Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Gondhalekar, US
Mangesh Madhukar Gondhalekar, Campbell, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090175591 | MULTIMEDIA SCHEDULER - A song and ad scheduler supporting clip-based and stream-based scheduling of multimedia items generates several hours of schedule in advance. Having multiple channel capability, the scheduler uses as inputs: the channel, associated playlists, rotation pattern for the channel, and associated programming rules to produce a schedule of multimedia items for the channel. Initially, the scheduler produces a schedule for each channel of predetermined length; then it periodically revisits the channel to add more songs, keeping the schedule to the desired length. Length of the initial playlist is configurable. The scheduler uses a producer-consumer model for distributing work. Producer threads periodically scan the system for work to be done. When a producer thread encounters work to be done, e.g. adding to the schedule of a channel, the producer thread places a work request into a queue. Worker threads consume the work requests by fulfilling the requested work. | 07-09-2009 |
Sudhir Gondhalekar, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090034147 | Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing - A method and apparatus for providing a fluid distribution element for an electrostatic chuck that reduces plasma formation and arcing within heat transfer fluid passages. One embodiment comprises a plate and a dielectric component, where the dielectric component is inserted into the plate. The plate is adapted to be positioned within a channel to define a plenum, wherein the dielectric component provides at least a portion of a fluid passage coupled to the plenum. A porous dielectric layer, formed upon the dielectric component, provides at least another portion of a fluid passage coupled to the plenum. In other embodiments, the fluid distribution element comprises various arrangements of components to define a fluid passage that does not provide a line-of-sight path from the support surface for a substrate to a plenum. | 02-05-2009 |
| 20090034148 | Method of making an electrostatic chuck with reduced plasma penetration and arcing - A method of making an electrostatic chuck comprising positioning a plate into a channel in a body to form a plenum and inserting a dielectric component into an opening in the plate, where the dielectric component defines a portion of a passage from the plenum. Thereafter, depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface. The dielectric layer is polished to a specified thickness. In one embodiment, the polishing process forms an opening through the dielectric layer to enable the dielectric component to define a passage between the support surface and the plenum. In another embodiment, at least a portion of the dielectric layer is porous proximate the dielectric component such that the porous dielectric layer and the dielectric component form a passage between the support surface and the plenum. In a further embodiment, a hole is formed through the dielectric layer and the hole in the dielectric layer and the dielectric component form a passage between the support surface and the plenum. | 02-05-2009 |
| 20090034149 | Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing - A method for refurbishing at least a portion of an electrostatic chuck. The method comprises removing a first dielectric component from a fluid distribution element of the electrostatic chuck and replacing the first dielectric component with a second dielectric component. | 02-05-2009 |
| 20090266299 | LOW PROFILE PROCESS KIT - Embodiments of process kits for substrate supports of semiconductor substrate process chambers are provided herein. In some embodiments, a process kit for a semiconductor process chamber may include an annular body being substantially horizontal and having an inner and an outer edge, and an upper and a lower surface; an inner lip disposed proximate the inner edge and extending vertically from the upper surface; and an outer lip disposed proximate the outer edge and on the lower surface, and having a shape conforming to a surface of the substrate support pedestal. In some embodiments, a process kit for a semiconductor process chamber my include an annular body having an inner and an outer edge, and having an upper and lower surface, the upper surface disposed at a downward angle of between about 5-65 degrees in an radially outward direction from the inner edge toward the outer edge. | 10-29-2009 |
Sudhir R. Gondhalekar, Pleasanton, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100095979 | REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN STEPS - A remote plasma process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber after processing a substrate disposed in the substrate processing chamber. In one embodiment, the substrate is transferred out of the substrate processing chamber and a flow of a fluorine-containing etchant gas is introduced into a remote plasma source where reactive species are formed. A continuous flow of the reactive species from the remote plasmas source to the substrate processing chamber is generated while a cycle of high and low pressure clean steps is repeated. During the high pressure clean step, reactive species are flown into the substrate processing chamber while pressure within the substrate processing chamber is maintained between 4-15 Torr. During the low pressure clean step, reactive species are flown into the substrate processing chamber while reducing the pressure of the substrate processing chamber by at least | 04-22-2010 |
Vijay Gondhalekar, New York, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080306980 | Method for Predicting Treatment Classes Using Animal Behavior Informatics - A system and method used to assess animal behavior includes a module having sensors that collects a variety of physical and biological data from a test subject. Interpretation of the data is provided to assess the test subjects behavior, neurology, biochemistry and physiology. The module is useful in observing the effects of a drug on the test animal and providing information on the drug's signature. Another advantage is the module's portability that allows it to be used in standard laboratory cages. This portability allows the animal to be tested in its own habitat, that can reduce any erroneous data due to stressing the animal when removed to a test cage. Additionally, the module's design allows for parallel data collection and interpretation from several laboratory animals undergoing different experiments. Multi-dimensional modeling of the test subject based the system's interpretation of the data allows pattern recognition of the drug signature, and predictive drug analysis. | 12-11-2008 |
| 20100106743 | Method for Predicting Treatment Classes Using Behavior Informatics - A system and method used to assess animal behavior includes a module having sensors that collects a variety of physical and biological data from a test subject. Interpretation of the data is provided to assess the test subject's behavior, neurology, biochemistry and physiology. The module is useful in observing the effects of a drug on the test animal and providing information on the drug's signature. Another advantage is the module's portability that allows it to be used in standard laboratory cages. This portability allows the animal to be tested in its own habitat, that can reduce any erroneous data due to stressing the animal when removed to a test cage. Additionally, the module's design allows for parallel data collection and interpretation from several laboratory animals undergoing different experiments. Multi-dimensional modeling of the test subject based the system's interpretation of the data allows pattern recognition of the drug signature, and predictive drug analysis. | 04-29-2010 |