| Patent application number | Description | Published |
|---|
| 20100040718 | Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film - An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith. | 02-18-2010 |
| 20100078846 | Particle Mitigation for Imprint Lithography - Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described. | 04-01-2010 |
| 20100085555 | In-Situ Cleaning of an Imprint Lithography Tool - Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate. | 04-08-2010 |
| 20100092599 | Complementary Alignment Marks for Imprint Lithography - Systems and methods for minimizing overlay error during alignment of a template with a substrate are described. Templates generally include two distinct types of alignment marks: buried alignment marks and complementary alignment marks. Buried marks may be fabricated separately from the patterning surface, and the complementary marks may be fabricated in the same step as the patterning surface. | 04-15-2010 |
| 20100099047 | MANUFACTURE OF DROP DISPENSE APPARATUS - A drop dispense apparatus may be manufactured utilizing an imprint lithography process. Exemplary methods for manufacturing a drop dispense apparatus are described. | 04-22-2010 |
| 20100102029 | Imprint Lithography Template - Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template. | 04-29-2010 |
| 20100112310 | Substrate Patterning - Systems and methods for providing identification patterns on substrates are described. | 05-06-2010 |
| 20100291257 | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template - A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region. | 11-18-2010 |
