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Dubois, CA
Brian Dubois, Redwood City, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080234602 | BIOLOGICAL UNIT REMOVAL TOOLS WITH RETENTION MECHANISM - Tools and methods are provided for removing biological units from a body surface utilizing a removal tool. The tools may incorporate retention members and mechanisms configured to impede movement of the biological unit in the direction of a distal end of the tool and to improve retention of the biological unit in the tool. Some of the retention members are stationary and some are movable within the lumen of the biological unit removal tools. The distal tips of the tools are desirably configured to reduce the chance of transection of a biological unit, such as by including both cutting segments and blunt relief segments. A number of dual concentric tube embodiments permit a division of removal functions. Distal fluid or gas delivery may supplement a vacuum in a luminal space to help extract biological units from surrounding tissue. | 09-25-2008 |
| 20080234697 | DEVICE AND METHOD FOR HARVESTING AND IMPLANTING FOLLICULAR UNITS - Device and method for harvesting and implanting hair follicular units is provided. A combined harvesting and implanting tool or tool assembly provides a harvesting cannula portion detachably coupled to an implanting cannula portion. The harvesting and implanting cannula portions may be coupled by a connector that could be designed to allow for multiple uses of the tool assembly, or alternatively may be designed for single use and rendered non-functional when the implanting cannula portion of the tool is separated from the harvesting cannula portion of the tool. | 09-25-2008 |
| 20120010631 | Device and Method for Harvesting and Implanting Follicular Units - Device and method for harvesting and implanting hair follicular units is provided. A combined harvesting and implanting tool or tool assembly provides a harvesting cannula portion detachably coupled to an implanting cannula portion. The harvesting and implanting cannula portions may be coupled by a connector that could be designed to allow for multiple uses of the tool assembly, or alternatively may be designed for single use and rendered non-functional when the implanting cannula portion of the tool is separated from the harvesting cannula portion of the tool. | 01-12-2012 |
Brian R. Dubois, Redwood City, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080221605 | CUTTING DEVICE POSITIONED VIA CONTROL WIRE TO PERFORM SELECTIVE DISCECTOMY - A cutting device for performing a selective discectomy is disclosed along with a method for using the device whereby the device is inserted into the intervertebral disc at a point contralateral, anterior, or anterolateral to a site of herniation. The device includes a shaft with a cutting mechanism at its distal end. Control wire(s) attached to either or both shafts may be used to position cutting components and perform the discectomy. | 09-11-2008 |
| 20120004595 | DEVICES AND METHODS FOR CUTTING AND EVACUATING TISSUE - Various medical devices and methods for cutting and/or evacuating tissue are provided. The devices and methods may utilize a reciprocating mechanism or motor powered by suction from a vacuum source. The medical devices and methods may be used on tissue in various regions of a patient's body and for treating various conditions, e.g., for performing a polypectomy or discectomy. | 01-05-2012 |
| 20120283742 | DEVICES AND METHODS FOR CUTTING TISSUE - Various medical devices and methods for cutting and/or evacuating tissue are provided. The devices and methods may utilize a reciprocating mechanism or motor powered by suction from a vacuum source. The medical devices and methods may be used on tissue in various regions of a patient's body and for treating various conditions, e.g., for performing a polypectomy or discectomy. | 11-08-2012 |
Brian Robert Dubois, Redwood City, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090259126 | METHODS AND DEVICES FOR DELIVERING INJECTIONS - Device and method are provided for diagnosing and treating diseases and injuries to the spine by injecting drugs into the diseased or injured area. The device and method of the subject invention provide improvements to patient and operator safety, along with ease-of-use and convenience improvements over conventional techniques. | 10-15-2009 |
| 20110306879 | METHODS AND DEVICES FOR TREATING TISSUE - Device and method are provided for diagnosing and treating diseases and injuries to the spine by injecting drugs into the diseased or injured area. The device and method of the subject invention provide improvements to patient and operator safety, along with ease-of-use and convenience improvements over conventional techniques. | 12-15-2011 |
Daisy Joe Dubois, Palo Alto, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090215724 | Pyrrolopyrazine kinase inhibitors - The present invention relates to the use of novel pyrrolopyrazine derivatives of Formula I, | 08-27-2009 |
| 20090215750 | Pyrrolopyrazine kinase inhibitors - The present invention relates to the use of novel pyrrolopyrazine derivatives of Formula I, | 08-27-2009 |
