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Getty, US

David Getty, Bedford, MA US

Patent application numberDescriptionPublished
20090147073Methods and Systems for Stereoscopic Three Dimensional Viewing - A method and system for three dimensional viewing of stereo images of an object or cavity includes using an imaging machine to obtain images representative of either a physical volume or a volumetric set of data. A computing machine can be used to identify image elements within the volumetric set of data by executing a ray tracing function to identify image elements along a path that is directed through the collection of images or sequentially ordered stack of images. The computing machine further applies a weighting function to intensity values related to the identified image elements. The computing machine generates at least one image element value based in part on the identified image elements, and based in part on the results generated from the executing of the ray tracing function and the application of the weighting function. Using the at least one image element value, the computing machine derives a pair of stereo images. Alternatively, the computing machine can select from within a collection of images representative of a physical volume, stereo pairs of images. The stereo pairs of images are displayed on a viewing apparatus.06-11-2009
20090147074Methods and Systems for Marking Stereo Pairs of Images - Systems and methods for marking stereo pairs of images include an imaging device for retrieving a collection of images that are representative of a volume, where the images can be representative of a physical volume or a volumetric set of data. A computing machine identifies image elements within the retrieved collection of images representative of a volumetric set of data, and further generates image element values that are based in part on the identified image elements. The computing machine further generates a stereoscopic pair of projection images having two members, where each member of the pair is based in part on at least one image element value generated by the computing machine. A viewing apparatus displays either the calculated stereoscopic pair of projection images or a pair of stereo images selected from images representative of a physical volume, such that when the pair of images are viewed through a portion of the viewing apparatus, the resultant display is a perceived three dimensional image. An input device or computer application is further used to position a marker within the stereoscopic pair of projection images to identify a location within the stereo pair of images.06-11-2009

Heather L. Getty, Plymouth, MN US

James Getty, Vacaville, CA US

Patent application numberDescriptionPublished
20090099512SYRINGES WITH A REDUCED SUSCEPTIBILITY TO FREEZE-THAW VOID FORMATION AND METHODS OF MANUFACTURING SUCH SYRINGES - Syringes for holding fluids susceptible to void formation when the syringe and fluid are frozen and thawed before use. The interior surface of the syringe barrel is modified by exposure to a plasma such that the incidence of void formation in the fluid is prevented or, at the least, significantly reduced in comparison with conventional syringes.04-16-2009
20120234720SYRINGES WITH A REDUCED SUSCEPTIBILITY TO FREEZE-THAW VOID FORMATION AND METHODS OF MANUFACTURING SUCH SYRINGES - Syringes for holding fluids susceptible to void formation when the syringe and fluid are frozen and thawed before use. The interior surface of the syringe barrel is modified by exposure to a plasma such that the incidence of void formation in the fluid is prevented or, at the least, significantly reduced in comparison with conventional syringes.09-20-2012

Patent applications by James Getty, Vacaville, CA US

James D. Getty, Vacaville, CA US

Patent application numberDescriptionPublished
20080296261APPARATUS AND METHODS FOR IMPROVING TREATMENT UNIFORMITY IN A PLASMA PROCESS - Apparatus and methods for improving treatment uniformity in a plasma process. The sacrificial body, which is extends about an outer peripheral edge of the workpiece during plasma processing, is composed of a plasma-removable material. The sacrificial body may include multiple sections that are arranged to define a circular geometrical shape. The sacrificial body functions to increase the effective outer diameter of the workpiece, which operates to alleviate detrimental edge effects intrinsic to plasma processing by effectively reducing the etch rate near the outer peripheral edge of the workpiece.12-04-2008
20090288773MULTIPLE-ELECTRODE PLASMA PROCESSING SYSTEMS WITH CONFINED PROCESS CHAMBERS AND INTERIOR-BUSSED ELECTRICAL CONNECTIONS WITH THE ELECTRODES - Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.11-26-2009
20100075505PLASMA PROCESSING APPARATUS AND METHODS FOR REMOVING EXTRANEOUS MATERIAL FROM SELECTED AREAS ON A SUBSTRATE - Apparatus and methods for shielding a feature projecting from a first area on a substrate to a plasma while simultaneously removing extraneous material from a different area on the substrate with the plasma. The apparatus includes at least one concavity positioned and dimensioned to receive the feature such that the feature is shielded from the plasma. The apparatus further includes a window through which the plasma removes the extraneous material. The method generally includes removing the extraneous material while shielding the feature against plasma exposure.03-25-2010
20100140223Plasma Treatment System - A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.06-10-2010
20100194505MAGNETIC CLIPS AND SUBSTRATE HOLDERS FOR USE IN A PLASMA PROCESSING SYSTEM - Magnetic clips for use with a substrate holder for holding a substrate in a processing chamber of a plasma treatment system. The clip includes first and second body members each having a clamping surface and a magnet. The first body member is configured to be mechanically connected with the substrate holder. The second body member is pivotally connected by a hinge with the first body member for movement relative to the first body member between closed and opened positions. In the closed position, an edge region of the substrate is positioned between the clamping surfaces. In the opened position, the edge region is released. The magnet on the second body member magnetically attracts the magnet on the first body member, when the second body member is in the closed position, to apply a force that restrains movement of the edge region of the substrate relative to the clamping surfaces.08-05-2010
20110000882APPARATUS AND METHODS FOR SUPPORTING WORKPIECES DURING PLASMA PROCESSING - Apparatus and methods for simultaneously supporting multiple workpieces inside a processing space of a plasma processing system for simultaneous two-sided plasma processing. The apparatus may be a fixture having a carrier plate configured to be supported inside the processing space and a plurality of first openings extending through the thickness of the carrier plate. The carrier plate is configured to contact each of the workpieces over an annular region at an outer peripheral edge so that the first and second sides of each of the workpieces is exposed to the plasma through a respective one of said plurality of first openings.01-06-2011
20120118857Plasma Treatment System - A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.05-17-2012

