| Patent application number | Description | Published |
|---|
| 20090098093 | GENERATION OF INNER EAR CELLS - Methods for generating cells of the inner ear, e.g., hair cells and supporting cells, from stem cells, e.g., mesenchymal stem cells, are provided, as well as compositions including the inner ear cells. Methods for the therapeutic use of the inner ear cells for the treatment of hearing loss are also described. | 04-16-2009 |
| 20090124568 | USE OF STEM CELLS TO GENERATE INNER EAR CELLS - This invention relates generally to methods and compositions for inducing stem cell or progenitor cell differentiation, and more particularly to methods and compositions for inducing differentiation of stem cells and/or progenitor cells into cells that function within the inner ear. | 05-14-2009 |
| 20090193533 | Conditional-Stop Dimerizable Caspase Transgenic Animals - Described are transgenic animals for conditional and inducible cell targeting, that express a dimerizable conditional-STOP caspase 3 transgene. | 07-30-2009 |
| 20090232780 | COMPOUNDS THAT ENHANCE ATOH1 EXPRESSION - This invention generally provides compounds, pharmaceutical compositions, and methods for their use, which include methods that result in increased expression in an Atoh1 gene (e.g., Hath1) in a biological cell. More specifically, the invention relates to the treatment of diseases and/or disorders that would benefit from increased Atoh1 expression, e.g., a hearing impairment or imbalance disorder associated with a loss of auditory hair cells, or a disorder associated with abnormal cellular proliferation. | 09-17-2009 |
| 20110305674 | Pathways to Generate Hair Cells - This disclosure relates to methods and compositions for modulating (e.g., increasing) Atoh1 activity (e.g., biological activity) and/or expression (e.g., transcription and/or translation) in vivo and/or in vitro, e.g., in a biological cell and/or in a subject. The methods and compositions described herein can be used in the treatment of diseases and/or disorders that would benefit from increased Atoh1 expression in a biological cell. | 12-15-2011 |
| Patent application number | Description | Published |
|---|
| 20090047798 | METHOD OF FORMING HIGH DIELECTRIC CONSTANT FILMS USING A PLURALITY OF OXIDATION SOURCES - A method is provided for depositing a high dielectric constant (high-k) film for integrated circuits (ICs) by atomic layer deposition (ALD) or chemical vapor deposition (CVD). The method includes exposing a substrate to one or more metal precursors and plurality of oxidation sources to deposit a high-k film with a desired thickness and tailored properties. The plurality of oxidation sources contain a first oxidation source containing H | 02-19-2009 |
| 20120040522 | METHOD FOR INTEGRATING MULTIPLE THRESHOLD VOLTAGE DEVICES FOR CMOS - A method to achieve multiple threshold voltage (Vt) devices on the same semiconductor chip is disclosed. The method provides different threshold voltage devices using threshold voltage adjusting materials and a subsequent drive in anneal instead of directly doping the channel. As such, the method of the present disclosure avoids short channel penalties. Additionally, no ground plane/back gates are utilized in the present application thereby the method of the present disclosure can be easily integrated into current complementary metal oxide semiconductor (CMOS) processing technology. | 02-16-2012 |
| 20120126295 | BORDERLESS CONTACT FOR REPLACEMENT GATE EMPLOYING SELECTIVE DEPOSITION - A self-aligned gate cap dielectric can be employed to form a self-aligned contact to a diffusion region, while preventing electrical short with a gate conductor due to overlay variations. In one embodiment, an electroplatable or electrolessly platable metal is selectively deposited on conductive materials in a gate electrode, while the metal is not deposited on dielectric surfaces. The metal portion on top of the gate electrode is converted into a gate cap dielectric including the metal and oxygen. In another embodiment, a self-assembling monolayer is formed on dielectric surfaces, while exposing metallic top surfaces of a gate electrode. A gate cap dielectric including a dielectric oxide is formed on areas not covered by the self-assembling monolayer. The gate cap dielectric functions as an etch-stop structure during formation of a via hole, so that electrical shorting between a contact via structure formed therein and the gate electrode is avoided. | 05-24-2012 |
| Patent application number | Description | Published |
|---|
| 20110081765 | METHOD TO IMPROVE WET ETCH BUDGET IN FEOL INTEGRATION - A method of forming a semiconductor device is provided where in one embodiment an STI fill is recessed below the pad nitride and pad oxide layers, to a level substantially coplanar with the top surface of the substrate. A thin (having a thickness in the range of about 10 Å-100 Å) wet etch resistant layer is formed in contact with and completely covering at least the top surface of the recessed STI fill material. The thin wet etch resistant layer is more resistant to a wet etch process than at least the pad oxide layer. The thin wet etch resistant layer may be a refractory dielectric material, or a dielectric such as HfO | 04-07-2011 |
