| Patent application number | Description | Published |
|---|
| 20090040345 | Color imaging device and color imaging device manufacturing method - A color imaging device includes a semiconductor substrate including a plurality of photoelectric transducers, and a color filter including a plurality of coloring layers provided to associate with the photoelectric transducers of the semiconductor substrate. Each of the coloring layers of the color filter including a side surface that is erected with respect to a surface of the semiconductor substrate, and an inclined surface that is continuous from an end of the side surface located in the opposite side of the semiconductor substrate toward an end portion of the coloring layer located in the opposite side of the semiconductor substrate. The coloring layers are arranged with their side surfaces being in contact with each other without a gap therebetween, and the end portion of the coloring layer has a curved surface shape protruding toward the opposite side of the corresponding photoelectric transducer. | 02-12-2009 |
| 20090206435 | Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device - A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heatflowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses. | 08-20-2009 |
| 20100261303 | Manufacturing method for solid state image pickup device - A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method includes successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by dry etching, and the rest of the plurality of the color filter pattern is formed by photolithography. | 10-14-2010 |
| 20110043486 | Liquid crystal display device, black matrix substrate and color filter substrate - A liquid crystal display device includes a first substrate, a second substrate located opposite the first substrate via a liquid crystal, a blue display element, a green display element, a red display element, a short-wavelength optical sensor, a red optical sensor, and an infrared optical sensor formed on a liquid crystal side surface of the first substrate, and a color filter formed between the first substrate and the second substrate and includes a blue filter, a green filter, a first red filter, a short-wavelength transmission filter, a second red filter, and an infrared transmission filter corresponding to the blue display element, the green display element, the red display element, the short-wavelength optical sensor, the red optical sensor, and the infrared optical sensor, respectively. | 02-24-2011 |
