Patent application number | Description | Published |
20090089768 | Data management for dynamically compiled software - Method, apparatus and system are described to perform a data management. In some embodiments, a software application is dynamically compiled, data of the dynamically compiled software application is stored in a first region of a memory and instructions of the dynamically compiled software application are stored in a second region of the memory. | 04-02-2009 |
20090178032 | Mining for performance data for systems with dynamic compilers - In an example data mining process, performance data for instructions that execute in a data processing system is obtained. The performance data may comprise instruction addresses and corresponding performance information. A dump that comprises the instructions and corresponding instruction addresses may also be obtained. Common code segments in the dump may be automatically identified. A common code segment may comprise an ordered set of multiple instructions that appears multiple times in the dump. Aggregate performance data for the common code segments may be generated, based at least in part on (a) the instruction addresses associated with the common code segments in the dump, and (b) the instruction addresses and the corresponding performance information from the performance data. Other embodiments are described and claimed. | 07-09-2009 |
20120167924 | CLEANING DEVICE AND A CLEANING METHOD OF A FIXED ABRASIVES POLISHING PAD - A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body. | 07-05-2012 |
20120244706 | CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing method includes providing a device layer having a surface to be polished, polishing the surface using an alkaline grinding slurry, removing a residual layer that is been formed on the polished surface using an acid buffer, forming a passivation layer covering the polished surface of the device layer after the residual layer has been removed, and cleaning the passivation layer using deionized water. A semiconductor device thus fabricated has surfaces with excellent flatness, good manufacturing yield and long-term reliability. | 09-27-2012 |
20120276825 | CHEMICAL MECHANICAL POLISHER AND POLISHING PAD COMPONENT THEREOF - This disclosure is directed to a chemical mechanical polisher and a polishing pad component thereof. The chemical mechanical polisher comprises a polishing platen having a flat surface, and the polishing platen comprises: an electromagnet disposed under the flat surface and configured to fix a polishing pad base on the flat surface; and a switch configured to control the power-on and power-off of the electromagnet. The polishing pad component comprises a polishing pad base, and the polishing pad base is formed of a ferromagnetic material. The chemical mechanical polisher of this disclosure and the polishing pad component thereof can make polishing pad replacement easy, and can also save polishing pads and thus reduce the consumable cost of the chemical mechanical polishing. | 11-01-2012 |
20120309278 | METHOD FOR REMOVING POLISHING BYPRODUCTS AND POLISHING DEVICE - A method for removing polishing byproducts and a polishing device are provided. The method includes mounting a positive electrode on the center of a polishing platen and a negative electrode on an edge of the polishing platen, applying a voltage between the positive electrode and the negative electrode after a polishing process for metal is finished, and rotating the polishing platen and rinsing a polishing pad with deionized water or a chemical cleaning solution to remove polishing byproducts that are formed in the polishing process. The combination of the centrifugal force and the electromotive force increases the removal rate of the polishing byproducts. | 12-06-2012 |
20130290971 | Scheduling Thread Execution Based on Thread Affinity - In accordance with some embodiments, spatial and temporal locality between threads executing on graphics processing units may be analyzed and tracked in order to improve performance. In some applications where a large number of threads are executed and those threads use common resources such as common data, affinity tracking may be used to improve performance by reducing the cache miss rate and to more effectively use relatively small-sized caches. | 10-31-2013 |
20140003262 | SOUNDING REFERENCE SIGNAL (SRS) MECHANISM FOR INTRACELL DEVICE-TO-DEVICE (D2D) COMMUNICATION | 01-02-2014 |
20140123274 | Password Setting and Verification - Methods and systems for setting and verifying a password in a password protected device. Setting a password includes receiving a configuration password entered via a keyboard, wherein the configuration password includes position information of at least one key on the keyboard, and symbol information of at least one key on the keyboard, and storing the configuration password. Verifying a password includes receiving an entered password on the keyboard, obtaining a stored configuration password, wherein the configuration password includes position information of at least one key on the keyboard and symbol information of at least one key on the keyboard, and verifying the entered password based on the configuration password. The keyboard may be a randomly arranged keyboard. Even if nearby persons can see the selection of symbols displayed on the keys for a password, they cannot determine the real content of the password, and thus cannot access the password-protected device. | 05-01-2014 |
20140185947 | CODER BASED PARTIAL IMAGE STORAGE AND RETRIEVAL - Systems, apparatus, articles, and methods are described including operations for coder based partial image storage and retrieval. | 07-03-2014 |
20140198694 | TRANSMISSION POWER CONTROL SCHEMES FOR D2D COMMUNICATIONS - Power control schemes for D2D communications are described. The schemes control the transmission power of a UE during D2D communications in a manner that reduces interference while maintaining the D2D communications link and the cellular link with the eNB. Open-loop and/or closed-loop techniques are employed. | 07-17-2014 |
20140323018 | POLISHING DEVICE FOR REMOVING POLISHING BYPRODUCTS - A method for removing polishing byproducts and a polishing device are provided. The method includes mounting a positive electrode on the center of a polishing platen and a negative electrode on an edge of the polishing platen, applying a voltage between the positive electrode and the negative electrode after a polishing process for metal is finished, and rotating the polishing platen and rinsing a polishing pad with deionized water or a chemical cleaning solution to remove polishing byproducts that are formed in the polishing process. The combination of the centrifugal force and the electromotive force increases the removal rate of the polishing byproducts. | 10-30-2014 |
20140380463 | PASSWORD SETTING AND VERIFICATION - Methods for setting and verifying a password in a password protected device. Setting a password includes receiving a configuration password entered via a keyboard, wherein the configuration password includes position information of at least one key on the keyboard, and symbol information of at least one key on the keyboard, and storing the configuration password. Verifying a password includes receiving an entered password on the keyboard, obtaining a stored configuration password, wherein the configuration password includes position information of at least one key on the keyboard and symbol information of at least one key on the keyboard, and verifying the entered password based on the configuration password. The keyboard may be a randomly arranged keyboard. Even if nearby persons can see the selection of symbols displayed on the keys for a password, they cannot determine the real content of the password, and thus cannot access the password-protected device. | 12-25-2014 |
20150079885 | DEVICE FOR CLEANING FIXED ABRASIVES POLISHING PAD - A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body. | 03-19-2015 |