Patent application number | Description | Published |
20140105583 | APPARATUS FOR PROVIDING AND DIRECTING HEAT ENERGY IN A PROCESS CHAMBER - Apparatus for providing heat energy to a process chamber are provided herein. The apparatus may include a process chamber body of the process chamber, a solid state source array having a plurality of solid state sources, disposed on a first substrate, to provide heat energy to the process chamber to heat a target component disposed in the process chamber body, and at least one reflector disposed on the first substrate proximate to one or more of the plurality of solid state sources to direct heat energy provided by the one or more of the plurality of solid state sources towards the target component. | 04-17-2014 |
20140270731 | THERMAL MANAGEMENT APPARATUS FOR SOLID STATE LIGHT SOURCE ARRAYS - Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include a process chamber comprising a chamber body, a solid state light source array, having a plurality of solid state light sources disposed on a first substrate, to provide pulsed or continuous energy to the process chamber, and a cooling mechanism including a band pass filter to reduce an amount of reflected light from heating the solid state source array. | 09-18-2014 |
20140270735 | HIGH DENSITY SOLID STATE LIGHT SOURCE ARRAY - Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include: a process chamber body of the semiconductor process chamber; one or more solid state source arrays providing pulsed or continuous energy to the process chamber, wherein each of the one or more solid state source arrays include a substrate having a plurality of solid state light sources disposed on a first surface of the substrate, wherein the plurality of solid state light sources are connected in series and in a recursive pattern on the first surface of the substrate, and a heat sink coupled to a second surface of the substrate configured to remove heat from the substrate; and a power source coupled to the one or more solid state source arrays to electrically power the plurality of solid state sources. | 09-18-2014 |
Patent application number | Description | Published |
20140218503 | APPARATUS AND METHOD FOR OPTICAL INSPECTION, MAGNETIC FIELD AND HEIGHT MAPPING - A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. | 08-07-2014 |
20140238970 | SOLID STATE LIGHT SOURCE ASSISTED PROCESSING - Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include a lamphead including a set of lamps, wherein the first set of lamps are not solid state light sources, and a set of solid state light sources disposed on the lamp head, to provide pulsed or continuous energy to the process chamber. | 08-28-2014 |
20150069234 | ASYMMETRICAL DETECTOR DESIGN AND METHODOLOGY - A charged particle detection device has an active portion for configured to produce a signal in response secondary charged particles emitted from a sample landing on the active portion. The active portion is shaped to accommodate an expected asymmetric pattern of the secondary charged particles at a detector. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. | 03-12-2015 |
20150076350 | NON-INVASIVE CHARGED PARTICLE BEAM MONITOR - An electromagnetic wakefield detector placed in close proximity to a design trajectory of a non-relativistic charged particle beam produces an optical signal in response to passage of the charged particle beam without interrupting the charged particle beam. A photon detector receives the optical signal and produces a corresponding output. The wakefield detector may be based on the electro optic effect. Specifically, the detector may measure the effect of the charged particle beam a beam of radiation on the phase of radiation travelling parallel to the beam in a nearby electro optic waveguide. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. | 03-19-2015 |
20150076697 | DUMMY BARRIER LAYER FEATURES FOR PATTERNING OF SPARSELY DISTRIBUTED METAL FEATURES ON THE BARRIER WITH CMP - A semiconductor device comprises a plurality of device features formed on a substrate and a plurality of dummy features formed on the substrate and across an open region between the device features. Adjacent device features are spaced apart by a distance of 100 microns or more. Each device feature includes a barrier island and a metal layer on top of the barrier island. Each dummy feature has a structure that corresponds to the structure of the barrier island. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. | 03-19-2015 |
20150179327 | APPARATUS AND METHOD FOR FINE-TUNING MAGNET ARRAYS WITH LOCALIZED ENERGY DELIVERY - One embodiment relates to an apparatus for adjustment of local magnetic strength in a magnetic device. A stage holds the magnetic device, and a sensor measures a magnetic field at locations above the magnetic device so as to generate magnetic field data. A computer system detects a non-uniformity in the magnetic field from the magnetic field data and determines a location and a duration for application of a pulsed laser beam to correct the non-uniformity. A laser device applies the pulsed laser beam at said location for said duration. Another embodiment relates to a method of adjusting local magnetic strength in a magnetic device. Another embodiment relates to a system for fine-tuning a magnet array with localized energy delivery. Other embodiments, aspects and features are also disclosed. | 06-25-2015 |