| Patent application number | Description | Published |
|---|
| 20080241479 | Antifouling Material and Production Method thereof - The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff. | 10-02-2008 |
| 20100059365 | PROCESS FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC OPENINGS FOR PRODUCING A SUBMILLIMETRIC GRID, AND SUBMILLIMETRIC GRID - A process for manufacturing a mask having submillimetric openings on a surface portion of a substrate, characterized in that:
| 03-11-2010 |
| 20100313936 | GLASS SUBSTRATE COATED WITH LAYERS HAVING AN IMPROVED MECHANICAL STRENGTH - The invention relates to
| 12-16-2010 |
| 20110177324 | TEMPORARY PROTECTION OF GLASS - One subject of the invention is a glass substrate coated with a continuous temporary protection film, said film essentially consisting of a stack of discernible colloidal polymer particles. Another subject of the invention is a process for coating a glass substrate with a continuous temporary protection film, in which process an aqueous dispersion of colloidal particles of at least one water-insoluble solid polymer is deposited on at least one surface of said substrate and then the film thus obtained is dried at a temperature above the glass transition temperature of said at least one polymer but not exceeding 50° C. | 07-21-2011 |
| 20110198334 | METHOD FOR OBTAINING A HEATED GLAZING - The subject of the invention is a method of obtaining a heated window, comprising
| 08-18-2011 |
| 20110240343 | METHOD FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC APERTURES FOR A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, MASK HAVING SUBMILLIMETRIC APERTURES AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID - A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a solution of colloidal nanoparticles that are stabilized and dispersed in a first solvent is deposited, the particles having a given glass transition temperature T | 10-06-2011 |
| 20110247859 | METHOD FOR MANUFACTURING A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID - The manufacture of a submillimetric grid includes the production of a mask having submillimetric openings, referred to as a network mask, on the main face, from a solution of colloidal nanoparticles with a given glass transition temperature T | 10-13-2011 |
| 20110248219 | METHOD FOR MANUFACTURING A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID COATED WITH AN OVERGRID, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID COATED WITH AN OVERGRID - A method of manufacturing a submillimetric electroconductive grid coated with an overgrid on a substrate includes: the production of a mask having submillimetric openings by the deposition of a solution of colloidal polymeric nanoparticles that are stabilized and dispersed in a solvent, the polymeric particles having a glass transition temperature T | 10-13-2011 |
| 20110250387 | METHOD FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC APERTURES FOR A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, AND MASK AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID - A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a first solution of colloidal nanoparticles in a first solvent is deposited, the particles having a given glass transition temperature T | 10-13-2011 |
