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Douki
Yuichi Douki, Koshi City JP
| Patent application number | Description | Published |
|---|---|---|
| 20100211215 | Substrate transfer apparatus and substrate treatment system - The present invention is a transfer apparatus for a substrate, including a substrate housing container housing a substrate therein and having a transfer-in/out port for the substrate formed in a side surface thereof; a gas jet unit jetting a predetermined gas toward a rear surface of the substrate in the substrate housing container; and a control unit regulating a supply amount of the predetermined gas supplied from the gas jet unit to control the substrate in the substrate housing container to a predetermined height. | 08-19-2010 |
Yuichi Douki, Kumamoto JP
| Patent application number | Description | Published |
|---|---|---|
| 20090033908 | JIG FOR DETECTING POSTION - A position alignment of a transfer point of a transfer arm is performed by using a position detecting wafer capable of being loaded into an apparatus having a thin transfer port. The position detecting wafer S includes an electrostatic capacitance detecting sensor | 02-05-2009 |
| 20090115422 | JIG FOR DETECTING POSITION - A transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an electrostatic capacitance sensor. A position detecting wafer S is formed in a wafer shape transferable by a transfer arm | 05-07-2009 |
Yuichi Douki, Koshi-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110190927 | SUBSTRATE CARRYING DEVICE, SUBSTRATE CARRYING METHOD AND STORAGE MEDIUM - A substrate carrying device decides whether or not a substrate received from a substrate supporting device is supported therein in a correct position. A support arm provided with support lugs and strain gages attached to the support lugs, respectively, is advanced to a forward position, and then the support arm is raised relative to lifting pins supporting a wafer to receive the wafer from the lifting pins. The strain gages measure strains produced in the support lugs, respectively, when load is placed on the support lugs. Decision about whether or not the wafer is supported in a correct position on the support lugs is made on the basis of strains measured by the strain gages. When it is decided that the wafer is supported in an incorrect position on the support lugs, the retraction of the support arm is inhibited. | 08-04-2011 |