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George Liu
George Liu, Shin-Chu City TW
| Patent application number | Description | Published |
|---|---|---|
| 20090053899 | METHOD OF PATTERN FORMATION IN SEMICONDUCTOR FABRICATION - Provided is a method of fabricating a semiconductor device. The method includes providing a substrate, forming a photo acid generator (PAG) layer on the substrate, exposing the PAG layer to radiation, and forming a photoresist layer on the exposed PAG layer. The exposed PAG layer generates an acid. The acid decomposes a portion of the formed photoresist layer. In one embodiment, the PAG layer includes organic BARC. The decomposed portion of the photoresist layer may be used as a masking element. | 02-26-2009 |
| 20090081591 | METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER - The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask. | 03-26-2009 |
| 20090311628 | METHOD FOR ETCHING AN ULTRA THIN FILM - A method for etching an ultra thin film is provided which includes providing a substrate having the ultra thin film formed thereon, patterning a photosensitive layer formed over the ultra thin film, etching the ultra thin film using the patterned photosensitive layer, and removing the patterned photosensitive layer. The etching process includes utilizing an etch material with a diffusion resistant carrier such that the etch material is prevented from diffusing to a region underneath the photosensitive layer and removing portions of the ultra thin film underneath the photosensitive layer. | 12-17-2009 |
| 20100109054 | PATTERN FORMATION IN SEMICONDUCTOR FABRICATION - Provided is a semiconductor device. The device includes a substrate having a photo acid generator (PAG) layer on the substrate. The PAG layer is exposed to radiation. A photoresist layer is formed on the exposed PAG layer. The exposed PAG layer generates an acid. The acid decomposes a portion of the formed photoresist layer. In one embodiment, the PAG layer includes organic BARC. The decomposed portion of the photoresist layer may be used as a masking element. | 05-06-2010 |
| 20100261118 | Intensity Selective Exposure Method And Apparatus - A gradated photomask is provided. The photomask includes a first region including a first plurality of sub-resolution features and a second region including a second plurality of sub-resolution features. The first region blocks a first percentage of the incident radiation. The second region blocks a second percentage of the incident radiation. The first and second percentage are different. An intensity selective exposure method is also provided. | 10-14-2010 |
| 20110042750 | CONTROLLING GATE FORMATION FOR HIGH DENSITY CELL LAYOUT - Methods of forming a semiconductor structure and the semiconductor structure are disclosed. In one embodiment, a method includes forming a gate dielectric layer over a substrate, forming a gate electrode layer over the gate dielectric layer, and etching the gate electrode layer and the gate dielectric layer to form a horizontal gate structure and a vertical gate structure, wherein the horizontal gate structure and the vertical gate structure are connected by an interconnection portion. The method further includes forming a photoresist covering the horizontal gate structure and the vertical gate structure, with the photoresist having a gap exposing the interconnection portion between the horizontal gate structure and the vertical gate structure, and then etching the interconnection portion. | 02-24-2011 |
George Liu, Irvine, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110006232 | LOW VOLTAGE DROP CLOSED LOOP UNIDIRECTIONAL ELECTRONIC VALVE - A low voltage drop unidirectional electronic valve constituted of: a first terminal; a second terminal; a first electronically controlled switch coupled between the first terminal and the second terminal; and a first charge pump arranged to close the first electronically controlled switch when the voltage potential at the first terminal is greater than the voltage potential at the second terminal by a first value. The first charge pump is arranged in a closed loop with the first electronically controlled switch so as to continuously maintain the voltage potential at the first terminal greater than the voltage potential at the second terminal by the first value. | 01-13-2011 |
George Liu, Taichung City TW
| Patent application number | Description | Published |
|---|---|---|
| 20100052610 | Battery charger with charging reminding capability - A battery charger includes a rechargeable battery for providing electric power to an external rechargeable battery through a damper unit so as to charge the external rechargeable battery, and a control unit coupled to a charging socket and the rechargeable battery and operable to charge the rechargeable battery through a charging signal received by the charging socket. An alarm unit is coupled to the rechargeable battery and the charging socket for generating a detecting signal based on a battery voltage of the rechargeable battery, for outputting a reminder output upon detecting that a potential of the detecting signal is less than that of a reference signal, and for terminating the reminder output when the charging socket receives the charging signal. | 03-04-2010 |
George Liu, Douliou City TW
| Patent application number | Description | Published |
|---|---|---|
| 20090071462 | Barbecue Grill Transmission Device - The present invention is to provide a barbecue grill transmission device includes a grill platen having a grill shelf mounted at the top thereof, and a pair of grooves at two sides of the grill shelf for pivotally a rolling shaft, which is used to string up food to be roasted, wherein one end of the rolling shaft is connected to a spiral spring, whose releasing speed is reduced by a reduction gear. Further, the spring is connected to a detector, which receives a signal related to the releasing of the spring and then transmits a signal to a beeper for generating a sound to warn the completely releasing of the spring, thereby automatically rolling the food strung on the rolling shaft to roll on the grill shelf, so as to achieve power saving. | 03-19-2009 |
George Liu, Dou-Liou City TW
| Patent application number | Description | Published |
|---|---|---|
| 20090053664 | Catalytic patio heater - A patio heater is disclosed comprising a cylindrical catalytic heating chamber mounted on a base. The patio heater of the present invention comprises a base to physically support a cylindrical catalytic heater chamber which is mounted inside a fuel vapor cavity. The catalytic heater chamber provides a cylindrical heating zone capable of heating a nearby human form the knee to the face. The fuel vapor chamber surrounds the catalytic heating chamber and acts to accumulate sufficient fuel and air mixture to ignite to provide uniform and sufficient heat to the catalyst surface to attain catalytic ignition on start up. The base offers physical stability for the assembly and storage space for a fuel tank and houses the fuel deliver system and ignitor controls. | 02-26-2009 |
George Liu, Hsin-Chu TW
| Patent application number | Description | Published |
|---|---|---|
| 20080204688 | Methodology For Implementing Enhanced Optical Lithography For Hole Patterning In Semiconductor Fabrication - System and method for enhancing optical lithography methodology for hole patterning in semiconductor fabrication are described. In one embodiment, a photolithography system comprises an illumination system for conditioning light from a light source, the illumination system producing a three-pore illumination pattern; a reticle comprising at least a portion of a pattern to be imaged onto a substrate, wherein the three-pore illumination pattern produced by the illumination system is projected through the reticle; and a projection lens disposed between the reticle and the substrate. | 08-28-2008 |
George Liu, Sin-Chu City TW
| Patent application number | Description | Published |
|---|---|---|
| 20080206679 | Contrast Enhancing Exposure System and Method For Use In Semiconductor Fabrication - Contrast enhancing exposure apparatus and method for use in semiconductor fabrication are described. In one embodiment, a method for forming a pattern on a substrate, wherein the substrate includes a photoresist layer comprising photoacid generators (“PAGs”) and photobase generators (“PBGs”), is described. The method includes dividing the pattern into two component patterns; exposing the photoresist layer of the substrate to UV light through a first mask corresponding to a first one of the component patterns; subsequent to the exposing the photoresist layer of the substrate to UV light through the first mask, exposing the photoresist layer of the substrate to UV light through a second mask corresponding to a second one of the component patterns, wherein the PAGs and PBGs disposed in areas of the photoresist layer that have been exposed to UV light at least twice are activated and wherein the activated PAGs neutralize the activated PBGs in areas of the photoresist layer that have been exposed to UV light at least twice. | 08-28-2008 |