| 20110115027 | STRUCTURE AND METHOD TO OBTAIN EOT SCALED DIELECTRIC STACKS - Equivalent oxide thickness (EOT) scaled high k/metal gate stacks are provided in which the capacitance bottleneck of the interfacial layer is substantially eliminated, with minimal compromise on the mobility of carriers in the channel of the device. In one embodiment, the aforementioned EOT scaled high k/metal gate stacks are achieved by increasing the dielectric constant of the interfacial layer to a value that is greater than the originally formed interfacial layer, i.e., the interfacial layer prior to diffusion of a high k material dopant element therein. In another embodiment, the aforementioned scaled high k/metal gate stacks are achieved by eliminating the interfacial layer from the structure. In yet another embodiment, the aforementioned high k/metal gate stacks are achieved by both increasing the dielectric constant of the interfacial layer and reducing/eliminating the interfacial layer. | 05-19-2011 |
| 20110303981 | Scheme to Enable Robust Integration of Band Edge Devices and Alternatives Channels - A method of forming a semiconductor device includes forming a buried oxide (BOX) layer on a semiconductor substrate, forming a silicon-on-insulator (SOI) layer on the BOX layer, depositing a hard mask including one of silicon, a nitride, and a metal oxide on the SOI layer, removing the hard mask from a first region of the semiconductor device, performing a cleaning process on the semiconductor device, wherein the hard mask is not removed from a second region of the semiconductor device by the cleaning process, epitaxially growing a semiconductor material in the first region of the semiconductor device, and removing the hard mask from the second region of the semiconductor device. | 12-15-2011 |
| Patent application number | Description | Published |
|---|
| 20110212733 | SUPPORTING VERSION NEGOTIATION FOR POSITIONING FOR TERMINALS IN A WIRELESS NETWORK - Techniques for supporting positioning for terminals in a wireless network are described. In an aspect, a message is prepared and transmitted with a message segment including a version of a protocol used to encode the message and a compatibility level associated with inter-operable protocol versions, wherein different compatibility levels indicate non-compatibility between protocol versions. In another aspect, a message is received with a message segment including a version of a protocol used to encode the message and a compatibility level associated with inter-operable protocol versions, wherein different compatibility levels indicate non-compatibility between protocol versions. The compatibility level included in the received message is compared to an internal compatibility level and a response message is prepared and transmitted with a message segment including the internal compatibility level. | 09-01-2011 |
| 20110249623 | SUPL 3.0 CONCEPT - Techniques for initiating and, if desired, modifying location services for Secure User Plane Location (SUPL) and other location architectures are described. To initiate SUPL service, a SUPL Location Platform (SLP) transmits a SUPL initial session message applicable to any service request to a SUPL enabled terminal (SET) and receives in response the service capabilities of the SET. The SLP selects and requests service from the SET consistent with the service capabilities of the SET. The SET may initiate SUPL service by requesting the service capabilities of the SLP. The SET selects and requests service from the SLP that is consistent with the service capabilities received from the SLP. The SET and SLP communicate to determine a position estimate for the SET. The service may be modified before or while communicating between the SET and the SLP to determine a position estimate for the SET. | 10-13-2011 |
| 20110256875 | METHOD AND APPARATUS FOR SUPPORTING LOCATION SERVICES VIA A HOME NODE B (HNB) - Techniques for supporting location services for a home Node B (HNB) and its user equipments (UEs) are disclosed. In an aspect, location services may be supported for a UE by having an HNB inter-work between user plane and control plane location solutions. In one design, the HNB receives a request for a location service for the UE and communicates (i) with a location server via the user plane location solution and (ii) with the UE via the control plane location solution to support the location service for the UE. The HNB inter-works between the user plane and control plane location solutions. In another aspect, a location server may be used to support assisted GNSS (A-GNSS) for HNBs and UEs. In one design, an HNB exchanges PCAP messages with the location server via an HNB GW and exchanges RRC messages with a UE to support a location service for the UE. | 10-20-2011 |
