Patent application number | Description | Published |
20080302955 | TECHNIQUES FOR ION BEAM CURRENT MEASUREMENT USING A SCANNING BEAM CURRENT TRANSFORMER - Techniques for ion beam current measurement using a scanning beam current transformer are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion beam current measurement using a transformer. The apparatus may comprise a measurement device positioned adjacent a wafer and an ion dose control module coupled to the measurement device. The measurement device may comprise a transformer through which an ion beam passes onto the wafer. The ion dose control module may calculate ion beam current passing through the transformer and adjust dose based at least in part upon the calculated ion beam current. | 12-11-2008 |
20100155600 | METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT - An non-Faraday ion dose measurement device is positioned within a plasma process chamber and includes a sensor located above a workpiece within the chamber. The sensor is configured to detect the number of secondary electrons emitted from a surface of the workpiece exposed to a plasma implantation process. The sensor outputs a current signal proportional to the detected secondary electrons. A current circuit subtracts the detected secondary current generated from the sensor and subtracts it from a bias current supplied to the workpiece within the chamber. The difference between the currents provides a measurement of the ion dose current calculated in situ and during the implantation process. | 06-24-2010 |
20100159120 | PLASMA ION PROCESS UNIFORMITY MONITOR - An ion uniformity monitoring device is positioned within a plasma process chamber and includes a plurality of sensors located above and a distance away from a workpiece within the chamber. The sensors are configured to detect the number of secondary electrons emitted from a surface of the workpiece exposed to a plasma process. Each sensor outputs a current signal proportional to the detected secondary electrons. A current comparator circuit outputs a processed signal resulting from each of the plurality of current signals. The detection of the secondary electrons emitted from the workpiece during plasma processing is indicative of the uniformity characteristic across the surface of the workpiece and may be performed in situ and during on-line plasma processing. | 06-24-2010 |
20120021136 | SYSTEM AND METHOD FOR CONTROLLING PLASMA DEPOSITION UNIFORMITY - A plasma process uniformity control apparatus comprises a plasma chamber defined by chamber walls and a plurality of magnetic elements disposed on the outside of the chamber walls. Each of the plurality of magnets is configured to supply a magnetic field directed at respective portions of the plasma inside the chamber to control the uniformity of the plasma directed toward the target substrate. | 01-26-2012 |
20150325405 | PROCESSING APPARATUS AND METHOD OF TREATING A SUBSTRATE - A processing apparatus including a process chamber, a plasma source disposed within the process chamber, wherein the plasma source is movable in a first direction and is configured to emit an ion beam along a second direction that is orthogonal to the first direction. The apparatus may further include a platen disposed within the process chamber for supporting a substrate, and an ion beam current sensor that is disposed adjacent to the platen. | 11-12-2015 |
Patent application number | Description | Published |
20090255861 | Filtration device with a pressure-activated means for bypassing serial filter layers - A serial-flow filtration device is provided with pressure-activated means for by-passing at least one of its constituent layer (or layers) of filtration material. The filtration device comprises a housing, a fluid inlet, a fluid outlet, and at least an upper and a rearmost filter layer. The upper filter layer divides the interior of the housing into an upstream zone and a downstream zone, with the rearmost filter layer residing in the downstream zone. The fluid inlet enables the introduction of fluid into said upstream zone. The fluid outlet enables releases of the fluid from said downstream zone. The upper filter layer, but not the rearmost filter layer, has integrated thereinto a pressure-activated means capable of allowing substantially non-selective passage of fluid from the upstream zone into the downstream zone upon the attainment of a predetermined pressure differential across said upper filter layer. The bypass means can be embodied, for example, as a pressure-breachable seal or as a pressure-activated gate. | 10-15-2009 |
20110266204 | MANIFOLD ADAPTOR PLATE FOR FILTRATION APPARATUS - A manifold adaptor plate useful as a gasket having liquid pathways which permit passing of a filtrate, a feed and a retentate wherein admixture of the filtrate with the feed or the retentate is prevented is provided and is formed of an elastomeric layer, a rigid intermediate layer and a polymer layer. The elastomeric layer functions as a gasket and is bonded to the polymeric layer through the liquid pathways of the intermediate plate. An elastomer layer may be formed on both layers as well and optionally a second polymer layer between the intermediate layer and the second elastomer layer may also be used. | 11-03-2011 |
20110303592 | Filtration Device with Pressure-Activated Means for Bypassing Serial Filter Layers - A serial-flow filtration device is provided with pressure-activated means for by-passing at least one of its constituent layer (or layers) of filtration material. The filtration device comprises a housing, a fluid inlet, a fluid outlet, and at least an upper and a rearmost filter layer. The upper filter layer divides the interior of the housing into an upstream zone and a downstream zone, with the rearmost filter layer residing in the downstream zone. The fluid inlet enables the introduction of fluid into said upstream zone. The fluid outlet enables releases of the fluid from said downstream zone. The upper filter layer, but not the rearmost filter layer, has integrated thereinto a pressure-activated means capable of allowing substantially non-selective passage of fluid from the upstream zone into the downstream zone upon the attainment of a predetermined pressure differential across said upper filter layer. The bypass means can be embodied, for example, as a pressure-breachable seal or as a pressure-activated gate. | 12-15-2011 |