| 20090215785 | Pyrrolopyrazine kinase inhibitors - The present invention relates to the use of novel pyrrolopyrazine derivatives of Formula I, | 08-27-2009 |
| 20100267666 | Pyrrolopyrazine kinase inhibitors - The present invention relates to the use of novel pyrrolopyrazine derivatives of Formula I, | 10-21-2010 |
Dale Dubois, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090314309 | METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER - A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region. | 12-24-2009 |
| 20100012273 | Method and System for Supplying a Cleaning Gas Into a Process Chamber - A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region. | 01-21-2010 |
Dale R. Dubois, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090014127 | SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING - Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions. | 01-15-2009 |
| 20120097330 | DUAL DELIVERY CHAMBER DESIGN - A substrate processing system includes a thermal processor or a plasma generator adjacent to a processing chamber. A first processing gas enters the thermal processor or plasma generator. The first processing gas then flows directly through a showerhead into the processing chamber. A second processing gas flows through a second flow path through the showerhead. The first and second processing gases are mixed below the showerhead and a layer of material is deposited on a substrate under the showerhead. | 04-26-2012 |
| 20120211164 | SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING - Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions. | 08-23-2012 |
Dana J. Dubois, San Francisco, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100076958 | SYSTEM AND METHOD FOR PLAYLIST GENERATION BASED ON SIMILARITY DATA - System, method and computer program that encompasses one or more client devices cooperating with a program host's on-line data processing center for making purchase recommendations of media items to a program participant. Accordingly, there is a transmission from a program host to a program participant of identification of at least one recommended-for-purchase media item selected based on the recommended-for-purchase media item being rated as similar to a designated media item presently contained in an inventory of a media library of the program participant. The rating of the recommended-for-purchase media item as being similar to the designated media item presently contained in the inventory of the media library of the program participant is representative of a frequency at which the recommended-for-purchase media item co-occurs with the designated media item in media libraries of others. | 03-25-2010 |
Donald Dubois, Portola Valley, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100030701 | Method and apparatus for computing and displaying a risk-return profile as a risk measure for financial assets - A method and apparatus for displaying a financial asset risk-return profile is disclosed. The method includes determining the length of a period; computing an integer number of intervals in a date range set, an interval being an integer multiple of the length of the period; for each interval, computing the number of interval sub-sets in the date range set, each interval sub-set spanning the time spanned by a corresponding interval; for each interval, computing a metric of the interval sub-sets; and for each interval, displaying the computed metric. The displayed financial asset risk-return profile includes a total return component and a hold time component of risk. | 02-04-2010 |
Donald Dubois, Redwood City, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110153523 | METHOD AND APPARATUS FOR COMPUTING AND DISPLAYING A RISK-RETURN PROFILE AS A RISK MEASURE FOR FINANCIAL ASSETS - A method and apparatus for displaying a financial asset risk-return profile is disclosed. The method includes determining the length of a period; computing an integer number of intervals in a date range set, an interval being an integer multiple of the length of the period; for each interval, computing the number of interval sub-sets in the date range set, each interval sub-set spanning the time spanned by a corresponding interval; for each interval, computing a metric of the interval sub-sets; and for each interval, displaying the computed metric. The displayed financial asset risk-return profile includes a total return component and a hold time component of risk. | 06-23-2011 |
Frederic Dubois, San Francisco, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090083166 | Supporting Chargeable Subcontracting When Outsourcing Manufacturing Of An Assembled Unit While Supplying Components - A digital processing system supporting management of purchase orders according to chargeable subcontracting model in an outsourcing organization. In one embodiment, when a user provides an order for a desired quantity of an assembly type from an external organization, the digital processing system automatically raises a sales order, as originating from the external organization, corresponding to each of a set of components required for manufacturing the assembly type. On receiving a receipt indication indicating the successful delivery of the order, the digital processing system calculates a net payable amount to be paid to the external organization. Additional aspects of the invention facilitate setting up of chargeable contracting model with simulated (within the digital processing system) external organizations, planning of purchase orders, etc. | 03-26-2009 |
