Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Eimori

Takahisa Eimori, Kanagawa JP

Patent application numberDescriptionPublished
20100258878CMOS SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A CMOS semiconductor device having an n-type MOSFET and a p-type MOSFET, comprising: a gate electrode of the n-type MOSFET having a first insulation layer composed of a high-k material, and a first metal layer provided on the first insulation layer and composed of a metal material; and a gate electrode of the p-type MOSFET having a second insulation layer composed of a high-k material, and a second metal layer provided on the second insulation layer and composed of a metal material, wherein the first insulation layer and the second insulation layer are composed of the different high-k materials, and the first metal layer and the second metal layer are composed of the same metal material.10-14-2010

Takahisa Eimori, Tokyo JP

Patent application numberDescriptionPublished
20080308869SEMICONDUCTOR DEVICE WHICH HAS MOS STRUCTURE AND METHOD OF MANUFACTURING THE SAME - The technology which can control a threshold value appropriately, adopting the material which fitted each gate electrode of the MOS structure from which a threshold value differs without making the manufacturing process complicated, and does not make remarkable diffusion to the channel region from the gate electrode is offered.12-18-2008
20100038729METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A base insulating film containing hafnium and oxygen is formed on a silicon oxide (SiO02-18-2010

Patent applications by Takahisa Eimori, Tokyo JP

Takeshi Eimori, Tonami-Shi JP

Patent application numberDescriptionPublished
20090056450ACCELERATION SENSOR - An acceleration sensor includes a detection element having a plurality of piezoelectric ceramic layers laminated together and a pair of retaining members that retain an end portion of the detection element in a longitudinal direction thereof at two principal surfaces of the end portion. The detection element includes electrodes between the ceramic layers and on principal surfaces. The detection element obtains a voltage or a charge generated in the detection element in response to an application of acceleration from the principal-surface electrodes and the interlayer electrodes. The piezoelectric ceramic layers are not polarized in areas between the principal-surface electrodes and the interlayer electrodes within a retaining area in which the detection element is retained by the retaining members.03-05-2009