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Gadkaree, NY

Kishor P. Gadkaree, Big Flats, NY US

Patent application numberDescriptionPublished
20080224254Glass-based SOI structures - Semiconductor-on-insulator (SOI) structures, including large area SOI structures, are provided which have one or more regions composed of a layer of a substantially single-crystal semiconductor (e.g., doped silicon) attached to a support substrate composed of an oxide glass or an oxide glass-ceramic. The oxide glass or oxide glass-ceramic is preferably transparent and preferably has a strain point of less than 1000° C., a resistivity at 250° C. that is less than or equal to 1009-18-2008
20090050901GLASS-CERAMIC-BASED SEMICONDUCTOR-ON-INSULATOR STRUCTURES AND METHOD FOR MAKING THE SAME - The present invention relates to a semiconductor-on-insulator structure including a semiconductor component comprised of substantially single-crystal semiconductor material layer and a single-crystal semiconductor material with an enhanced oxygen content layer; an oxide glass material layer; and a glass-ceramic layer.02-26-2009
20090085176GLASS-BASED SOI STRUCTURES - Semiconductor-on-insulator (SOI) structures, including large area SOI structures, are provided which have one or more regions composed of a layer (04-02-2009
20100099237FLEXIBLE DISPLAY SUBSTRATES - Processes for transferring a semiconductor material to a polymer substrate to provide flexible semiconductor material include implanting ions to a predetermined depth in a semiconductor substrate, heat-treating the ion-implanted semiconductor substrate for a period of time and at a temperature effective to cause defect formation and enlargement of the implanted ion defect, adhering the ion-implanted, heat-treated substrate to a polymer substrate, and separating a semiconductor film such as a single crystal silicon film from the semiconductor substrate; and devices having single crystal silicon films disposed directly or indirectly on polymer films.04-22-2010
20100213582GLASS-BASED SOI STRUCTURES - Semiconductor-on-insulator (SOI) structures, including large area SOI structures, are provided which have one or more regions composed of a layer (08-26-2010

Patent applications by Kishor P. Gadkaree, Big Flats, NY US

Kishor Purushottam Gadkaree, Painted Post, NY US

Patent application numberDescriptionPublished
20100224954SUBSTRATE COMPOSITIONS AND METHODS FOR FORMING SEMICONDUCTOR ON INSULATOR DEVICES - Methods and apparatus for producing a semiconductor on insulator structure include: subjecting an implantation surface of a donor single crystal semiconductor wafer to an ion implantation process to create an exfoliation layer of the donor semiconductor wafer; bonding the implantation surface of the exfoliation layer to a glass substrate using electrolysis, wherein a liquidus viscosity of the glass substrate is about 100,000 Poise or greater.09-09-2010
20100239479Process For Removing Toxic Metals From A Fluid Stream - A process for removing at least one of As, Cd, Hg and Se from a fluid stream, comprising: (I) providing a plurality of Group A particles of a Group A sorbent material, said Group A sorbent material comprising: an activated carbon matrix defining a plurality of pores; sulfur; and an additive adapted for promoting the removal of at least one of As, Cd, Hg and Se from a fluid stream, wherein the additive is distributed throughout the activated carbon matrix; and (II) contacting the fluid stream with a plurality of Group A particles of the Group A sorbent material. The process can involve powder injection, a packed sorbent bed, a fluidized sorbent bed, and combinations thereof.09-23-2010
20110020202SORBENT BODIES COMPRISING ACTIVATED CARBON, PROCESSES FOR MAKING THEM, AND THEIR USE - Sorbent bodies comprising activated carbon, processes for making them, and methods of using them. The sorbent bodies can be used to remove toxic elements from a fluid, such as from a gas stream. For instance, the sorbent bodies may be used to remove elemental mercury or mercury in an oxidized state from a coal combustion flue gas.01-27-2011
20110070493CURRENT COLLECTORS HAVING TEXTURED COATING - A current collector and an electric double layer capacitor including a current collector. The current collector has a conductive layer with an electrode-facing surface and an opposing second surface, each surface having an area, and a textured coating formed over and in contact with at least a majority of the electrode-facing surface.03-24-2011

Kishor Purushottam Gadkaree, Corning, NY US

Patent application numberDescriptionPublished
20090185328Cellular Honeycomb Ultracapacitors and Hybrid Capacitors With Separator-Supported Current Collectors - An ultracapacitor or hybrid capacitor includes an electrically non-conductive rigid or semi-rigid porous honeycomb separator structure having cells extending along a common direction and supporting current collector structure(s) thereon. The current collector structure may be porous and extend continuously on all inner surfaces of a cell of the honeycomb structure, or may extend along the common direction on separate portions of the inner surfaces of a cell. The honeycomb structure desirably formed of a material that is stable at temperatures of 300° or more, such that high temperature processing can be used to help ensure high purity of the final product. The material may desirably be an oxide or non-oxide ceramic, such as cordierite, silicon nitride, or aluminum titanate. The cells desirably have an average density per unit area within in a plane perpendicular to the common direction of more than 15.5 per square centimeter.07-23-2009