Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Ehm
Dirk Heinrich Ehm, Lauchcheim DE
| Patent application number | Description | Published |
|---|---|---|
| 20110037961 | LITHOGRAPHIC APPARATUS COMPRISING AN INTERNAL SENSOR AND A MINI-REACTOR, AND METHOD FOR TREATING A SENSING SURFACE OF THE INTERNAL SENSOR - A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface. | 02-17-2011 |
Dirk Heinrich Ehm, Aalen DE
| Patent application number | Description | Published |
|---|---|---|
| 20080315134 | OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS - An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation. | 12-25-2008 |
Dirk Heinrich Ehm, Munich DE
| Patent application number | Description | Published |
|---|---|---|
| 20120086925 | METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM - A method for preventing contaminating gaseous substances ( | 04-12-2012 |
Matthias Ehm, Lahntal DE
| Patent application number | Description | Published |
|---|---|---|
| 20100081212 | ANTIBODIES FOR DETERMINING THE PROTHROMBIN FRAGMENT F2/F1+2 IN A HOMOGENEOUS IMMUNOASSAY - The present invention is in the area of coagulation analysis and relates to antibodies which bind specifically to an immune complex of prothrombin fragment F2/F1+2 and an F2/F1+2 neoepitope-specific antibody fragment, and to the preparation and the use thereof in methods for determining F2/F1+2. | 04-01-2010 |
Matthias Ehm, Lippstadt DE
| Patent application number | Description | Published |
|---|---|---|
| 20100033978 | PROJECTION HEADLIGHT ARRANGEMENT FOR VEHICLES - The invention relates to a projection headlight arrangement for vehicles with a left projection headlight and a right projection headlight, each comprising: a reflector exhibiting two focal points, a light source arranged in a first focal point of the reflector, a lens upstream of the reflector in the direction of light emission whose focus is arranged in the proximity of the second focal point and a diaphragm shaft arranged between the lens and the reflector, which is displaceable in several rotary positions by means of a control unit around a horizontal rotary axis running transversely to the optical axis, wherein the rotary positions each have a diaphragm edge of the diaphragm shaft assigned for the creation of a light-dark boundary for a specified light distribution, wherein a sensor unit is provided for the detection of a traffic participant located in the far-field of the vehicle, the control unit distorts the diaphragm shaft in such a way in dependence on a sensor signal of the sensor unit that such a diaphragm edge of the diaphragm shaft is active, that a complete illumination of the far-field takes place, without blinding the traffic participant detected in the far-field of the vehicle and the diaphragm edges are assigned to light function sectors of the diaphragm shaft, said light function sectors sweeping a variable angular region in the direction of rotation of the diaphragm shaft. | 02-11-2010 |