| Patent application number | Description | Published |
|---|
| 20090241996 | SINGLE WAFER DRYER AND DRYING METHODS - In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing. | 10-01-2009 |
| 20100120335 | Partial Contact Wafer Retaining Ring Apparatus - The partial contact wafer retaining ring apparatus is disclosed. For example, one disclosed embodiment provides a wafer retaining ring comprising a ring for retaining the wafer, the ring having an inner diameter surface configured to restrict lateral wafer motion, and at least one interface surface configured to interface with a polishing surface. The interface surface comprises a recessed section adjacent to the ring inner diameter, configured to preclude contact between the recessed section and the polishing surface. | 05-13-2010 |
| 20110139175 | ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE IMPLANT STRIP - Improved methods and apparatus for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, the workpiece is exposed to a passivation plasma, allowed to cool for a period of time, and then exposed to an oxygen-based or hydrogen-based plasma to remove the photoresist and ion implant related residues. Aspects of the invention include reducing silicon loss, leaving little or no residue while maintaining an acceptable strip rate. In certain embodiments, methods and apparatus remove photoresist material after high-dose ion implantation processes. | 06-16-2011 |
| 20110143548 | ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP - Improved methods for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, plasma is generated using elemental hydrogen, a fluorine-containing gas and a protectant gas. The plasma-activated gases reacts with the high-dose implant resist, removing both the crust and bulk resist layers, while simultaneously protecting exposed portions of the work piece surface. The work piece surface is substantially residue free with low silicon loss. | 06-16-2011 |
| Patent application number | Description | Published |
|---|
| 20090161012 | Dynamic multilayer video processing method - In a dynamic multilayer video processing method applied to a signal receiving apparatus, the signal receiving apparatus is connected to a display device. To display a screen on the display device, the method transmits a request signal to a system control end connected to the signal receiving apparatus for receiving a video signal and a graphic/text data, and processes and divides the video signal and the graphic/text data into a video image layer and a graphic/text data image layer, and then displays a dynamic multilayer menu on the display device for users to select the required displayed image, and finally displays an image layer specified by a select instruction on the display device according to at least one select instruction received by the signal receiving apparatus, so that the contents of the TV video, graphic/text data or OSD information on the display panel can be processed, displayed or modified; | 06-25-2009 |
| 20090161909 | Method of dynamically showing a water mark - A method of dynamically showing a water mark is applied in an audio/video transmitter. The audio/video transmitter includes a plurality of display contents such as a playback area name, a playback date, a playback time and an identification mark. The audio/video transmitter continues obtaining a plurality of frames from an audio/video source such as an audio/video server or an audio/video database and temporarily stores the frames in a buffer. The audio/video transmitter also produces a water mark from at least one display content according to a plurality of display conditions such as display coordinates, appearance, time and frequency, and composes the water mark with at least one frame stored in the buffer to form at least one display screen, and shows the display screen on an output unit, such that the water mark on the display screen cannot be changed or overwritten, and viewers can identify the water mark easily. | 06-25-2009 |
| 20090165063 | Method for centrally distributing screensaver video to protect display devices - The present invention is to provide a method for centrally distributing screensaver video to protect display devices, which is implemented to a central VOD system comprising a remote video server, a plurality of signal transmission devices, and display devices each connected to a signal transmission device. The remote video server has a plurality of ordinary video data and at least a screensaver video data therein; each signal transmission device may receive a screensaver video data and at least one ordinary video data, and then transmit the screensaver video data and the ordinary video data to the display device connected thereto. The signal transmission device outputs the screensaver data on the display device when not receiving any control signal within a predetermined period of time, and does not resume the original ordinary video data on the display device unless the signal transmission device receives the control signal again. | 06-25-2009 |
