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Faure, US
André Faure, Sarasota, FL US
| Patent application number | Description | Published |
|---|---|---|
| 20110288541 | METHOD OF PERCUTANEOUS LOCALIZED OR FOCAL TREATMENT OF PROSTATE LESIONS USING RADIO FREQUENCY - The present invention is related to a method of realizing percutaneous (transperineal) ablation of prostate tumor regions, using a radio frequency based coiled device. A bipolar electrode assembly comprising an outer helical electrode and an inner electrode arranged concentric with the outer helical electrode, wherein prior to applying radio frequency energy, at least the outer helical electrode is inserted percutaneously into the prostate. An image of the prostate and of the outer helical electrode as inserted is acquired, such that the outer helical electrode is visualized on the image. A graphical representation of a target position of the bipolar electrode assembly is superposed on the image. | 11-24-2011 |
Burt Faure, Sands Point, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090248500 | Apparatus and method for supporting and shielding a wireless device - A receptacle for supporting a transponder on a support structure includes a housing having a first housing portion securable to the transponder and a second housing portion securable to the support structure. The first housing portion is pivotally secured to the second housing portion. The first housing portion and second housing portion include a shield for attenuating the transmission of electromagnetic signals. The first housing portion has a first position wherein the first housing portion and second housing portion form a chamber for enclosing the transponder and restricting the transmission of electromagnetic signals from the chamber. The first housing portion has a second position wherein the first housing portion and the transponder are displaced from the second housing portion thereby opening the chamber and exposing the transponder to permit the transmission of electromagnetic signals to and from the transponder. | 10-01-2009 |
Michel Faure, Oakland, NJ US
| Patent application number | Description | Published |
|---|---|---|
| 20100009392 | USE OF MELANOMA INHIBITORY ACTIVITY (MIA) PROTEIN AS AN EARLY INDICATOR FOR THERAPEUTIC RESPONSE IN MELANOMA - The present invention provides a method for determining a response of a mammalian subject having melanoma tumor cells to treatment with a melanoma inhibitory agent. In one aspect, the method comprises (a) determining a first concentration of melanoma inhibitory activity protein (MIA) in a first biological sample taken from the mammalian subject before treatment with the melanoma inhibitory agent; (b) determining a second concentration of MIA in a second biological sample from the mammalian subject taken after treatment with the melanoma inhibitory agent; and (c) comparing the first and second concentrations of MIA, wherein a decrease in the second concentration of MIA measured in the second biological sample as compared to the first concentration of MIA measured in the first biological sample indicates a positive response to the treatment with the melanoma inhibitory agent. | 01-14-2010 |
Michel Faure, Emeryville, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090239922 | Kinesin inhibitors as cancer therapeutics - The invention provides novel compounds having a substituted imidazole ring, and methods of using such compounds for the treatment of certain disorders such as hematological cancers and solid tumors. The compounds of the invention are tri-substituted imidazole derivatives that inhibit KSP. These compounds are also useful for the treatment of drug resistant tumors, such as solid tumors that express elevated levels of P-glycoprotein. | 09-24-2009 |
Sylvain Faure, Huntington Beach, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100004976 | DEMAND CURVE ANALYSIS METHOD FOR ANALYZING DEMAND PATTERNS - The present disclosure describes novel methods that can be utilized to analyze demand patterns for one or more products based on time series data for the product(s) such as order history, shipment history, and point of sale history. The data may be organized into one or more hierarchies and may contain one or more attributes. | 01-07-2010 |
| 20100010869 | DEMAND CURVE ANALYSIS METHOD FOR PREDICTING FORECAST ERROR - The present disclosure describes novel methods of demand planning for one or more products including estimating forecast error. The data may be organized into one or more hierarchies and may contain one or more attributes. | 01-14-2010 |
| 20100088153 | DEMAND CURVE ANALYSIS METHOD FOR DEMAND PLANNING - The present disclosure describes novel methods for estimating the predictability of demand for one or more products. The data may be organized into one or more hierarchies and may contain one or more attributes. | 04-08-2010 |
Thomas B. Faure, Milton, VT US
| Patent application number | Description | Published |
|---|---|---|
| 20090100399 | DESIGN STRUCTURE FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED MASK BIAS WITH ALTERNATING PHASE SHIFT MASKS - A design structure, method, and system for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks, or with other two-mask lithographic processes employing a trim mask. A design structure is embodied in a machine readable medium used in a design process, the design structure comprising regions in a finished semiconductor design that do not contain as-designed shapes. The design structure additionally includes dummy fill shapes in the regions at a predetermined final density, wherein the generated dummy shapes are sized so that their local density is increased to a predetermined value. Moreover, corresponding trim shapes act to expose an oversized portion of the dummy shape, effectively trimming each dummy shape back to the predetermined final density. | 04-16-2009 |
| 20100086876 | TECHNIQUES FOR REDUCING DEGRADATION AND/OR MODIFYING FEATURE SIZE OF PHOTOMASKS - A photomask includes a light transmitting substrate and an absorber layer adjacent thereto. The absorber layer includes a silicide, such as molybdenum silicide, patterned into a plurality of features. The surrounding environment is controlled to prevent undesirable growth by oxidation of the absorber layer when the mask is exposed to light while being used to fabricate integrated circuits. In another aspect, the surrounding environment is controlled to encourage desirable growth by oxidation of the absorber layer when the mask is exposed to light. | 04-08-2010 |