Patent application number | Description | Published |
20080240655 | Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding - A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. In one example, a dopant concentration within a top cladding material is between 3-6% (wt.). Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized. | 10-02-2008 |
20090009444 | MEMS DEVICES HAVING IMPROVED UNIFORMITY AND METHODS FOR MAKING THEM - Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer. | 01-08-2009 |
20090257105 | DEVICE HAVING THIN BLACK MASK AND METHOD OF FABRICATING THE SAME - A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process. | 10-15-2009 |
20100079847 | MULTI-THICKNESS LAYERS FOR MEMS AND MASK-SAVING SEQUENCE FOR SAME - In various embodiments described herein, methods for forming a plurality of microelectromechanical systems (MEMS) devices on a substrate are described. The MEMS devices comprise x number of different sacrificial or mechanical structures with x number of different sacrificial structure thicknesses or mechanical structure stiffnesses and wherein the x number of sacrificial or mechanical structures are formed by x-1 depositions and x-1 masks. | 04-01-2010 |
20100202039 | MEMS DEVICES HAVING SUPPORT STRUCTURES WITH SUBSTANTIALLY VERTICAL SIDEWALLS AND METHODS FOR FABRICATING THE SAME - Embodiments of MEMS devices include support structures having substantially vertical sidewalls. Certain support structures are formed through deposition of self-planarizing materials or via a plating process. Other support structures are formed via a spacer etch. Other MEMS devices include support structures at least partially underlying a movable layer, where the portions of the support structures underlying the movable layer include a convex sidewall. In further embodiments, a portion of the support structure extends through an aperture in the movable layer and over at least a portion of the movable layer. | 08-12-2010 |
20100238572 | DISPLAY DEVICE WITH OPENINGS BETWEEN SUB-PIXELS AND METHOD OF MAKING SAME - An electromechanical systems device includes a plurality of supports disposed over a substrate and a deformable reflective layer disposed over the plurality of supports. The deformable reflective layer includes a plurality of substantially parallel columns extending in a first direction. Each column has one or more slots extending in a second direction generally perpendicular to the first direction. The slots can be created at boundary edges of sub-portions of the columns so as to partially mechanically separate the sub-portions without electrically disconnecting them. A method of fabricating an electromechanical device includes depositing an electrically conductive deformable reflective layer over a substrate, removing one or more portions of the deformable layer to form a plurality of electrically isolated columns, and forming at least one crosswise slot in at least one of the columns. | 09-23-2010 |
20100265563 | ELECTROMECHANICAL DEVICE CONFIGURED TO MINIMIZE STRESS-RELATED DEFORMATION AND METHODS FOR FABRICATING SAME - Embodiments of MEMS devices include a movable layer supported by overlying support structures, and may also include underlying support structures. In one embodiment, the residual stresses within the overlying support structures and the movable layer are substantially equal. In another embodiment, the residual stresses within the overlying support structures and the underlying support structures are substantially equal. In certain embodiments, substantially equal residual stresses are be obtained through the use of layers made from the same materials having the same thicknesses. In further embodiments, substantially equal residual stresses are obtained through the use of support structures and/or movable layers which are mirror images of one another. | 10-21-2010 |
20110169724 | INTERFEROMETRIC PIXEL WITH PATTERNED MECHANICAL LAYER - Interferometric modulators and methods of making the same are disclosed. In one embodiment, an interferometric display includes a sub-pixel having a membrane layer with a void formed therein. The void can be configured to increase the flexibility of the membrane layer. The sub-pixel can further include an optical mask configured to hide the void from a viewer. In another embodiment, an interferometric display can include at least two movable reflectors wherein each movable reflector has a different stiffness but each movable reflector has substantially the same effective coefficient of thermal expansion. | 07-14-2011 |
