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Egret
Helene Egret, Rouen FR
| Patent application number | Description | Published |
|---|---|---|
| 20080293883 | Process for Production of (Co)Polyamide Nanocomposite Materials - The present invention concerns a process for preparing a polymer nanocomposite composition, the process comprising: a) mixing a melted polyamide of inherent viscosity under 1 and a nanofiller to disperse the nanofiller in said polyamide; and b) subjecting the previous mixture to polymerization conditions to polymerize the polyamide and to form the polymer nanocomposite composition. Advantageously the inherent viscosity of the polyamide is under 0.9 and preferably between 0.4 and 0.8. Step a) is carried out in an extruder or a mixer. Advantageously a mono or twin-screw extruder is used. Step b) could be made either in melted state or in solid state. It is easier to make it in the same apparatus as step a). Should step a) is carried out in an extruder, step b) is made in the same extruder. Polymerization of step b) can be carried with a catalyst and/or by having the extruder zones in which step b) takes place to operate under vacuum. | 11-27-2008 |
Helene Egret, Bruxelles BE
| Patent application number | Description | Published |
|---|---|---|
| 20080249238 | FLEXIBLE SEMIAROMATIC POLYAMIDES WITH A LOW MOISTURE UPTAKE - The present invention relates to a flexible semiaromatic polyamide composition with a low moisture uptake, made up by weight, the total being 100: | 10-09-2008 |
Sebastien Egret, Lumbin FR
| Patent application number | Description | Published |
|---|---|---|
| 20090094001 | TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM USING MULTIVARIATE ANALYSIS - Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables. | 04-09-2009 |