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Gilissen, NL
Dionisius Maria Joseph Guillaume Gilissen, Eijsden NL
| Patent application number | Description | Published |
|---|---|---|
| 20080207839 | Block Copolyetherester Elastomer and Preparation Thereof - The invention relates to a process for the preparation of a block copolyetherester elastomer comprising polyester hard blocks and poly(alkylene oxide) polyol soft blocks, wherein at least one aromatic dicarboxylic acid or an ester-forming derivative thereof, and at least one alkylene diol, are esterified with a poly(alkylene oxide) polyol, comprising an poly(propylene oxide), end capped with ethylene oxide, are esterified, an ethylene oxide content of between 22 and 90% by weight, relative to the total weight of the poly(alkylene oxide) polyol, and an unsaturation content, being the total content of vinyl and allyl groups, of less than 35 meq per kg poly(alkylene oxide) polyol. The invention also relates to a block copolyetherester elastomer obtainable by said process, comprising an poly(propylene oxide) end capped with ethylene oxide, an Mn of between 2500 and 5000 g/mol; and an ethylene oxide content of between 22 and 90% by weight; and wherein the block copolyetherester elastomer has a ratio by weight of poly(alkylene oxide) polyol/aromatic dicarboxylic acid or the ester-forming derivative thereof of between 60/40 and 90/10; an average degree of polymerization of the polyester block of at least 3.5; and the block copolyetherester elastomer has an Mn of at least 25,000 g/mol. | 08-28-2008 |
Dionislus Maria Joseph Gilissen, Eljsden NL
| Patent application number | Description | Published |
|---|---|---|
| 20110177742 | FUNCTIONAL SHEET - The invention is directed to a functional sheet, to a method for preparing said sheet, to a packaging material and to the use of said packaging material. The functional sheet of the invention comprises a porous polymeric carrier having a porosity of at least 60%, preferably at least 80%, more preferably at least 90%, wherein said polymeric carrier comprises one or more functional compounds, which functional compound provides said sheet with at least one function selected from sensing, scavenging and releasing and wherein the polymeric carrier comprises one or more polyolefins and the average pore size of the polymeric carrier is at least 0.11 μm. | 07-21-2011 |
Noud Jan Gilissen, 'S-Gravenzande NL
| Patent application number | Description | Published |
|---|---|---|
| 20090296056 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table. | 12-03-2009 |
| 20100141914 | LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS - A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object. | 06-10-2010 |
| 20100214549 | LITHOGRAPHIC APPARATUS, A METHOD FOR REMOVING MATERIAL OF ONE OR MORE PROTRUSIONS ON A SUPPORT SURFACE, AND AN ARTICLE SUPPORT SYSTEM - A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool. | 08-26-2010 |
| 20100272846 | ACTUATOR - An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face. | 10-28-2010 |
| 20110069298 | SUPPORT OR TABLE FOR LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING SUCH SUPPORT OR TABLE AND LITHOGRAPHIC APPARATUS COMPRISING SUCH SUPPORT OR TABLE - A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm | 03-24-2011 |
Noud Jan Gilissen, Gravenzande NL
| Patent application number | Description | Published |
|---|---|---|
| 20100165319 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high. | 07-01-2010 |
Noud Jan Gilissen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20080278697 | Lithographic apparatus and device manufacturing method - A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa. | 11-13-2008 |