20110235155 | MECHANICAL LAYER AND METHODS OF SHAPING THE SAME - A method of shaping a mechanical layer is disclosed. In one embodiment, the method comprises depositing a support layer, a sacrificial layer and a mechanical layer over a substrate, and forming a support post from the support layer. A kink is formed adjacent to the support post in the mechanical layer. The kink comprises a rising edge and a falling edge, and the kink can be configured to control the shaping and curvature of the mechanical layer upon removal of the sacrificial layer. | 09-29-2011 |
20110249315 | MECHANICAL LAYER AND METHODS OF FORMING THE SAME - This disclosure provides mechanical layers and methods of forming the same. In one aspect, an electromechanical systems device includes a substrate and a mechanical layer having an actuated position and a relaxed position. The mechanical layer is spaced from the substrate to define a collapsible gap. The gap is in a collapsed condition when the mechanical layer is in the actuated position and in a non-collapsed condition when the mechanical layer is in the relaxed position. The mechanical layer includes a reflective layer, a conductive layer, and a supporting layer. The supporting layer is positioned between the reflective layer and the conductive layer and is configured to support the mechanical layer. | 10-13-2011 |
20120194496 | APPARATUS AND METHOD FOR SUPPORTING A MECHANICAL LAYER - This disclosure provides systems, methods and apparatuses for supporting a mechanical layer. In one aspect, an electromechanical systems device includes a substrate, a mechanical layer, and a post positioned on the substrate for supporting the mechanical layer. The mechanical layer is spaced from the substrate and defines one side of a gap between the mechanical layer and the substrate, and the mechanical layer is movable in the gap between an actuated position and a relaxed position. The post includes a wing portion in contact with a portion of the mechanical layer, the wing portion positioned between the gap and the mechanical layer. The wing portion can include a plurality of layers configured to control the curvature of the mechanical layer. | 08-02-2012 |
20120194897 | BACKSIDE PATTERNING TO FORM SUPPORT POSTS IN AN ELECTROMECHANICAL DEVICE - This disclosure provides systems, methods and apparatus for backside patterning of structures in electromechanical devices. In one aspect, backside patterning of supports in an electromechanical device allows the size of the supports to be reduced, increasing the active region of the electromechanical device. In electromechanical devices having black masks, the black masks may include a partially transmissive aperture aligned with the supports which enable backside patterning of the support through the black mask. The black mask may include an interferometric black mask in which an upper reflective layer has been patterned to form an aperture extending therethrough. | 08-02-2012 |
20120242638 | DIELECTRIC SPACER FOR DISPLAY DEVICES - This disclosure provides systems, methods and apparatus for forming spacers on a substrate and building an electromechanical device over the spacers and the substrate. In one aspect, a raised anchor area is formed over the spacer by adding layers that result in a high point above the substrate. The high point can protect the movable sections of the MEMS device from contact with a backplate. | 09-27-2012 |
20120248478 | PIXEL VIA AND METHODS OF FORMING THE SAME - This disclosure provides systems, methods and apparatuses for pixel vias. In one aspect, a method of forming an electromechanical device having a plurality of pixels includes depositing an electrically conductive black mask on a substrate at each of four corners of each pixel, depositing a dielectric layer over the black mask, depositing an optical stack including a stationary electrode over the dielectric layer, depositing a mechanical layer over the optical stack, and anchoring the mechanical layer over the optical stack at each corner of each pixel. The method further includes providing a conductive via in a first pixel of the plurality of pixels, the via in the dielectric layer electrically connecting the stationary electrode to the black mask, the via disposed at a corner of the first pixel, offset from where the mechanical layer is anchored over the optical stack in an optically non-active area of the first pixel. | 10-04-2012 |
20120249558 | PIXEL VIA AND METHODS OF FORMING THE SAME - This disclosure provides systems, methods and apparatuses for pixel vias. In one aspect, a method of forming an electromechanical device having a plurality of pixels includes depositing an electrically conductive black mask on a substrate at each of four corners and along at least one edge region of each pixel, depositing a dielectric layer over the black mask, depositing an optical stack including a stationary electrode over the dielectric layer, and depositing a mechanical layer over the optical stack. The method further includes providing a conductive via in a first pixel of the plurality of pixels, the via disposed in the dielectric layer and electrically connecting the stationary electrode to the black mask, the via disposed in a position along an edge of the first pixel, spaced offset from the edge of the first pixel in a direction towards the center of the first pixel. | 10-04-2012 |
