Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Emnet
Charlotte Emnet, Dresden DE
| Patent application number | Description | Published |
|---|---|---|
| 20090061621 | METHOD OF FORMING A METAL DIRECTLY ON A CONDUCTIVE BARRIER LAYER BY ELECTROCHEMICAL DEPOSITION USING AN OXYGEN-DEPLETED AMBIENT - By suppressing the presence of free oxygen during a cleaning process and a subsequent electrochemical deposition of a seed layer, the quality of a corresponding interface between the barrier material and the seed layer may be enhanced, thereby also improving performance and the characteristics of the finally obtained metal region. Thus, by identifying free oxygen as a main source for negatively affecting the characteristics of metals during a “direct on barrier” plating process, efficient strategies have been developed and are disclosed herein to provide a reliable technique for volume production of sophisticated semiconductor devices. | 03-05-2009 |
Charlotte Emnet, Bad Duerkheim DE
| Patent application number | Description | Published |
|---|---|---|
| 20090061629 | METHOD OF FORMING A METAL DIRECTLY ON A CONDUCTIVE BARRIER LAYER BY ELECTROCHEMICAL DEPOSITION USING AN OXYGEN-DEPLETED AMBIENT - By suppressing the presence of free oxygen during a cleaning process and a subsequent electrochemical deposition of a seed layer, the quality of a corresponding interface between the barrier material and the seed layer may be enhanced, thereby also improving performance and the characteristics of the finally obtained metal region. Thus, by identifying free oxygen as a main source for negatively affecting the characteristics of metals during a “direct on barrier” plating process, efficient strategies have been developed and are disclosed herein to provide a reliable technique for volume production of sophisticated semiconductor devices. | 03-05-2009 |
Charlotte Emnet, Stuttgart DE
| Patent application number | Description | Published |
|---|---|---|
| 20110290659 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT - A composition comprising a source of metal ions and at least one leveling agent obtainable by condensing at least one trialkanolamine of the general formula N(R | 12-01-2011 |
Uwe Emnet, Qatar QA
| Patent application number | Description | Published |
|---|---|---|
| 20110087038 | PROCESS AND DEVICE FOR THE OXIDATION OF ORGANIC COMPOUNDS - The invention relates to a process for the oxidation of organic compounds by means of oxygen, in which, in a first step, the organic compound and at least part of the oxygen required for the oxidation are introduced into a first reaction zone which is operated isothermally and with backmixing and, in a second step, the reaction mixture from the first reaction zone is introduced into a second reaction zone which is operated adiabatically. The invention further relates to a reactor for carrying out the process, which comprises at least one isothermal reaction zone ( | 04-14-2011 |