Patent application number | Description | Published |
20080309894 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. | 12-18-2008 |
20080316444 | METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS - The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components. | 12-25-2008 |
20090122288 | DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL ELEMENT - The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount ( | 05-14-2009 |
20090168207 | Replacement Apparatus for an Optical Element - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 07-02-2009 |
20090244509 | OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS - The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator. | 10-01-2009 |
20100141912 | EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. | 06-10-2010 |
20100271716 | REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 10-28-2010 |
20110255181 | REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 10-20-2011 |
20110285979 | PROJECTION OBJECTIVE WITH DIAPHRAGMS - A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element. Each of the false light diaphragms is fashioned in such a way that the false light diaphragm screens at least a part of the edge region against radiation running outside the imaging beam path. | 11-24-2011 |
20120176591 | METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS - The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component. | 07-12-2012 |
20130120723 | EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. | 05-16-2013 |
20130278911 | OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS - The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator. | 10-24-2013 |
20130279029 | REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 10-24-2013 |
20140063628 | DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL ELEMENT - The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount. The optical element is connected to the mount at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount and optical element. The mount is provided with at least three support feet distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points. | 03-06-2014 |
20140254036 | OPTICAL MODULE FOR AN OBJECTIVE - Disclosed is an optical module for a lens, especially a microlithographic apparatus, comprising a first holding device with an inner circumference that extends in a first circumferential direction, and at least one first supporting device which is fastened to the inner circumference of said first holding device and is used for supporting a first optical element, an annular circumferential first assembly space being defined by displacing the first supporting device once in a revolving manner along the first circumferential direction. At least one second supporting device which is fixed to the inner circumference of the first holding device is provided for supporting a second optical element, an annular circumferential second assembly space being defined by displacing the second supporting device once in a revolving manner along the first circumferential direction. The first assembly space intersects the second assembly space. | 09-11-2014 |
20140268381 | OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING AND SUPPORTING DEVICES - Disclosed is an optical module for a lens, especially a microlithographic apparatus, comprising a first holding device with an inner circumference that extends in a first circumferential direction, and at least one first supporting device which is fastened to the inner circumference of said first holding device and is used for supporting a first optical element, an annular circumferential first assembly space being defined by displacing the first supporting device once in a revolving manner along the first circumferential direction. At least one second supporting device which is fixed to the inner circumference of the first holding device is provided for supporting a second optical element, an annular circumferential second assembly space being defined by displacing the second supporting device once in a revolving manner along the first circumferential direction. The first assembly space intersects the second assembly space. | 09-18-2014 |
20150070789 | REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT - A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same. | 03-12-2015 |