| Patent application number | Description | Published |
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| 20100108035 | ADDRESSING FUEL PRESSURE UNCERTAINTY DURING STARTUP OF A DIRECT INJECTION ENGINE - An engine system and a method of starting an internal combustion engine of the engine system are described. In one embodiment, the method includes adjusting a fuel pressure within a fuel rail to a first value; after the fuel pressure within the fuel rail attains the first value, initiating delivery of fuel to the internal combustion engine from the fuel rail by successively injecting fuel directly into combustion chambers of the internal combustion engine; and after at least a first fuel injection event, reducing the fuel pressure within the fuel rail from the first value to a second value over subsequent successive fuel injection events by adjusting an operating parameter of the high pressure fuel pump. The method may optionally include increasing an air-fuel ratio over subsequent successive fuel injection events after fuel delivery is initiated by varying an amount of fuel that is directly injected into the combustion chambers. | 05-06-2010 |
| 20100139624 | HIGH PRESSURE FUEL PUMP CONTROL FOR IDLE TICK REDUCTION - A method for controlling a mechanical solenoid valve of a high-pressure fuel pump to supply fuel to an engine is provided. The method includes: during an idle condition, adjusting a pull-in current of the mechanical solenoid valve utilized to control closing of the mechanical solenoid valve based on a fuel pressure downstream of the high-pressure fuel pump, wherein the pull-in current is reduced when possible while enabling the mechanical solenoid valve to close as indicated by an increase in the downstream fuel pressure. | 06-10-2010 |
| 20100175657 | COLD-START RELIABILITY AND REDUCING HYDROCARBON EMISSIONS IN A GASOLINE DIRECT INJECTION ENGINE - A method for starting an engine of a motor vehicle under varying temperature conditions, the engine having a plurality of combustion chambers and a pump for pressurizing fuel for delivery to the combustion chambers, the method comprising during a first, higher-temperature, starting condition, directly injecting fuel into all of the combustion chambers during at least an initial fueled cycle of the engine, and spark igniting the fuel to increase a rotation speed of the engine, the initial fueled cycle comprising two rotations of a crankshaft of the engine during which at least some fuel is injected for a first time since the engine was brought from rest; and during a second, lower-temperature, starting condition, directly injecting fuel into less than all of the combustion chambers during at least the initial fueled cycle of the engine, and spark igniting the fuel to increase the rotation speed of the engine. | 07-15-2010 |
| Patent application number | Description | Published |
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| 20080279442 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method - A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring. | 11-13-2008 |
| 20090073406 | MARKER STRUCTURE, MASK PATTERN, ALIGNMENT METHOD, AND LITHOGRAPHIC METHOD AND APPARATUS - A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to determine optical alignment or overlay, includes constituent parts to define the marker structure. The constituent parts include a plurality of segments, each segment having substantially a size of a device feature and a segment shape. The mask pattern includes at least one assist feature located at a critical part of the segment shape. The at least one assist feature has substantially a size below a resolution of the lithographic projection and is configured to counteract optical aberrations or optical limitations generated in the lithographic projection at the critical part. | 03-19-2009 |
| 20100161099 | Optimization Method and a Lithographic Cell - Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized. | 06-24-2010 |
| 20100301458 | Alignment Target Contrast in a Lithographic Double Patterning Process - A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The day may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist). | 12-02-2010 |
| 20110007314 | Method and apparatus for angular-resolved spectroscopic lithography characterization - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. | 01-13-2011 |
