Patent application number | Description | Published |
20090005449 | STRUCTURED COMPOSITIONS COMPRISING BETAINE - Provided are structured compositions comprising an anionic surfactant, a betaine, and a branched fatty alcohol, the composition having a Yield Stress from about 1 Pascal (Pa) to about 1500 Pa, as well as methods of making and using such compositions. | 01-01-2009 |
20090005460 | METHODS OF MAKING AND USING STRUCTURED COMPOSITIONS COMPRISING BETAINE - Provided are methods of making structured compositions comprising an anionic surfactant, a betaine, and a branched fatty alcohol, the composition having a Yield Stress from about 1 Pascal (Pa) to about 1500 Pa. | 01-01-2009 |
20090005462 | STRUCTURED DEPILATORY COMPOSITIONS - Provided are compositions comprising a depilatory active; and a surfactant, wherein the composition has a Yield Stress of from about 1 Pascal (Pa) to about 1500 Pa, and methods of use thereof. | 01-01-2009 |
20090246376 | METHODS AND PRODUCTS FOR APPLYING STRUCTURED COMPOSITIONS TO A SUBSTRATE - Provided are methods of, and personal care products for, applying a structured composition to a body with reduced wet slip. The methods and products apply the composition such that upon application a plurality of channels are disposed between the composition and the substrate. | 10-01-2009 |
20090247966 | METHODS AND PRODUCTS FOR APPLYING STRUCTURED COMPOSITIONS TO A SUBSTRATE - Provided are methods of, and personal care products for, applying a structured composition to a body with reduced wet slip. The methods and products apply the composition such that upon application a plurality of channels are disposed between the composition and the substrate. | 10-01-2009 |
20100158961 | STRUCTURED LOTIONS - Provided are structured compositions comprising a quaternary ammonium salt, at least one branched fatty alcohol, and a vehicle. | 06-24-2010 |
20110152384 | MILD LEAVE-ON SKIN CARE COMPOSITIONS - This invention relates to a composition that is mild to the skin containing a cosmetically acceptable oil; water; a cosmetically acceptable emulsifier having an HLB of from about 1 to about 25; and a preservative comprising an organic acid selected from the group consisting of benzoic acid, p-anisic acid, sorbic acid, lactic acid, acetic acid, formic acid, oxalic acid, tartaric acid, salicylic acid and citric acid; wherein said composition has a pH less than 5 and a buffer capacity of between about 0.001 and about 0.039. | 06-23-2011 |
20110319306 | LOW-IRRITATING, CLEAR CLEANSING COMPOSITIONS WITH RELATIVELY LOW PH - The methods and compositions of this invention relate to compositions having low irritation characteristics in combination with one or more additional characteristics, for example, relatively high clarity, relatively high foaming, and/or combinations thereof, as well as methods of making and using such compositions. These compositions have low pH values and are useful in cleansing the skin. | 12-29-2011 |
20140105847 | STRUCTURED DEPILATORY COMPOSITIONS - Provided are compositions comprising a depilatory active; and a surfactant, wherein the composition has a Yield Stress of from about 1 Pascal (Pa) to about 1500 Pa, and methods of use thereof. | 04-17-2014 |