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Gilberto Curatola, Korbek-Lo BE

Gilberto Curatola, Korbek-Lo BE

Patent application numberDescriptionPublished
20080277739Finfet Transistors - A fin FET array includes a number of fins 11-13-2008
20090289298SELF-ALIGNED IMPACT-IONIZATION FIELD EFFECT TRANSISTOR - An impact ionisation MOSFET is formed with the offset from the gate to one of the source/drain regions disposed vertically within the device structure rather than horizontally. The semiconductor device comprises a first source/drain region having a first doping level; a second source/drain region having a second doping level and of opposite dopant type to the first source/drain region, the first and second source/drain regions being laterally separated by a silicon-germanium intermediate region having a doping level less than either of the first and second doping levels; a gate electrode electrically insulated from, and disposed over, the intermediate region, the first and second source/drain regions being laterally aligned with the gate electrode; where the entire portion of the first source/drain region that forms a boundary with the intermediate region is separated vertically from the top of the intermediate region.11-26-2009
20100025766TRANSISTOR DEVICE AND METHOD OF MANUFACTURING SUCH A TRANSISTOR DEVICE - A transistor device (02-04-2010
20100044760SELF-ALIGNED IMPACT-IONIZATION FIELD EFFECT TRANSISTOR - An impact ionisation MOSFET is formed with the offset from the gate to one of the source/drain regions disposed vertically within the device structure rather than horizontally. The semiconductor device comprises a first source/drain region having a first doping level; a second source/drain region having a second doping level and of opposite dopant type to the first source/drain region, the first and second source/drain regions being laterally separated by an intermediate region having a doping level less than either of the first and second doping levels; a gate electrode electrically insulated from, and disposed over, the intermediate region, the first and second source/drain regions being laterally aligned with the gate electrode; where the entire portion of the first source/drain region that forms a boundary with the intermediate region is separated vertically from the top of the intermediate region.02-25-2010
20100066348APPARATUS AND METHOD FOR MOLECULE DETECTION USING NANOPORES - A detector device comprises a substrate (03-18-2010
20100097135TUNNEL FIELD EFFECT TRANSISTOR - A tunnel transistor includes source diffusion (04-22-2010
20110018065METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device is disclosed comprising providing an insulating carrier (01-27-2011
20110208457ELECTROCHEMICAL POTENTIOMETRIC SENSING WITHOUT REFERENCE ELECTRODE - The invention relates to a method of determining a charged particle concentration in an analyte (08-25-2011

Patent applications by Gilberto Curatola, Korbek-Lo BE