Geraud Dubois, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090075472 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS - Methods of minimizing or eliminating plasma damage to low k and ultra low k organosilicate intermetal dielectric layers are provided. The reduction of the plasma damage is effected by interrupting the etch and strip process flow at a suitable point to add an inventive treatment which protects the intermetal dielectric layer from plasma damage during the plasma strip process. Reduction or elimination of a plasma damaged region in this manner also enables reduction of the line bias between a line pattern in a photoresist and a metal line formed therefrom, and changes in the line width of the line trench due to a wet clean after the reactive ion etch employed for formation of the line trench and a via cavity. The reduced line bias has a beneficial effect on electrical yields of a metal interconnect structure. | 03-19-2009 |
| 20120329269 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS - Methods of minimizing or eliminating plasma damage to low k and ultra low k organosilicate intermetal dielectric layers are provided. The reduction of the plasma damage is effected by interrupting the etch and strip process flow at a suitable point to add an inventive treatment which protects the intermetal dielectric layer from plasma damage during the plasma strip process. Reduction or elimination of a plasma damaged region in this manner also enables reduction of the line bias between a line pattern in a photoresist and a metal line formed therefrom, and changes in the line width of the line trench due to a wet clean after the reactive ion etch employed for formation of the line trench and a via cavity. The reduced line bias has a beneficial effect on electrical yields of a metal interconnect structure. | 12-27-2012 |
Geraud Jean-Michel Dubois, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20130075908 | SEMICONDUCTOR INTERCONNECT STRUCTURE HAVING ENHANCED PERFORMANCE AND RELIABILITY - An interconnect structure and method for fabricating the interconnect structure having enhanced performance and reliability, by minimizing oxygen intrusion into a seed layer and an electroplated copper layer of the interconnect structure, are disclosed. At least one opening in a dielectric layer is formed. A sacrificial oxidation layer disposed on the dielectric layer is formed. The sacrificial oxidation layer minimizes oxygen intrusion into the seed layer and the electroplated copper layer of the interconnect structure. A barrier metal layer disposed on the sacrificial oxidation layer is formed. A seed layer disposed on the barrier metal layer is formed. An electroplated copper layer disposed on the seed layer is formed. A planarized surface is formed, wherein a portion of the sacrificial oxidation layer, the barrier metal layer, the seed layer, and the electroplated copper layer are removed. In addition, a capping layer disposed on the planarized surface is formed. | 03-28-2013 |
Geraud Jean-Michel Dubois, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090291389 | PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE - A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C. | 11-26-2009 |
| 20100055307 | Nanoporous Media with Lamellar Structures - A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure. | 03-04-2010 |
| 20110136928 | POLY-OXYCARBOSILANE COMPOSITIONS FOR USE IN IMPRINT LITHOGRAPHY - The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator. | 06-09-2011 |
| 20110245418 | Nanoporous Media Templated from Unsymmetrical Amphiphilic Porogens - Substantially or roughly spherical micellar structures useful in the formation of nanoporous materials by templating are disclosed. A roughly spherical micellar structure is formed by organization of one or more spatially unsymmetric organic amphiphilic molecules. Each of those molecules comprises a branched moiety and a second moiety. The branched moiety can form part of either the core or the surface of the spherical micellar structure, depending on the polarity of the environment. The roughly spherical micellar structures form in a thermosetting polymer matrix. They are employed in a templating process whereby the amphiphilic molecules are dispersed in the polymer matrix, the matrix is cured, and the porogens are then removed, leaving nanoscale pores. | 10-06-2011 |
| 20110256713 | POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IMPRINT PROCESS USING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS - A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and | 10-20-2011 |
