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Engelen
Adrianus Franciscus, Petrus Engelen, Waalre NL
| Patent application number | Description | Published |
|---|---|---|
| 20080239268 | Lithographic apparatus and method - A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate. | 10-02-2008 |
| 20090033902 | Lithographic apparatus and method - A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate. | 02-05-2009 |
Adrianus Fransiscus Petrus Engelen, Waalre NL
| Patent application number | Description | Published |
|---|---|---|
| 20110211181 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus. | 09-01-2011 |
Andreas Theodorus Engelen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100276592 | Compact Scanning Electron Microscope - A slider bearing for use with an apparatus comprising a vacuum chamber ( | 11-04-2010 |
Dirk Valentinus René Engelen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100090617 | METHOD AND DEVICE FOR COMPOSING A LIGHTING ATMOSPHERE FROM AN ABSTRACT DESCRIPTION AND LIGHTING ATMOSPHERE COMPOSITION SYSTEM - The invention relates to composing a lighting atmosphere from an abstract description for example a lighting atmosphere specified in XML, wherein the lighting atmosphere is generated by several lighting devices, by automatically rendering the desired lighting atmosphere from the abstract description. The abstract description describes the type of light with certain lighting parameters desired at certain semantic locations at certain semantic times. This abstract atmosphere description is automatically transferred to a specific instance of a lighting system ( | 04-15-2010 |
Dirk Valentinus René Engelen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100090617 | METHOD AND DEVICE FOR COMPOSING A LIGHTING ATMOSPHERE FROM AN ABSTRACT DESCRIPTION AND LIGHTING ATMOSPHERE COMPOSITION SYSTEM - The invention relates to composing a lighting atmosphere from an abstract description for example a lighting atmosphere specified in XML, wherein the lighting atmosphere is generated by several lighting devices, by automatically rendering the desired lighting atmosphere from the abstract description. The abstract description describes the type of light with certain lighting parameters desired at certain semantic locations at certain semantic times. This abstract atmosphere description is automatically transferred to a specific instance of a lighting system ( | 04-15-2010 |
Fernd Engelen, Bothell, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20100097695 | INCUBATION CONTAINER SYSTEM - A method and system for providing a container for investigating at least one specimen are described. The method and system include providing a dish. The dish includes a floor, a plurality of sidewalls, and at least one pedestal. The floor has a perimeter. The plurality of sidewalls coupled with the floor proximate to the perimeter. The at least one pedestal resides on a portion of the floor and is pedestal configured to support at least one microscope slide distal from the floor. The at least one microscope slide bears the specimen(s) for investigation. | 04-22-2010 |
Herbert Engelen, Buehl DE
| Patent application number | Description | Published |
|---|---|---|
| 20080199689 | Thermoplastic fiber concentrate methods and articles - A feedstock concentrate material, including a first phase including fibers having a length greater than 5 mm; and a polymeric phase including a first polyolefin having a first melt flow rate; and a second polyolefin having a second melt flow rate. Kits, methods of using and resulting articles including the concentrate are also disclosed. | 08-21-2008 |
| 20100010149 | THERMOPLASTIC FIBER CONCENTRATE METHODS AND ARTICLES - A feedstock concentrate material, including a first phase including fibers having a length greater than 5 mm; and a polymeric phase including a first polyolefin having a first melt flow rate; and a second polyolefin having a second melt flow rate. Kits, methods of using and resulting articles including the concentrate are also disclosed. | 01-14-2010 |
Josephus A.e.p. Van Engelen, Aliso Viejo, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090119426 | Serial Data Interface System and Method Using A Selectively Accessed Tone Pattern Generator - A system and method performs speed and connection handshaking between Beta signal ports and/or Bilingual ports in a serial data interface system. A tone pattern generator (e.g., a flip-flop) can be used to generate a tone pattern signal representing approximately 49 MHz to approximately 62 MHz. A selecting system (e.g., a multiplexer, a digital multiplexer, or the like) selectively transmits either the tone pattern signal or a data input signal. These signals include a driver control signal. A serializer serializes either the tone pattern signal or the data input signal. A clock device (e.g., a clock divider) drives the tone pattern generator and the serializer. A driver receives and differentially transmits, along a twister-wire pair, either the serialized tone pattern signal or the serialized data input signal. | 05-07-2009 |