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Gerhard Knoblinger

Gerhard Knoblinger, Villach AT

Patent application numberDescriptionPublished
20080224217MUGFET SWITCH - An electronic circuit on a semiconductor substrate having isolated multiple field effect transistor circuit blocks is disclosed. In some embodiment, an apparatus includes a substrate, a first semiconductor circuit formed above the substrate, a second semiconductor circuit formed above the substrate, and a MuGFET device overlying the substrate and electrically coupled to the first semiconductor circuit and the second semiconductor circuit, wherein the MuGFET device provides a signal path between the first semiconductor circuit and the second semiconductor circuit in response to an input signal.09-18-2008
20080303593MUGFET CIRCUIT FOR INCREASING OUTPUT RESISTANCE - In an embodiment, an apparatus includes a MuGFET device coupled to a reference source, the MuGFET device configured to receive an input signal at a gate thereof; and Also includes a further MuGFET device coupled between the MuGFET device and a first terminal of a load, a second terminal of the load coupled to a further reference source, the further MuGFET device configured to receive a further input signal at a gate thereof, and wherein the MuGFET device and the further MuGFET device are disposed above a substrate and configured to provide an output signal at the first terminal of the load.12-11-2008
20090050973INTEGRATED CIRCUIT INCLUDING A FIRST CHANNEL AND A SECOND CHANNEL - An integrated circuit is disclosed. In one embodiment, the integrated circuit includes a first area and a second area. The first area is stress engineered to provide enhanced mobility in a first channel that has a first width. The second area is stress engineered to provide enhanced mobility in a second channel that has a second width. The first channel and the second channel provide a combined current that is greater than a single current provided via a single channel having a single width that is substantially equal to the sum of the first width and the second width.02-26-2009
20090250763INTEGRATED CIRCUIT INCLUDING A FIRST CHANNEL AND A SECOND CHANNEL - An integrated circuit is disclosed. In one embodiment, the integrated circuit includes a first area and a second area. The first area is stress engineered to provide enhanced mobility in a first channel that has a first width. The second area is stress engineered to provide enhanced mobility in a second channel that has a second width. The first channel and the second channel provide a combined current that is greater than a single current provided via a single channel having a single width that is substantially equal to the sum of the first width and the second width.10-08-2009
20110043293DeMOS VCO - The present disclosure relates voltage controlled oscillators (VCO) and digitally controlled oscillators (DCO). In one implementation, a VCO is implemented with drain extended MOS transistors (DeMOS). In another implementation, a DCO is implemented with DeMOS devices.02-24-2011
20110043294DeMOS DCO - The present disclosure relates voltage controlled oscillators (VCO) and digitally controlled oscillators (DCO). In one implementation, a VCO is implemented with drain extended MOS transistors (DeMOS). In another implementation, a DCO is implemented with DeMOS devices.02-24-2011

Patent applications by Gerhard Knoblinger, Villach AT

Gerhard Knoblinger, Österreich AT

Patent application numberDescriptionPublished
20100062573METHOD FOR PRODUCING AN ELECTRONIC COMPONENT, METHOD FOR PRODUCING A THYRISTOR, METHOD FOR PRODUCING A DRAIN-EXTENDED MOS FILED-EFFECT TRANSISTOR, ELECTRONIC COMPONENT, DRAIN-EXTENDED MOS FIELD-EFFECT TRANSISTOR, ELECTRONIC COMPONENT ARRANGEMENT - In a method for producing an electronic component, a first doped connection region and a second doped connection region are formed on or above a substrate; a body region is formed between the first doped connection region and the second doped connection region; at least two gate regions separate from one another are formed on or above the body region; at least one partial region of the body region is doped by means of introducing dopant atoms, wherein the dopant atoms are introduced into the at least one partial region of the body region through at least one intermediate region formed between the at least two separate gate regions.03-11-2010

Gerhard Knoblinger, Österreich AT

Patent application numberDescriptionPublished
20100062573METHOD FOR PRODUCING AN ELECTRONIC COMPONENT, METHOD FOR PRODUCING A THYRISTOR, METHOD FOR PRODUCING A DRAIN-EXTENDED MOS FILED-EFFECT TRANSISTOR, ELECTRONIC COMPONENT, DRAIN-EXTENDED MOS FIELD-EFFECT TRANSISTOR, ELECTRONIC COMPONENT ARRANGEMENT - In a method for producing an electronic component, a first doped connection region and a second doped connection region are formed on or above a substrate; a body region is formed between the first doped connection region and the second doped connection region; at least two gate regions separate from one another are formed on or above the body region; at least one partial region of the body region is doped by means of introducing dopant atoms, wherein the dopant atoms are introduced into the at least one partial region of the body region through at least one intermediate region formed between the at least two separate gate regions.03-11-2010