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Eiichirou
Eiichirou Hirose, Chichibu-Gun JP
| Patent application number | Description | Published |
|---|---|---|
| 20090273535 | ANTENNA APPARATUS - An antenna apparatus includes: a substrate; an RF ground conductor which is branched to extend in at least two directions and at least a part of which is formed on a surface of the substrate, the RF ground conductor functioning as an antenna ground plane; and an antenna portion, one end of which is connected to the RF ground conductor. | 11-05-2009 |
Eiichirou Ishimizu, Sodegaura-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090127501 | Polishing Composition for Silicon Wafer - The present invention relates to a polishing composition for silicon wafer comprising silica, a basic compound, a polyaminopolycarboxylic acid compound having hydroxy group, and water. The polishing composition can prevent metal contamination by nickel, chromium, iron, copper or the like, particularly copper contamination in polishing of silicon wafer. | 05-21-2009 |
Eiichirou Itou, Mobara JP
| Patent application number | Description | Published |
|---|---|---|
| 20100296019 | LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A TFT substrate includes drain signal lines which are connected with respective pixels, source electrodes which are connected with the drain signal lines via channel portions of transistors, and pixel electrodes which are electrically connected with the source electrodes. The pixel electrode is, further, constituted of a contact-portion electrode which is connected to the source electrode, an opening-portion electrode which is an electrode in an opening portion which is not covered with a black matrix, and a channel upper electrode which is formed so as to cover the channel portion of the transistor of the neighboring pixel. By extending the channel upper electrode to the channel portion of the neighboring pixel, an area of the pixel electrode is increased, and a line width of the opening-portion electrode is made relatively small. Accordingly, the TFT substrate can hold a stable potential. | 11-25-2010 |
Eiichirou Nomitsu, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090187403 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING PROGRAM AND RECORDING MEDIUM - A copyright managing information processing apparatus includes a storage module for storing copyrighted content including audio data; a first topic module for recognizing audio data in content opened to the public by a to-be-opened information processing apparatus, converting the audio data into text data, extracting keywords from the text data, and conducting topic processing using the keywords to create topic information; a second topic module for recognizing audio data in content stored in the storage means, converting the audio data into text data, extracting keywords from the text data, and conducting topic processing using the keywords to create topic information; and a similarity determining module for comparing the topic information generated by the first topic module with that created by the second topic module for thereby determining presence or absence of similarity therebetween. | 07-23-2009 |
Eiichirou Yamanaka, Kumamoto JP
| Patent application number | Description | Published |
|---|---|---|
| 20090291374 | Exposure aligning method and exposure apparatus - In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second shift amount indicating a shift amount of the lower layer pattern in at lease one past lot which has been processed before said exposure target substrate is processed, from the origin point position is determined. A third shift amount indicating a difference between the first shift amount and the second shift amount is calculated and a first correction value is determined based on the third shift amount. An exposure position of an exposure target pattern is adjusted based on the first correction value. | 11-26-2009 |