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Eschbach
Florence Eschbach, Portola Valley, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080241711 | Removal and prevention of photo-induced defects on photomasks used in photolithography - Photoinduced defects that occur on photomasks used in photolithography may be removed or prevented. In one example a photomask is installed into a vacuum chamber, the contaminants on the photomask are broken down with heat, illumination or both and the broken-down contaminants are removed with a vacuum. | 10-02-2008 |
| 20110294048 | MOUNTING A PELLICLE TO A FRAME - A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle. | 12-01-2011 |
Martin Eschbach, Hattingen DE
| Patent application number | Description | Published |
|---|---|---|
| 20090120272 | Safety Armor for Protection Against Gunfire and Process for Producing it - A safety armor for protection against gunfire, comprising a shield composed of an alloy steel which has a base carbon content of less than 0.3% by mass of carbon and has been enriched in strength-increasing elements including at least one of carbon and nitrogen by means of a thermochemical treatment in a surface zone extending from at least one outer surface of the shield, with the steel of the surface zone having an increased surface hardness as a result of a thermal treatment including at least one of hardening and tempering carried out after the thermochemical treatment, the steel is enriched to at least 0.5% by mass of carbon in the surface zone and has a minimum hardness of 55 HRC on the outer surface with the presence of carbides in the surface zone, with the shield having a silicon content of not more than 0.4% by mass both in the surface zone and in a lower hardness region adjoining the surface zone which has a carbon content and hardness less than the surface zone. | 05-14-2009 |
Matthew J. Eschbach, Kirkland, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20120136759 | AUTOMATIC INVENTORY BALANCING - A method and system for automatic inventory balancing includes a scanning device | 05-31-2012 |
Steve Allan Eschbach, Greenwood Village, CO US
| Patent application number | Description | Published |
|---|---|---|
| 20080196217 | Locking Zipper Slider Pulls - A zipper locking device comprising hook-loop material adapted to couple to a first zipper slide and hook-loop material adapted to couple a second zipper slide to the first zipper slide. The interlocking hook-loop zipper pulls keep dual zipper-sliders in a closed position until the hook material is separated from the loop material. | 08-21-2008 |
Thomas Eschbach, Bad Säckingen DE
| Patent application number | Description | Published |
|---|---|---|
| 20090184505 | Seam Construction for a Fabric - A seam construction for a woven fabric for an OPW airbag, in particular for person restraint systems, which seam construction is characterized by a weaving seam having a single-layer region which is surrounded by an at least two-layer region, the individual layers of which have in each case a looser woven structure than the single-layer region. | 07-23-2009 |
| 20120058699 | FABRIC, IN PARTICULAR FOR AN AIRBAG - A fabric is described, in particular for an airbag, consisting at least partially of hollow filament yarns (K, S) made of a polymer material, wherein the fabric has a cover factor DG, according to Professor Walz, that is equal to the cover factor when using solid filament yarns of the same diameter. | 03-08-2012 |
Thomas Eschbach, Rheinheim DE
| Patent application number | Description | Published |
|---|---|---|
| 20090314378 | Airbag Fabric - Fabric for an airbag, comprising warp threads and weft threads, in particular using multifilaments, characterized by a weave density greater than the 95% Professor Walz standard. It can also have a permeability (LD) of less than 3 l/dm | 12-24-2009 |
Thomas Eschbach, Bad Säckingen DE
| Patent application number | Description | Published |
|---|---|---|
| 20090184505 | Seam Construction for a Fabric - A seam construction for a woven fabric for an OPW airbag, in particular for person restraint systems, which seam construction is characterized by a weaving seam having a single-layer region which is surrounded by an at least two-layer region, the individual layers of which have in each case a looser woven structure than the single-layer region. | 07-23-2009 |