| Patent application number | Description | Published |
|---|
| 20080285040 | Electrical Detection of Plasmon Resonances - A method includes detecting a plasmon resonance in a material based on a change in at least one electrical property of the material. For example, the material can be a sensor portion of an electrical circuit, wherein the method can further include: exposing the sensor portion to a test material; optically illuminating the sensor portion when the test material is present, and monitoring the change in the at least one electrical property of the sensor portion in response to the optical illumination. The monitored changed in the at least one electrical property of the sensor portion can provide information about the test material, such as the presence or absence of selected analytes and/or their binding affinities. In another example, the material is a part of a receiver for a plasmonic circuit. An apparatus for carrying out the method is also disclosed. | 11-20-2008 |
| 20090020908 | STRUCTURES AND METHODS OF REPLICATING THE SAME - The invention features a method for producing replicas of a desired structure, a master and a mold obtained from it for use in such a method. The master includes a desired structure ( | 01-22-2009 |
| 20100258443 | Methods of fabricating nanowires and electrodes having nanogaps - A cost-effective and highly reproducible method of fabricating nanowires, and small gaps or spacings in nanowires is disclosed. The nanogaps bridge an important size regime between 1 nm and 100 nm. The nanogaps can be selectively predetermined to be as small as 1.0 nm, or larger than 1000 nm. These electrode gaps can be useful in preparing molecular electronic devices that involve making electrical contact to individual molecules, such as biomolecules, or small clusters of molecules. Microelectrodes having nanogaps for electrical and magnetic applications formed by the method, and as well as biosensors and their use in detecting a biological species, such as DNA, are also disclosed. | 10-14-2010 |
| 20110039213 | METHOD AND SYSTEM FOR PHOTOLITHOGRAPHIC FABRICATION WITH RESOLUTION FAR BELOW THE DIFFRACTION LIMIT - A method and system for photolithography is provided. The system includes a photoresist comprising a photoinitiator and a prepolymer resin. The system further includes a first light source operable to generate at least a first beam of light which is focused on a first area of the photoresist. The first beam of light is configured to excite the photoinitiator. The system further includes a second light source operable to generate at least a second beam of light which is focused on a second area of the photoresist, the second beam of light configured to deactivate at least temporarily the photoinitiator excited by the first beam of light. The first area and second area overlap at least partially. A time difference of at least 10 ns exists between the photoinitiator being excited by the first beam of light and the photoinitiator initiating polymerization. | 02-17-2011 |
