnated into the sheet-like reinforcing fiber substrate and also covers one surface of the sheet-like reinforcing fiber substrate, and the matrix resin impregnation ratio is within a range of 35% to 95%; a prepreg comprising reinforcing fiber, a sheet-like reinforcing fiber substrate containing reinforcing fiber, and a matrix resin, wherein the matrix resin exists on both surfaces of the sheet-like reinforcing fiber substrate, and the portion inside the sheet-like reinforcing fiber substrate into which the matrix resin has not been impregnated is continuous; or a prepreg comprising reinforcing fiber, a sheet-like reinforcing fiber substrate containing reinforcing fiber, and a matrix resin, wherein at least one surface exhibits a sea-and-island-type pattern comprising resin-impregnated portions (island portions) where the matrix resin is present at the surface and fiber portions (sea portions) where the matrix resin is not present at the surface, the surface coverage ratio of the matrix resin on those surfaces with said a sea-and-island-type pattern is within a range of 3% to 80%, and the weave intersection coverage ratio for the island portions, represented by a formula (1) shown below, is at least 40%, displays excellent external appearance, with no internal voids or surface pinholes, even when molded is conducted using only vacuum pressure. | 06-23-2011 |
