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Glodde
Martin Glodde, Yorktown Heights, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110042653 | Near-Infrared Absorbing Film Compositions - A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film. | 02-24-2011 |
| 20110042771 | Near-Infrared Absorbing Film Compositions - A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film. | 02-24-2011 |
Martin Glodde, Mahawah, NJ US
| Patent application number | Description | Published |
|---|---|---|
| 20090176173 | IONIC, ORGANIC PHOTOACID GENERATORS FOR DUV, MUV AND OPTICAL LITHOGRAPHY BASED ON PERACEPTOR-SUBSTITUTED AROMATIC ANIONS - A photoacid generator compound P | 07-09-2009 |
Martin Glodde, Mahwah, NJ US
| Patent application number | Description | Published |
|---|---|---|
| 20090176175 | PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY - A photoacid generator P | 07-09-2009 |
Martin Glodde, Armonk, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110143099 | Photoacid Generators for Extreme Ultraviolet Lithography - A photoacid generator P | 06-16-2011 |
Martin Glodde, Hopewell Junction, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110262862 | NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM - A composition comprising (A) a near-infrared absorbing dye of formula (1), (B) a polymer, and (C) a solvent is used to form a near-infrared absorptive layer. In formula (1), R | 10-27-2011 |
| 20110262863 | NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM - A near-infrared absorptive layer is formed from a composition comprising (A) an acenaphthylene polymer, (B) a near-infrared absorbing dye, and (C) a solvent. When a multilayer film comprising the near-infrared absorptive layer and a photoresist layer is used in optical lithography, the detection accuracy of optical auto-focusing is improved, allowing the optical lithography to produce a definite projection image with an improved contrast and succeeding in forming a better photoresist pattern. | 10-27-2011 |