Patent application number | Description | Published |
20080198344 | Lithographic apparatus and method of removing liquid - A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the-substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap. | 08-21-2008 |
20080212046 | Lithographic apparatus and device manufacturing method - A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape. | 09-04-2008 |
20090296056 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table. | 12-03-2009 |
20100208224 | LITHOGRAPHIC APPARATUS AND METHOD OF REMOVING LIQUID - A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap. | 08-19-2010 |
20120138816 | Device Comprising A Source For Emitting Ultraviolet Light | 06-07-2012 |
20120138817 | Device Comprising Means For Guiding Fluid From An Inlet To An Outlet - A device comprises a housing ( | 06-07-2012 |
20130081224 | DEVICE FOR PURIFYING A FLUID | 04-04-2013 |
20140098353 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape. | 04-10-2014 |