Patent application number | Description | Published |
20110250538 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME - New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided. | 10-13-2011 |
20120129104 | LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME - New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise such PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic devices | 05-24-2012 |
20120129105 | PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION - A copolymer has formula: | 05-24-2012 |
20120129108 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME - This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups. | 05-24-2012 |
20130084525 | PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME - A photoacid generator compound has the formula (I): | 04-04-2013 |
20130171567 | PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME - A photoacid generator includes those of formula (I): | 07-04-2013 |
20130344438 | PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE - A photoacid generator has the formula (I): | 12-26-2013 |
20140120471 | PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE - A compound having the formula (I): | 05-01-2014 |
20140186770 | DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES - Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices. | 07-03-2014 |
20140295347 | ACID GENERATORS AND PHOTORESISTS COMPRISING SAME - Acid generator compounds are provided that comprise an oxo-1,3-dioxolane moiety and/or an oxo-1,3-dioxane moiety. The acid generators are particularly useful as a photoresist composition component. | 10-02-2014 |
20150056558 | PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME - A photoacid generator compound has the formula (I): | 02-26-2015 |
20150064620 | PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE - A photoacid generator compound has formula (1) | 03-05-2015 |