| Patent application number | Description | Published |
|---|
| 20080244482 | INTEGRATED CIRCUIT DESIGN USAGE AND SANITY VERIFICATION - An automated system and method for sanity checking an integrated circuit cell layout. The method generally includes searching the cell layout for a sub-area containing a predefined identifier, determining a reference cell layout corresponding to the predefined identifier, verifying the cell layout by comparing the cell layout to the reference cell layout to determine if a cell is of concern, and reporting the cell of concern to a user. | 10-02-2008 |
| 20080244483 | INTEGRATED CIRCUIT DESIGN USAGE AND SANITY VERIFICATION - A method and system for verifying an integrated circuit design are provided. The method includes identifying cell tags embedded in a proposed integrated circuit design file, comparing cells identified as having a tag embedded therein to a cell library containing verified cell data to determine differences between the identified tagged cells and corresponding verified cell data from the cell library, and revising the proposed integrated circuit design to correct differences between the proposed integrated circuit design file and the verified cell data. | 10-02-2008 |
| 20090109768 | SRAM Device with Enhanced Read/Write Operations - An SRAM device includes: a first group of memory cells connected to a first local bit line and a first local complementary bit line for accessing data nodes thereof; a second group of memory cells connected to a second local bit line and a second local complementary bit line for accessing data nodes thereof; and a global bit line and a global complementary bit line connected to the first and second local bit lines for accessing data nodes of the first and second groups of memory cells, wherein the first local bit line, the first local complementary bit line, the second local bit line, the second local complementary bit line, the global bit line and the global complementary bit line are constructed on a same metallization level in the SRAM device. | 04-30-2009 |
| 20100237419 | Static Random Access Memory (SRAM) Cell and Method for Forming Same - In accordance with an embodiment of the present invention, a static random access memory (SRAM) cell comprises a first pull-down transistor, a first pull-up transistor, a first pass-gate transistor, a second pull-down transistor, a second pull-up transistor, a second pass-gate transistor, a first linear intra-cell connection, and a second linear intra-cell connection. Active areas of the transistors are disposed in a substrate, and longitudinal axes of the active areas of the transistors are all parallel. The first linear intra-cell connection electrically couples the active area of the first pull-down transistor, the active area of the first pull-up transistor, and the active area of the first pass-gate transistor to a gate electrode of the second pull-down transistor and a gate electrode of the second pull-up transistor. The second linear intra-cell connection electrically couples the active area of the second pull-down transistor, the active area of the second pull-up transistor, and the active area of the second pass-gate transistor to a gate electrode of the first pull-down transistor and a gate electrode of the first pull-up transistor. | 09-23-2010 |
| 20100315862 | Stable SRAM Cell - SRAM cells and SRAM cell arrays are described. In one embodiment, an SRAM cell includes a first inverter and a second inverter cross-coupled with the first inverter to form a first data storage node and a complimentary second data storage node for latching a value. The SRAM cell further includes a first pass-gate transistor and a switch transistor. A first source/drain of the first pass-gate transistor is coupled to the first data storage node, and a second source/drain of the first pass-gate transistor is coupled to a first bit line. The first source/drain of the switch transistor is coupled to the gate of the first pass-gate transistor. | 12-16-2010 |
| 20110269275 | Static Random Access Memory (SRAM) Cell and Method for Forming Same - An embodiment is a method for forming a static random access memory (SRAM) cell. The method comprises forming transistors on a semiconductor substrate and forming a first linear intra-cell connection and a second linear intra-cell connection. Longitudinal axes of the active areas of the transistors are parallel. A first pull-down transistor and a first pull-up transistor share a first common gate structure, and a second pull-down transistor and a second pull-up transistor share a second common gate structure. The first linear intra-cell connection electrically couples active areas of the first pull-down transistor and the first pull-up transistor to the second common gate structure. The second linear intra-cell connection electrically couples active areas of the second pull-down transistor and the second pull-up transistor to the first common gate structure. | 11-03-2011 |
| 20120108036 | Active Region Patterning in Double Patterning Processes - A method includes forming an SRAM cell including a first and a second pull-up transistor and a first and a second pull-down transistor. The step of forming the SRAM cell includes forming a first and a second active region of the first and the second pull-up transistors using a first lithography mask, and forming a third and a fourth active region of the first and the second pull-down transistors using a second lithography mask. | 05-03-2012 |
| 20120120703 | MEMORY DEVICE WITH ASYMMETRICAL BIT CELL ARRAYS AND BALANCED RESISTANCE AND CAPACITANCE - An SRAM or other semiconductor integrated circuit device includes a memory cell array having a layout portion in which a plurality of cell arrays extend along a substantially parallel pair of bit lines. Each cell array is separated from an adjacent cell array by a strap cell. As the cell arrays extend along the bit line pair, they form an alternating sequence of first and second cell arrays in which the first cell array is asymmetric with respect to the second cell array. In each first cell array, the bit line is coupled to a greater number of contacts and in each second cell array, the complementary bit line is coupled to a greater number of contacts. The first cell arrays may all include the same layout and orientation. | 05-17-2012 |
