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Dotter

Buddie Dotter, Shelby Township, MI US

Patent application numberDescriptionPublished
20090068344System and method for manufacturing thin film electrical devices - A system for manufacturing a thin film electrical device is provided in accordance with an exemplary embodiment. The system includes a chamber and a gas gate. The chamber includes accumulating apparatus therein configured for gathering a portion of the substrate within the chamber. The gas gate provides fluid communication between a pressure region of the chamber and a second pressure region.03-12-2009

Robert Dotter, Houston, TX US

Patent application numberDescriptionPublished
20090030095Polystyrene compositions and methods of making and using same - Disclosed is a method comprising contacting polystyrene with carbon black and expandable microspheres to form a composition, and expanding the microspheres to foam the composition. Also disclosed is a foamed composition comprising polystyrene, carbon black, and expandable microspheres. The inventive polystyrene compositions have improved mechanical properties.01-29-2009
20110195210POLYPROPYLENE AND POLYLACTIC ACID BLENDS OF INJECTION STRETCH BLOW MOLDING APPLICATIONS - Injection stretch blow molded (ISBM) articles containing a bio-based polymers and methods of forming the same are described herein. The method generally includes providing a propylene-based polymer; contacting the propylene-based polymer with polylactic acid to form a polymeric blend; injection molding the blend into a preform; and stretch-blowing the preform into an article.08-11-2011

Tracey M. Dotter, Bloomington, MN US

Patent application numberDescriptionPublished
20110231449System, Method, and Apparatus for Managing Patent Reference Reporting - A reporting database establishes linkages between patent applications so that first references reported in a first patent application are indicated as needing to be reported in a second patent application. In one scenario, a similar second linkage is also established between the second patent application and a third patent application. In such a case, there may be no linkage between the first patent application and the third patent application analogous to the first and second linkages. When it is detected in such a case that the first references have been reported in the second patent application, an indication that the first references need to be reported in the third patent application may prevented based on determining that the first references did not originate from the second patent application.09-22-2011