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Economou, US

Anthony Economou, Sparta, NJ US

Patent application numberDescriptionPublished
20080300550POSITIVE DISPLACEMENT STOPPER FOR A PRE-FILLED SYRINGE - A stopper adapted for attachment with a plunger rod for use within a syringe barrel is disclosed. The stopper includes a main body defining an open rearward end and a closed front end. The open rearward end is adapted to receive a front forward end attachment portion of the plunger rod. The stopper also includes a core member integrally formed with said main body adjacent the closed front end. The core member includes a nose portion having a profile adapted to create a positive seal with an outlet opening of such syringe barrel.12-04-2008
20080300551STOPPER AND PLUNGER ROD FOR A PRE-FILLED SYRINGE - A plunger rod adapted for attachment with a stopper for use with a syringe barrel is disclosed. The plunger rod includes an elongated member having a front end and a back end, the plunger rod extending along a longitudinal axis. The plunger rod includes at least one deflecting arm associated with the front end of the elongated member. The deflecting arm is capable of deflecting radially inward during insertion of the plunger rod into a stopper, and deflecting outward into contact with an inner surface of the stopper after insertion to lock the plunger rod within the stopper.12-04-2008
20100314796Syringe and Removable Needle Assembly Having Binary Attachment Features - A syringe and detachable needle assembly having binary attachment features include an elongate syringe barrel having a longitudinal axis, an open proximal end and an open distal end including a collar. The collar includes the cylindrically shaped sidewall having an inside surface and an outside surface. A needle assembly includes the hub having a body portion including a proximal end, a distal end and a conduit therethrough. A cannula having a distal end, a proximal end and a lumen therethrough is attached to the distal end of the hub so that the lumen is in fluid communication with the chamber. A lug is provided on one of the collar and the hub and a ramp and a rest surface is provided on the other of the collar and the hub. The ramp is oriented at an acute angle with respect to longitudinal axis for guiding the lug during needle assembly attachment, to the rest surface forcing the hub to contact the barrel to form a seal the hub and the barrel.12-16-2010
20100318038Syringe and Removable Needle Assembly Having Binary Attachment Features - A syringe and detachable needle assembly having binary attachment features include an elongate syringe barrel having a longitudinal axis, an open proximal end and an open distal end including a collar. The collar includes the cylindrically shaped sidewall having an inside surface and an outside surface. A needle assembly includes the hub having a body portion including a proximal end, a distal end and a conduit therethrough. A cannula having a distal end, a proximal end and a lumen therethrough is attached to the distal end of the hub so that the lumen is in fluid communication with the chamber. A lug is provided on one of the collar and the hub and a ramp and a rest surface is provided on the other of the collar and the hub. The ramp is oriented at an acute angle with respect to longitudinal axis for guiding the lug during needle assembly attachment, to the rest surface forcing the hub to contact the barrel to form a seal the hub and the barrel.12-16-2010

Demetre Economou, Houston, TX US

Patent application numberDescriptionPublished
20100132887System and Method For Nano-Pantography - A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e.g., a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner. 06-03-2010

Demetre J. Economou, Houston, TX US

Patent application numberDescriptionPublished
20090283215SYSTEM AND METHOD FOR NANO-PANTOGRAPHY - A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e.g., a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.11-19-2009
20110139748ATOMIC LAYER ETCHING WITH PULSED PLASMAS - A system and method for rapid atomic layer etching (ALET) including a pulsed plasma source, with a spiral coil electrode, a cooled Faraday shield, a counter electrode disposed at the top of the tube, a gas inlet and a reaction chamber including a substrate support and a boundary electrode. The method includes positioning an etchable substrate in a plasma etching chamber, forming a product layer on the surface of the substrate, removing a portion of the product layer by pulsing a plasma source, then repeating the steps of forming a product layer and removing a portion of the product layer to form an etched substrate.06-16-2011

Patent applications by Demetre J. Economou, Houston, TX US

James Economou, Pacific Palisades, CA US

Patent application numberDescriptionPublished
20080199424MART-1 T CELL RECEPTORS - T-cell receptors that recognize MART-1 antigen are provided. The TCRs can be used, for example, to treat patients suffering from melanoma.08-21-2008

Nicholas Economou, Lexington, MA US

Patent application numberDescriptionPublished
20110049364REDUCING PARTICLE IMPLANTATION - Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.03-03-2011

Nickolaos Economou, Oxford, MI US

Patent application numberDescriptionPublished
20080271462THERMAL ELECTRIC HVAC MODULE - A heating ventilation and cooling (HVAC) system includes: a fan blower; and a cross-flow heat exchanger in fluid communication with the fan blower. The cross-flow heat exchanger includes a first set of conduits which define a first communication path, a second set of conduits which define a second communication path and a thermoelectric device therebetween.11-06-2008

Vangelis Economou, Wilmette, IL US

Patent application numberDescriptionPublished
20080277400Food service heat retention device - A heat retaining dish includes a pressure relief mechanism and has a heat retention material capable of being heated by microwave or other thermal radiation in order to maintain any food placed on the dish at an elevated temperature. The heat retention material is capable of accommodating expansion during heating of the device, and when an overpressure condition occurs as a result of inadvertent overheating, the pressure relief mechanism vents the pressure to the ambient environment. The pressure relief mechanism is an integral part of the wall construction of at least one of the portions making up the housing of the device, and deformation due to overpressure directly causes the opening of the pressure relief mechanism as soon as the housing is deformed sufficiently to open a fluid communication path through an aperture in the wall.11-13-2008