Patent applications by James D. Getty, Vacaville, CA US

James Donald Getty, Vacaville, CA US

Patent application numberDescriptionPublished
20120208321PASSIVATION LAYER FOR SEMICONDUCTOR DEVICE PACKAGING - Methods of protecting a surface of a copper layer or a copper bonding pad on a semiconductor device against oxidation. A surface of the layer or bonding pad is cleaned by removing an oxidation layer with a plasma. A polymer layer is formed on the cleaned surface of the layer using a plasma-enhanced deposition process to protect the cleaned surface of the layer against exposure to an oxidizing gas.08-16-2012

Jonathan Getty, Goleta, CA US

Patent application numberDescriptionPublished
20120273951Contact Metal for Hybridization and Related Methods - A contact structure for interconnecting a first substrate to an indium interconnect structure on a second substrate. The contact structure comprises a diffusive layer and a non-oxidizing layer, with a thickness of less than approximately 150 nm, positioned on the diffusive layer for alignment with the indium interconnect.11-01-2012

Krista L. Getty, Quakertown, PA US

Patent application numberDescriptionPublished
20100028333RECEPTOR FOR AMYLOID BETA AND USES THEREOF - Compositions and methods for identifying modulators of sortilin are described. The methods are particularly useful for identifying analytes that antagonize sortilin s effect on processing of amyloid precursor protein to Aβ peptide and thus useful for identifying analytes that can be used for treating Alzheimer disease.02-04-2010
20110014226 HIGH THROUGHPUT PROTEIN INTERACTION ASSAY - A method to identify small molecules useful as therapeutics and/or vaccines to prevent, alleviate or ameliorate a pathogenic infection or an autoimmune disorder. The method can be used to screen small molecule test compounds for the ability to disrupt particular antigen-antibody interactions of interest. In one embodiment, the antigen is a pathogen-derived antigen and the antibody decreases or inhibits virulence of the pathogen when bound to the antigen (e.g., a neutralizing antibody, antibody with serum bactericidal activity, etc.). In another embodiment, the antigen is a self-antigen (autoantigen) and the antibody is an autoantibody that is known to be associated with a pathological condition (e.g., autoimmune disorder). Compounds that bind to the antigen or antibody disrupt binding can be used as therapeutics to decrease or inhibit the autoimmune disorder.01-20-2011

Kristen Matthew Getty, Deerfield, IL US

Patent application numberDescriptionPublished
20080301964APPARATUS AND METHOD FOR DETERMINING WHETHER AN ENVELOPE IS IN OR OUT OF SPECIFICATION - A measuring gauge constructed of a transparent “L” shaped body having an elongated first arm and a second shorter arm disposed at 90 degrees to the first arm and defining a notch therein which forms a triangle with the first leg of the triangle angularly disposed with respect to the outer edge of the second arm. A plurality of indicia are carried by the two legs of the gauge. The indicia each include a center band sandwiched between outer bands with the inner and outer bands being of contrasting colors. The side edges of the gauge are inserted between the flaps and back panels of the envelope into engagement with a gum line and a depth of penetration is observed by determining the intersection of an edge of the envelope with the indicium along a side edge of the gauge thereby determining whether or not the envelope is in or out of specification.12-11-2008

Patrick J. Getty, Metuchen, NJ US

Patent application numberDescriptionPublished
20080242571Oil Containing Starch Granules For Delivering Benefit-Additives to a Substrate - An oil containing starch granule is provided comprising: 10-02-2008