Geraud Jean-Michel Dubois, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110183525 | Homogeneous Porous Low Dielectric Constant Materials - In one exemplary embodiment, a method includes: providing a structure having a first layer overlying a substrate, where the first layer includes a dielectric material having a plurality of pores; applying a filling material to an exposed surface of the first layer; heating the structure to a first temperature to enable the filling material to homogeneously fill the plurality of pores; after filling the plurality of pores, performing at least one process on the structure; and after performing the at least one process, removing the filling material from the plurality of pores by heating the structure to a second temperature to decompose the filling material. | 07-28-2011 |
| 20120282784 | HOMOGENEOUS POROUS LOW DIELECTRIC CONSTANT MATERIALS - In one exemplary embodiment, a method includes: providing a structure having a first layer overlying a substrate, where the first layer includes a dielectric material having a plurality of pores; applying a filling material to an exposed surface of the first layer; heating the structure to a first temperature to enable the filling material to homogeneously fill the plurality of pores; after filling the plurality of pores, performing at least one process on the structure; and after performing the at least one process, removing the filling material from the plurality of pores by heating the structure to a second temperature to decompose the filling material. | 11-08-2012 |
| 20120329273 | HOMOGENEOUS POROUS LOW DIELECTRIC CONSTANT MATERIALS - In one exemplary embodiment, a method includes: providing a structure having a first layer overlying a substrate, where the first layer includes a dielectric material having a plurality of pores; applying a filling material to an exposed surface of the first layer; heating the structure to a first temperature to enable the filling material to homogeneously fill the plurality of pores; after filling the plurality of pores, performing at least one first process on the structure; after performing the at least one first process, removing the filling material from the plurality of pores by heating the structure to a second temperature to decompose the filling material; and after removing the filling material from the plurality of pores, performing at least one second process on the structure, where the at least one second process is performed at a third temperature that is greater than the second temperature. | 12-27-2012 |
| 20130017682 | Overburden Removal For Pore Fill Integration ApproachAANM Bruce; Robert L.AACI White PlainsAAST NYAACO USAAGP Bruce; Robert L. White Plains NY USAANM Dubois; Geraud Jean-MichelAACI San JoseAAST CAAACO USAAGP Dubois; Geraud Jean-Michel San Jose CA USAANM Frot; Theo J.AACI Los GatosAAST CAAACO USAAGP Frot; Theo J. Los Gatos CA USAANM Volksen; WilliAACI San JoseAAST CAAACO USAAGP Volksen; Willi San Jose CA US - In one exemplary embodiment of the invention, a method includes: providing a structure having a first layer overlying a substrate, where the first layer includes a dielectric material having a plurality of pores; applying a filling material to a surface of the first layer; after applying the filling material, heating the structure to enable the filling material to at least partially fill the plurality of pores, where heating the structure results in residual filling material being left on the surface of the first layer; and after heating the structure, removing the residual filling material by applying a solvent wash. | 01-17-2013 |
| 20130017688 | Reduction Of Pore Fill Material DewettingAANM Dubois; Geraud Jean-MichelAACI San JoseAAST CAAACO USAAGP Dubois; Geraud Jean-Michel San Jose CA USAANM Frot; Theo J.AACI Los GatosAAST CAAACO USAAGP Frot; Theo J. Los Gatos CA USAANM Magbitang; Teddie P.AACI San JoseAAST CAAACO USAAGP Magbitang; Teddie P. San Jose CA USAANM Volksen; WilliAACI San JoseAAST CAAACO USAAGP Volksen; Willi San Jose CA US - In one exemplary embodiment, a method includes: providing a structure having a first layer overlying a substrate, where the first layer includes a dielectric material having a plurality of pores; applying a filling material to a surface of the first layer, where the filling material includes a polymer and at least one additive, where the at least one additive includes at least one of a surfactant, a high molecular weight polymer and a solvent; and after applying the filling material, heating the structure to enable the filling material to at least partially fill the plurality of pores uniformly across an area of the first layer, where heating the structure results in residual filling material being uniformly left on the surface of the first layer. | 01-17-2013 |
| 20130045337 | HOMOGENEOUS MODIFICATION OF POROUS FILMS - Porous films are homogeneously and partially (but not completely) filled. A composition (that includes a polymer) is brought into contact with a planar film that has interconnected pores throughout the film. The polymer then partially fills the pores within the film, e.g., in response to being heated. An additional treatment such as heating the polymer and/or applying radiation to the polymer increases the Young's modulus of the film. | 02-21-2013 |
