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Fluegge

Anja Fluegge, Ludwigsburg DE

Patent application numberDescriptionPublished
20090235550Drying device with at least two drums - A drying apparatus and a method for operating a drying apparatus are presented by means of which a considerable increase in efficiency is possible.09-24-2009

Kai Fluegge, Aachen DE

Patent application numberDescriptionPublished
20110060246Analysis System and Method for Determining an Analyte in a Body Fluid With a Magazine Comprising Integrated Sample Acquisition and Analyzing Elements - Analysis system for determining an analyte in a body fluid is presented. The system comprises a reusable analysis instrument and a magazine having a plurality of integrated sample acquisition and analyzing elements. Each element comprises a puncturing element and an analyzing element. A coupling unit couples the integrated sample acquisition and analyzing element to a drive. The magazine comprises a housing having a plurality of elongate neighboring chambers separated by two side walls running in a longitudinal. The chambers contain the integrated sample acquisition and analyzing element. The chambers have an exit opening allowing for the at least partial exiting of the puncturing element. The chambers of the magazine are accessible to a coupling element that can be formfitting coupled to the coupling structure of the puncturing element, when the puncturing element is in the chamber of the magazine and the magazine is located in a holder.03-10-2011

Martin Fluegge, Wiesbaden DE

Patent application numberDescriptionPublished
20100304573STABILIZED ETCHING SOLUTIONS FOR CU AND CU/NI LAYERS - The present invention relates to new storage-stable solutions which can be used in semiconductor technology to effect specific etching of copper metallization layers and also Cu/Ni layers. With the new etch solutions it is possible to carry out etching and patterning of all-copper metallizations, layers of copper/nickel alloys, and also successive copper and nickel layers.12-02-2010

Ole Fluegge, Bartholomae DE

Patent application numberDescriptionPublished
20080316621OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND PROJECTION OBJECTIVE - In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.12-25-2008
20100201958OPTICAL CORRECTION DEVICE - The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.08-12-2010
20110080569OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.04-07-2011

Patent applications by Ole Fluegge, Bartholomae DE

Ole Fluegge, Bartholomac DE

Patent application numberDescriptionPublished
20090257032OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.10-15-2009

Ronald M. Fluegge, The Colony, TX US

Patent application numberDescriptionPublished
20080270078BENCHMARKING AND GAP ANALYSIS SYSTEM AND METHOD - A computer-implemented method is provided for creating a peer unit and comparing that peer unit to a target unit in order to determine the difference in performance between the target unit and a peer unit. The peer unit is a hypothetical construct of user-defined performance variables whose values are determined based on outstanding performing units in a user-defined group. This comparison allows the user to assess what parameters of the target unit should be changed in order to improve overall performance.10-30-2008
20090093996PERFORMANCE ANALYSIS SYSTEM AND METHOD - A system and method is described herein that includes a software-based functionality to assess the relationship between reliability, operational, maintenance and plant betterment activities and to determine the frontier of efficient spending and other measures of performance to achieve a level of reliability that is based on data from units of similar design and performance.04-09-2009
20090093997PERFORMANCE ANALYSIS SYSTEM AND METHOD - A system and method is described herein that includes a software-based functionality to assess the relationship between reliability, operational, maintenance and plant betterment activities and to determine the frontier of efficient spending and other measures of performance to achieve a level of reliability that is based on data from units of similar design and performance.04-09-2009
20090093998PERFORMANCE ANALYSIS SYSTEM AND METHOD - A system and method is described herein that includes a software-based functionality to assess the relationship between reliability, operational, maintenance and plant betterment activities and to determine the frontier of efficient spending and other measures of performance to achieve a level of reliability that is based on data from units of similar design and performance.04-09-2009

Patent applications by Ronald M. Fluegge, The Colony, TX US