| 20110269434 | METHOD AND APPARATUS FOR TIMESTAMPING UPLINK MESSAGES - Methods and devices are provided for disambiguating the timing of uplink transmissions. In one embodiment, the method may involve receiving from a wireless network a global time value having a wraparound time longer than that of a system frame number for the network, the global time value being based at least in part on an overhead message conveying at least one parameter of a first radio access technology (RAT) different from a second RAT used by the network. The method may involve determining a current global time based on the received global time value, and sending an uplink message that includes the current global time as a global timestamp. | 11-03-2011 |
| 20110312280 | POSITIONING PROTOCOL CONVEYANCE - Techniques for selecting positioning protocols consistent with the capabilities of the location server in a Secure User Plane Location (SUPL) based service are described. The SUPL Location Platform (SLP) transmits the service capabilities of the SLP, such as the positioning protocol capabilities of the SLP. The SLP transmits its capabilities of the SLP in an initiation message to the SUPL enabled terminal (SET) or after receiving an initiation message from the SET. The SET may transmit a positioning initiation message and the SLP and SET communicate to determinate one or more position estimates for the SET. The SET may include in the positioning initiation message a positioning protocol positioning message that is consistent with the SLP service capabilities. | 12-22-2011 |
| 20110319095 | METHOD AND APPARATUS FOR PERFORMING POSITION DETERMINATION WITH A SHORT CIRCUIT CALL FLOW - For a call flow to perform position determination, a network sends to a user equipment (UE) an indication (e.g., a request for permission) to perform a position fix for the UE. The UE responds by sending to the network an acknowledgment (e.g., a grant of permission) to perform the position fix. The UE selectively sends a position estimate for itself to the network, typically along with the acknowledgment. The network may initiate location processing if (1) a location estimate is not received from the UE or (2) a location estimate is received from the UE but the network decides not to use this location estimate. In this case, the network and the UE perform location processing to obtain a position fix for the UE. However, if a location estimate is received from the UE and the network decides to use the location estimate, then the location processing is bypassed or short circuited. | 12-29-2011 |
| 20120046014 | METHOD AND APPARATUS FOR SUPPORTING LOCATION SERVICES VIA A GENERIC LOCATION SESSION - Techniques for supporting location services are disclosed. In an aspect, a generic location session between a terminal and a location server may be established for a particular duration or until the generic location session is terminated by a trigger condition. Parameters related to the generic location session may be exchanged between the terminal and the location server during session establishment. Thereafter, the terminal and the location server may engage in one or more positioning activities at any time during the generic location session. Each positioning activity may be of any type supported by the terminal and the location server. The generic location session can be initiated by either the terminal or the location server. In one design, one entity (e.g., the location server) may initiate the generic location session, and the other entity (e.g., the terminal) may send an end message to terminate the generic location session. | 02-23-2012 |
| 20120136623 | LOCATING A DEVICE USING A REFERENCE POINT TO ALIGN LOCATION INFORMATION - In a particular embodiment, a method includes receiving a first set and a second set of location data at a mobile device. The method includes locating a first reference point identifier that is included in the first set of location data and a second reference point identifier that is included in the second set of location data. The first reference point identifier field and the second reference point identifier field identify a common reference point. The method includes identifying first information in the first set of location data that is associated with the common reference point. The method also includes identifying second information in the second set of location data that is associated with the common reference point and spatially aligning the first set of location data with the second set of location data based on the common reference point to associate the first information with the second information. | 05-31-2012 |
