| Patent application number | Description | Published |
|---|
| 20080206674 | Dual-Layer Heat-Sensitive Imageable Elements with a Polyvinyl Acetal Top Layer - Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO | 08-28-2008 |
| 20090017399 | IMAGEABLE ELEMENTS WITH LOW PH DEVELOPER SOLUBILITY - Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers. | 01-15-2009 |
| 20090061352 | IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE - Single- and multi-layer positive-working imageable elements include an ink receptive outer layer that includes inorganic, non-metallic, inert discrete particles, such as nano-sized silica, aluminum oxide, or titanium dioxide particles. The presence of these particles in the outermost layer improves the abrasion and scratch resistance of the elements. | 03-05-2009 |
| 20090142695 | IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS - Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length. | 06-04-2009 |
| 20090233227 | NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE - Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties. | 09-17-2009 |
| 20100159393 | METHOD OF DEVELOPING LITHOGRAPHIC PRINTING PLATE PRECURSORS - The invention relates to a method for making a lithographic printing plate which comprises imagewise exposing a lithographic printing plate precursor comprising one or more layers at least one of which is associated with one or more unsubstituted or substituted triarylmethane dyes and at least one of which layers is radiation-sensitive, and developing the imagewise exposed printing plate precursor with an aqueous alkaline developing composition, wherein the composition comprises at least one amphoteric surfactant of formula (I):—wherein R | 06-24-2010 |
| 20110097666 | LITHOGRAPHIC PRINTING PLATE PRECURSORS - Lithographic printing plate precursors can have an imageable layer that includes a polymeric binder having an acid number of 40 meq/g KOH or more, at least 3 weight % of recurring units derived from one or more N-alkoxymethyl (alkyl)acrylamides or alkoxymethyl(alkyl)acrylates, at least 2 weight % of recurring units having pendant 1H-tetrazole groups, and at least 10 weight % of recurring units having pendant cyano groups. The use of such polymeric binders provides good bakeability and chemical solvent resistance, especially for positive-working precursors. | 04-28-2011 |
| 20110236832 | LITHOGRAPHIC PROCESSING SOLUTIONS AND METHODS OF USE - A lithographic processing solution having a pH of less than 12 and comprising at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and having one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. The processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation. | 09-29-2011 |