Patent applications by Patrick J. Getty, Metuchen, NJ US

Ross Getty, Wilmington, DE US

Patent application numberDescriptionPublished
20090270627AROMATIC AND AROMATIC/HETEROAROMATIC MOLECULAR STRUCTURES WITH CONTROLLABLE ELECTRON CONDUCTING PROPERTIES - Aromatic and aromatic/heteroaromatic molecular structures with controllable electron conducting properties are derived from the incorporation of electron active substituents in selective positions.10-29-2009
20100115998Thick film sealing glass compositions for low temperature firing - The present invention is a composition that may be used for sealing applications in the manufacture of electronic devices. The composition includes organic vehicles that may be removed upon low temperature firing in air or inert atmospheres. The present invention is further a process for the use of the composition.05-13-2010
20110024691AROMATIC AND AROMATIC/HETEROAROMATIC MOLECULAR STRUCTURES WITH CONTROLLABLE ELECTRON CONDUCTING PROPERTIES - Aromatic and aromatic/heteroaromatic molecular structures with controllable electron conducting properties are derived from the incorporation of electron active substituents in selective positions.02-03-2011
20110119896METHOD OF MAKING AIR-FIRED CATHODE ASSEMBLIES IN FIELD EMISSION DEVICES - This invention relates a method for manufacturing cathode assemblies for field emission devices.05-26-2011
20110124261METHOD OF MAKING AIR-FIRED CATHODE ASSEMBLIES IN FIELD EMISSION DEVICES - This invention relates a method for manufacturing cathode assemblies for field emission devices.05-26-2011
20120135249AROMATIC AND AROMATIC/HETEROAROMATIC MOLECULAR STRUCTURES WITH CONTROLLABLE ELECTRON CONDUCTING PROPERTIES - Aromatic and aromatic/heteroaromatic molecular structures with controllable electron conducting properties are derived from the incorporation of electron active substituents in selective positions.05-31-2012
20120238054SCREEN-PRINTABLE QUATERNARY CHALCOGENIDE COMPOSITIONS - The present invention relates to screen-printable quaternary chalcogenide compositions. The present invention also provides a process for creating an essentially pure crystalline layer of the quaternary chacogenide on a substrate. Such coated substrates contain p-type to semiconductors and are useful as the absorber layer in a solar cell.09-20-2012

Patent applications by Ross Getty, Wilmington, DE US

Stephanie A. Getty, Washington, DC US

Patent application numberDescriptionPublished
20090078929NANOWIRE DEVICE AND METHOD OF MAKING A NANOWIRE DEVICE - A method of making nanowires includes providing a silicon substrate having a silicon dioxide insulation on the surface thereof. The silicon dioxide is etched to form one or more pillars, each having a plurality of sidewalls. A thin film of gold is deposited on a sidewall and is subjected to an annealing process. The annealing process causes the gold film to form a globular catalyst particle. The structure is placed in an LPCVD furnace into which is introduced silane gas. Silicon from the gas migrates through the catalyst particle and grows a nanowire from the sidewall of the pillar to a desired length. Electrical contacts are provided at each end of the nanowire to create an active component useable in an electronic circuit.03-26-2009
20100097058STRAIN-BASED CARBON NANOTUBE MAGNETOMETER - A carbon nanotube magnetometer including a system and method of making the same that includes a single-walled carbon nanotube network formed on a substrate. Electrodes are deposited on opposite ends of the network and a magnetic needle is deposited on the network between the electrodes. A trench is formed under the network in the substrate to facilitate movement of the needle.04-22-2010
20120217389ELECTROSPRAY IONIZATION FOR CHEMICAL ANALYSIS OF ORGANIC MOLECULES FOR MASS SPECTROMETRY - An electrospray ionization laboratory on a chip for in situ detection of organic molecules includes a substrate, an input for accepting organic molecule samples, an enrichment column for concentrating organic molecule samples and delivering a concentrated sample to a micro fluidic channel, an analytical column connected in serial to the enrichment column for accepting the concentrated sample, a detector for accepting a pressurized fluid output from the analytical column, and an output nozzle assembly for generating an electrospray output for mass spectrometry analysis. The nozzle assembly may include 1, 2 or 4 (arranged in a rectangular fashion) nozzles.08-30-2012

Patent applications by Stephanie A. Getty, Washington, DC US

Stephen James Getty US

Patent application numberDescriptionPublished
20110178260FLUOROPOLYMER COMPOSITIONS AND METHOD OF USE - A composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a monomer, or mixture of monomers, of formula (I):07-21-2011

Stephen James Getty, Wilmington, DE US

Patent application numberDescriptionPublished
20080202384Fluoropolymer compositions and method of use - A composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a monomer, or mixture of monomers, of formula (I):08-28-2008
20090072183POLYFLUOROETHER BASED POLYMERS - A composition which provides surface effects to substrates comprising a polymer containing at least one urea linkage prepared by 03-19-2009
20090087670FLUOROALKYL PHOSPHATE COMPOSITIONS - A composition comprising a compound of formula (I) or (II):04-02-2009
20100129668POLYFLUOROETHER-BASED PHOSPHATES - A composition comprising one or more compounds of formula (I) or (II):05-27-2010
20110200815FLUOROALKYL PHOSPHATE COMPOSITIONS - A composition comprising a compound of formula (I) or (II):08-18-2011
20110200820POLYFLUOROETHER BASED POLYMERS - A composition which provides surface effects to substrates comprising a polymer containing at least one urea linkage prepared by 08-18-2011
20120070580FLUOROPOLYMER COMPOSITIONS AND TREATED SUBSTRATES - A polymer having at least one urea linkage prepared by: (i) reacting (a) at least one diisocyanate, polyisocyanate, or mixture thereof, having isocyanate groups, and (b) at least one fluorinated compound selected from the formula (I):03-22-2012

Patent applications by Stephen James Getty, Wilmington, DE US