Geraud J.-M. Dubois, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20130056874 | Protection of intermetal dielectric layers in multilevel wiring structures - A semiconductor device is accepted at a stage of its fabrication, at which stage the device includes a diffusion-barrier cap-material (DBCM) layer and an intermetal dielectric layer covering the DBCM layer. The DBCM layer is exposed and it is suitable for removal by an etching procedure in a portion of a pattern contained in the intermetal dielectric layer. A silylation treatment is performed on the semiconductor device prior to the etching procedure for removing the DBCM layer. The intermetal dielectric layer of the completed device has surfaces in contact with metal interconnects and metal vias, and it may have an excess of carbon content near at least a portion of the these surfaces. | 03-07-2013 |
Marcel Dubois, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080288460 | MULTIMEDIA CONTENT SEARCH AND RECORDING SCHEDULING SYSTEM - Techniques described herein enable searching for multimedia content and for downloading or scheduling the recording of the multimedia content. The multimedia content may have been previously stored on one or more databases. The client device may download or schedule the recording of multimedia content in one step, for example, in one touch. When desired multimedia content is not available, the multimedia content is added to the client device's wish list. When the client device's does not have a wish list, the client device's wish list may be created on the spot. During the scheduling of the recording, a tag associated with the multimedia content is checked to determine whether the multimedia content is live or delayed. When the tag indicates the multimedia content is live or delayed, the client device prompts with a suggestion to add extra time to the end of the recording of the multimedia content. | 11-20-2008 |
| 20100293579 | Correlation of Media Metadata Gathered From Diverse Sources - A DVR, server, or other agent correlates media metadata from diverse sources, like an EPG data provider and multiple video-on-demand (VOD) service providers. Metadata sets from different sources are compared in order to attempt to identify identical programs to which the metadata sets pertain. From at least one metadata set, information about the program that the other metadata set lacks is selected. A “canonical” data structure instance for the program is created. The information that is lacking from at least one of the metadata sources is inserted into that instance. For each source from which a program is available, the DVR stores the identity of that source on the DVR's persistent storage device in association with the canonical data structure instance for that program. The DVR receives search criteria from a user and then searches the stored canonical data structure instance for programs that satisfy the criteria. | 11-18-2010 |
Timothy Dubois, Moss Beach, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090063549 | ENTERPRISE STRUCTURE CONFIGURATOR - Tools for configuring an enterprise applications. In one aspect, the tools provide a user interface to allow an implementer describe, based on an interview with executives of the organization, an enterprise structure of an organization, and a data structure generator to configure the enterprise application to reflect this enterprise structure. In one aspect, these tools can allow a general case to guide the default assignment of intersections of legal and managerial reporting structures to a business unit, allowing the minimum number of business units to fulfill both the external and managerial responsibilities. The tools may implement a pivot table approach to provide an interface for the user to provide such input. | 03-05-2009 |
Timothy M. Dubois, Moss Beach, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090063209 | Six sigma enabled business intelligence system - A method of presenting an analysis of enterprise wide business data. In response to a user request to a web site operable to access enterprise wide business data and to provide statistical analysis, a six sigma enabled BIS transfers an electronic document to the user. The electronic document allows the user to select dimensions to specify which data to analyze for a given performance measure. Then, in response to a request from the user for a statistical analysis, the six sigma enabled BIS performs a statistical analysis of the performance measure and transfers an electronic copy of the statistical analysis to the user. In one embodiment the document comprises a histogram. The histogram has an overlay indicator of the statistical mean, as well as a target limit. In this fashion, the user may view the variance in the data, and see how much data are outside the target range. | 03-05-2009 |
Yvon A. Dubois, Escondido, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110098593 | Head Harness &Wireless EEG Monitoring System - An assembly and system for collection and assessment of physiological data is provided. The assembly includes a physiological data acquisition module that may be used in combination with a head harness for the collection, recordation, storage and transmission of quality physiological data. The assembly integrates easy to use, self-applied electrodes in a user-friendly system resulting in less data artifacts than commonly seen in conventional methods and techniques for collecting physiological data. The assembly and system captures high-quality physiological data for display, storage, processing and analysis. | 04-28-2011 |