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Fuh-Yu Chang

Fuh-Yu Chang, Hsinchu County TW

Patent application numberDescriptionPublished
20080201144METHOD OF EMOTION RECOGNITION - A method is disclosed in the present invention for recognizing emotion by setting different weights to at least of two kinds of unknown information, such as image and audio information, based on their recognition reliability respectively. The weights are determined by the distance between test data and hyperplane and the standard deviation of training data and normalized by the mean distance between training data and hyperplane, representing the classification reliability of different information. The method is capable of recognizing the emotion according to the unidentified information having higher weights while the at least two kinds of unidentified information have different result classified by the hyperplane and correcting wrong classification result of the other unidentified information so as to raise the accuracy while emotion recognition. Meanwhile, the present invention also provides a learning step with a characteristic of higher learning speed through an algorithm of iteration. The learning step functions to adjust the hyperplane instantaneously so as to increase the capability of the hyperplane for identifying the emotion from an unidentified information accurately. Besides, a way of Gaussian kernel function for space transformation is also provided in the learning step so that the stability of accuracy is capable of being maintained.08-21-2008
20090142710METHOD FOR PATTERNING A PHOTORESIST LAYER - The disclosed is a method for patterning a photoresist layer. An object is provided, a photoresist layer is formed on the object, and an ink pattern is printed on the photoresist layer. Shielded by the ink pattern, the photoresist is exposed and developed to be patterned. In addition, a layered material is optionally formed between the object and the photoresist layer.06-04-2009
20090161117INCLINED EXPOSURE LITHOGRAPHY SYSTEM - A method and an apparatus are disclosed for scatterfield microscopical measurement. The method integrates a scatterometer and a bright-field microscope for enabling the measurement precision to be better than the optical diffraction limit. With the aforesaid method and apparatus, a detection beam is generated by performing a process on a uniform light using an LCoS (liquid crystal on silicon) or a DMD (digital micro-mirror device) which is to directed to image on the back focal plane of an object to be measured, and then scattered beams resulting from the detection beam on the object's surface are focused on a plane to form an optical signal which is to be detected by an array-type detection device. The detection beam can be oriented by the modulation device to illuminate on the object at a number of different angles, by which zero order or higher order diffraction intensities at different positions of the plane at different incident angles can be collected.06-25-2009
20100018421ROLLER WITH MICROSTRUCTURE AND THE MANUFACTRUING METHOD THEREOF - The present invention discloses a method for manufacturing a roller with microstructure, comprising the steps of: forming a protective metal layer on a roller; defining specific imprint patterns on an imprint stamp by processing the imprint stamp with a flexible mold; forming an etch mask on the embossed imprint stamp after the imprint stamp is released from the mold; wetting the imprint stamp and the etch mask thereof; adhering the etch mask onto the roller by rolling the roller on the imprint stamp; etching the roller at the portion thereof uncovered by the etch mask; and forming the roller with specific microstructure by removing the etch mask and the protective metal layer.01-28-2010
20100165316INCLINED EXPOSURE LITHOGRAPHY SYSTEM - An inclined exposure lithography system is disclosed, which comprises: a substrate; a photoresist layer, formed on the substrate; a mask, disposed over the photoresist layer with a gap therebetween; and a refraction element disposed over the mask so that a light beam from a light source is refracted by a specific angle.07-01-2010
20100281679FABRICATING METHOD FOR MULTI-LAYER ELECTRIC PROBE - A method of fabricating a multi-layer electric probe. The method includes forming a first strip layer. The first strip layer has a first conductivity and a first mechanical strength. Then, a second strip layer is solidly adhered to a surface of the first strip layer to form a structural body, wherein the second strip layer has a second conductivity and a second mechanical strength. The combination of the second conductivity and the second mechanical strength with the first conductivity and the first mechanical strength produces the desired capabilities of enduring current and mechanical strength.11-11-2010
20110141258EMOTION RECOGNITION METHOD AND SYSTEM THEREOF - A method is disclosed in the present disclosure for recognizing emotion by setting different weights to at least of two kinds of unknown information, such as image and audio information, based on their recognition reliability respectively. The weights are determined by the distance between test data and hyperplane and the standard deviation of training data and normalized by the mean distance between training data and hyperplane, representing the classification reliability of different information. The method recognizes the emotion according to the unidentified information having higher weights while the at least two kinds of unidentified information have different result classified by the hyperplane and correcting wrong classification result of the other unidentified information so as to raise the accuracy while emotion recognition. Meanwhile, the present disclosure also provides a learning step with a characteristic of higher learning speed through an algorithm of iteration.06-16-2011

Patent applications by Fuh-Yu Chang, Hsinchu County TW

Fuh-Yu Chang, Jhubei City TW

Patent application numberDescriptionPublished
20090246717METHOD FOR FORMING A PATTERNED PHOTORESIST LAYER - A photoresist layer is disclosed. Utilizing light diffraction properties, a transparent layer is disposed between a light-shielding layer and a photoresist layer during an exposure step, such that the patterned photoresist layer has non-vertical sidewalls. The method of the invention can be applied during front side exposure or back side exposure, and is also practical for positive type photoresists or negative photoresists.10-01-2009

Fuh-Yu Chang, Hsinchu TW

Patent application numberDescriptionPublished
20080217798MOLD STRUCTURE AND THE MANUFACTURING METHOD THEREOF - A mold structure and the manufacturing method thereof are disclosed. The mold structure is comprised of: an axle; a roller, axially ensheathing the axle; and a mold having a specific imprint pattern of microstructures formed thereon, being arranged to mount on the periphery of the roller while connecting to the axle; wherein a pulling force is exerted on the mold by the axle for stretching the mold while enabling the same to tensely adhere upon the periphery of the roller.09-11-2008

Fuh-Yu Chang, Taipei City TW

Patent application numberDescriptionPublished
20120001365CLAMPING DEVICE OF MICRO-NANO IMPRINT PROCESS AND THE METHOD THEREOF - The invention discloses a clamping device of the micro/nano imprint process and the method thereof for clamping a substrate. The clamping device comprises a first module, a second module and a locking module. The first module and the second module are used to accommodate and support at least one mold. The mold has a predetermined structure. The locking module is used to lock the first module and the second module. The clamping device drives the mold to imprint the substrate or the material layer of the substrate by a predetermined way.01-05-2012