| Patent application number | Description | Published |
|---|
| 20080309894 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. | 12-18-2008 |
| 20080316444 | METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS - The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components. | 12-25-2008 |
| 20090122288 | DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL ELEMENT - The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount ( | 05-14-2009 |
| 20090168207 | Replacement Apparatus for an Optical Element - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 07-02-2009 |
| 20090244509 | OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS - The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator. | 10-01-2009 |
| 20100141912 | EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. | 06-10-2010 |
| 20100271716 | REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 10-28-2010 |
| 20110255181 | REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 10-20-2011 |