20120268430 | MECHANICAL LAYER AND METHODS OF MAKING THE SAME - This disclosure provides mechanical layers and methods of forming the same. In one aspect, a method of forming a pixel includes depositing a black mask on a substrate, depositing an optical stack over the black mask, and forming a mechanical layer over the optical stack. The black mask is disposed along at least a portion of a side of the pixel, and the mechanical layer defines a cavity between the mechanical layer and the optical stack. The mechanical layer includes a reflective layer, a dielectric layer, and a cap layer, and the dielectric layer is disposed between the reflective layer and the cap layer. The method further includes forming a notch in the dielectric layer of the mechanical layer along the side of the pixel so as to reduce the overlap of the dielectric layer with the black mask along the side of the pixel. | 10-25-2012 |
20120287138 | ELECTROMECHANICAL DEVICE CONFIGURED TO MINIMIZE STRESS-RELATED DEFORMATION AND METHODS FOR FABRICATING SAME - Embodiments of MEMS devices include a movable layer supported by overlying support structures, and may also include underlying support structures. In one embodiment, the residual stresses within the overlying support structures and the movable layer are substantially equal. In another embodiment, the residual stresses within the overlying support structures and the underlying support structures are substantially equal. In certain embodiments, substantially equal residual stresses are be obtained through the use of layers made from the same materials having the same thicknesses. In further embodiments, substantially equal residual stresses are obtained through the use of support structures and/or movable layers which are mirror images of one another. | 11-15-2012 |
20130057558 | MECHANICAL LAYER AND METHODS OF MAKING THE SAME - This disclosure provides systems, methods and apparatus for controlling a mechanical layer. In one aspect, an electromechanical systems device includes a substrate and a mechanical layer positioned over the substrate to define a gap. The mechanical layer is movable in the gap between an actuated position and a relaxed position, and includes a mirror layer, a cap layer, and a dielectric layer disposed between the mirror layer and the cap layer. The mechanical layer is configured to have a curvature in a direction away from the substrate when the mechanical layer is in the relaxed position. In some implementations, the mechanical layer can be formed to have a positive stress gradient directed toward the substrate that can direct the curvature of the mechanical layer upward when the sacrificial layer is removed. | 03-07-2013 |
20130088498 | ELECTROMECHANICAL SYSTEMS DEVICE WITH NON-UNIFORM GAP UNDER MOVABLE ELEMENT - Systems, methods and apparatus are provided for electromechanical systems devices having a non-uniform gap under a mechanical layer. An electromechanical systems device includes a movable element supported at its edges over a substrate by at least two support structures. The movable element can be spaced from the substrate by a gap having two or more different heights in two or more corresponding distinct regions. The gap has a first height in a first region below the gap, such as an active area of the device, and a second height in a second region adjacent the support structure. In an interferometric modulator implementation, the second region can be encompasses within an anchor region with a black mask. | 04-11-2013 |
20130100145 | ELECTROMECHANICAL SYSTEMS DEVICE - This disclosure provides systems, methods, and apparatus for EMS devices. In one aspect, an EMS device includes at least one movable layer configured to move relative to one or more electrodes. The at least one movable layer can include a first conductive layer, a second conductive layer, and a non-conductive layer disposed between the first conductive layer and the second conductive layer. In some implementations, the movable layer can include at least one conductive via electrically connecting the first conductive layer and the second conductive layer through the non-conductive layer. | 04-25-2013 |
20130113810 | SIDEWALL SPACERS ALONG CONDUCTIVE LINES - Systems, methods and apparatus are provided for electromechanical systems devices having a sidewall spacer along at least one sidewall of a conductive line. An electromechanical systems device can include a sidewall spacer along at least one sidewall of a conductive line under a movable layer. The sidewall spacer can be sloped such that the sidewall spacer has a decreasing width away from a substrate under the movable layer. The conductive line can be configured to route an electrical signal to the electromechanical systems device. In some implementations, a black mask structure of an electromechanical systems device can include the conductive line. | 05-09-2013 |
20140071139 | IMOD PIXEL ARCHITECTURE FOR IMPROVED FILL FACTOR, FRAME RATE AND STICTION PERFORMANCE - Pixels that include display elements that are configured with different structural dimensions corresponding to the color of light they provide are disclosed. In one implementation, a display device includes an array having a plurality of electromechanical pixels disposed on a substrate, each pixel including at least a first display element and a second display element. Each of the first and second display elements interferometrically modulating light by moving a reflective element between a relaxed position spaced apart from the substrate to an actuated position further away from the substrate than the relaxed position by applying a voltage across the reflective element and a stationary electrode. The stationary electrode of each display element is sized to provide actuation of the movable reflective element using the same actuation voltage even though the electrical gap through which the reflective element moves is different within a pixel. | 03-13-2014 |
20140098109 | MOVABLE LAYER DESIGN FOR STRESS CONTROL AND STIFFNESS REDUCTION - Systems, methods and apparatuses reduce stress and/or reduce stiffness in a movable layer of an electromechanical systems (EMS) device. Stress or stiffness can be reduced by including one or more compressive stress layers to compensate for the tensile stress exhibited by other layers of the movable layer. The movable layer can include a dielectric core with a first tensile stress layer and a first compressive stress layer on a first side of the dielectric core, and a second tensile stress layer and a second compressive stress layer on a second side of the dielectric core. | 04-10-2014 |
20140168223 | PIXEL ACTUATION VOLTAGE TUNING - This disclosure provides systems, methods and apparatus for electromechanical systems displays. In one aspect, the display can include a plurality of electromechanical display elements including a first set of electromechanical display elements and a second set of electromechanical display elements. Each electromechanical display element can include a common electrode and a segment electrode. Each of the segment electrodes of the first set of electromechanical display elements can have a first area located under the common electrodes of the first set. Each of the segment electrodes of the second set of electromechanical display elements can have a second area smaller than the first area located under the common electrodes of the second set. In some implementations, an actuation voltage of each electromechanical display element of the first set is approximately the same as an actuation voltage of each electromechanical display element of the second set. | 06-19-2014 |
20140192060 | CONTROLLING MOVABLE LAYER SHAPE FOR ELECTROMECHANICAL SYSTEMS DEVICES - Systems, methods and apparatus are provided for controlling launch effects of movable layers in electromechanical systems (EMS) devices. First and second EMS devices with first and second step creating layers are positioned over a substrate and spaced, by different gaps, from the movable layers of the EMS devices. The movable layers of the first and second EMS devices include steps having different heights and/or different edge spacing from the center of an anchoring region of each EMS device. The different steps can provide different launch effects for different EMS devices, and if the same thickness of sacrificial material is used for the different devices, the different launch effects can be responsible for different gap heights in the unbiased conditions. | 07-10-2014 |
20140210836 | LAYER FOR REDUCED CHARGE MIGRATION BETWEEN MEMS LAYERS - This disclosure provides systems, methods and apparatus for reducing image artifacts that arise when a display is exposed to sunlight over time. Various implementations disclosed herein can be implemented to prevent charge injection from inducing a negative offset voltage shift for display elements in the display. In one aspect, a buffer layer is applied to block electrons from being photoelectrically ejected from a movable reflective layer of a display element and into a stationary optical stack of the display element. | 07-31-2014 |